scholarly journals MILLED MICROMOLDS FOR LARGE AREA ALL-ELASTOMER ''ROBOT SKIN'' WITH 3-AXIS TACTILE SENSING VIA CONTACT RESISTANCE

Author(s):  
A. Charalambides ◽  
S. Bergbreiter
RSC Advances ◽  
2020 ◽  
Vol 10 (17) ◽  
pp. 9940-9948
Author(s):  
Geon Hwee Kim ◽  
Hyeonsu Woo ◽  
Suhyeon Kim ◽  
Taechang An ◽  
Geunbae Lim

The flexible transparent electrode of this study used electrospinning and electroless deposition, which is a fabrication method to remove contact resistance at the nanofiber intersection and fabricate large-area electrode.


2013 ◽  
Vol 4 ◽  
pp. 234-242 ◽  
Author(s):  
Gabriele Fisichella ◽  
Salvatore Di Franco ◽  
Patrick Fiorenza ◽  
Raffaella Lo Nigro ◽  
Fabrizio Roccaforte ◽  
...  

Chemical vapour deposition (CVD) on catalytic metals is one of main approaches for high-quality graphene growth over large areas. However, a subsequent transfer step to an insulating substrate is required in order to use the graphene for electronic applications. This step can severely affect both the structural integrity and the electronic properties of the graphene membrane. In this paper, we investigated the morphological and electrical properties of CVD graphene transferred onto SiO2 and on a polymeric substrate (poly(ethylene-2,6-naphthalene dicarboxylate), briefly PEN), suitable for microelectronics and flexible electronics applications, respectively. The electrical properties (sheet resistance, mobility, carrier density) of the transferred graphene as well as the specific contact resistance of metal contacts onto graphene were investigated by using properly designed test patterns. While a sheet resistance R sh ≈ 1.7 kΩ/sq and a specific contact resistance ρc ≈ 15 kΩ·μm have been measured for graphene transferred onto SiO2, about 2.3× higher R sh and about 8× higher ρc values were obtained for graphene on PEN. High-resolution current mapping by torsion resonant conductive atomic force microscopy (TRCAFM) provided an insight into the nanoscale mechanisms responsible for the very high ρc in the case of graphene on PEN, showing a ca. 10× smaller “effective” area for current injection than in the case of graphene on SiO2.


2020 ◽  
Vol 142 (7) ◽  
pp. 3513-3524 ◽  
Author(s):  
Senthil Kumar Karuppannan ◽  
Esther Hui Lin Neoh ◽  
Ayelet Vilan ◽  
Christian A. Nijhuis

1997 ◽  
Vol 483 ◽  
Author(s):  
C Jacob ◽  
P Pirouz ◽  
H-I Kuo ◽  
M Mehregany

AbstractWith the current availability of large-area 3C-SiC films, it is imperative that stable high temperature contacts be developed for high power devices. By comparing the existing data in the literature, we demonstrate that the contact behavior on each of the different polytypes of SiC will vary significantly. In particular, we demonstrate this for 6H-SiC and 3C-SiC. The interface slope parameter, S, which is a measure of the Fermi-level pinning in each system varies between 0.4–0.5 on 6H-SiC, while it is 0.6 on 3C-SiC. This implies that the barrier heights of contacts to 3C-SiC will vary more significantly with the choice of metal than for 6H-SiC.Aluminum, nickel and tungsten were deposited on 3C-SiC films and their specific contact resistance measured using the circular TLM method. High temperature measurements (up to 400°C) were performed to determine the behavior of these contacts at operational temperatures. Aluminum was used primarily as a baseline for comparison since it melts at 660°C and cannot be used for very high temperature contacts. The specific contact resistance (ρc) for nickel at room temperature was 5 × 10−4 Ω-cm2, but increased with temperature to a value of 1.5 × 10−3 Ω-cm2 at 400°C. Tungsten had a higher room temperature × 10−3 Ω-cm2, which remained relatively constant with increasing temperature up to 400°C. This is related to the fact that there is hardly any reaction between tungsten and silicon carbide even up to 900°C, whereas nickel almost completely reacts with SiC by that temperature. Contact resistance measurements were also performed on samples that were annealed at 500°C.


Author(s):  
Luca Muscari ◽  
Lucia Seminara ◽  
Fulvio Mastrogiovanni ◽  
Maurizio Valle ◽  
Marco Capurro ◽  
...  
Keyword(s):  

Sensors ◽  
2016 ◽  
Vol 16 (12) ◽  
pp. 2001 ◽  
Author(s):  
Zhangping Ji ◽  
Hui Zhu ◽  
Huicong Liu ◽  
Nan Liu ◽  
Tao Chen ◽  
...  
Keyword(s):  

2017 ◽  
Author(s):  
Mohammad Nasser Saadatzi ◽  
Joshua R. Baptist ◽  
Indika B. Wijayasinghe ◽  
Dan O. Popa

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