scholarly journals Design and Performance of a Miniaturized, Low-Energy, Large Beam Spot Electron Flood Gun

Electronics ◽  
2021 ◽  
Vol 10 (6) ◽  
pp. 648
Author(s):  
Chenhui Deng ◽  
Li Han ◽  
Yan Wang
Keyword(s):  
Electron Beam ◽  
Beam Current ◽  
Low Energy ◽  
Electron Optics ◽  
Large Area ◽  
Beam Spot ◽  
Scanning Method ◽  
Simulation Results ◽  
And Performance

Charge accumulation often occurs in electron optics equipment and interferes with their operation. The trouble can be handled by using the electron flood gun. However, there are still some scenarios where neutralization is not as desired. To achieve a better charge neutralization effect and to facilitate work in confined spaces, a small size, low-energy electron flood gun providing a large area and uniform electron beam has been required. This article employs Munro’s Electron Beam Software (MEBS) to simulate the effect of the structure parameters on the performance of the beam. Based on the simulation results, the electron flood gun is processed and assembled. To verify the performance of the electron flood gun, this paper proposes a new “pinhole scanning method”. By using the method, we have achieved in-situ measurements of beam current and beam spot. The experimental results generally match the simulation results, which demonstrates that the electron flood gun has good performance and is likely to have many applications.

Large Area Electron Beam Enhanced Reactive Etching of SiO2

1987 ◽  
Vol 98 ◽  
Author(s):  
P. Kirk Boyer ◽  
Tim Verhey ◽  
Jorge J. Rocca
Keyword(s):  
Electron Beam ◽  
Beam Energy ◽  
High Pressures ◽  
Beam Current ◽  
Low Energy ◽  
Large Area ◽  
Beam Source ◽  
Energy Beam ◽  
Reactive Gases ◽  
Reactive Gas

ABSTRACTA large area (2.8 cm2) electron beam source has been developed, characterized, and applied to anisotropic etching of SiO2 masked with photoresist. This beam operates at high pressures (up to 100 mTorr), in reactive gases, and at more than 10 mA/cm2. Beam current can be controlled in several ways independently from beam energy. The 100 – 900 eV low energy beam propagates with collimation through several cm of reactive gas, and is believed to minimize space charge defocusing by collisionally ionizing the working gas.

Electron-Beam Assisted CVD of Silicon Homoepitaxial Films

1988 ◽  
Vol 129 ◽  
Author(s):  
J. P. West ◽  
C. B. Fleddermann
Keyword(s):  
Electron Beam ◽  
Single Crystal Silicon ◽  
Beam Current ◽  
Silicon Substrates ◽  
Beam Diameter ◽  
Epitaxial Silicon ◽  
Large Area ◽  
Plasma Etch ◽  
Crystal Silicon

ABSTRACTThe use of a wide-area electron beam to aid the deposition of epitaxial silicon films has been studied. The electron beam used in this study is generated using a cold cathode, abnormal-glow discharge which allows a wide variation of electron energy and beam current. Depositions are performed on single crystal silicon substrates which are prepared using standard wet chemical silicon cleaning techniques and an in situ plasma etch using nitrogen tri-fluoride diluted in hydrogen. The beam diameter is approximately 10 cm and can readily be scaled up to accommodate larger diameters, allowing great potential for large area single wafer deposition. Using electron beams generated in this system, we have demonstrated enhanced growth rates and improved crystalline quality for films grown withelectronbeam enhancement.

Annihilation Behaviors of Athermal ω-Phase Crystals Due to Electron Irradiation

2000 ◽  
Vol 6 (4) ◽  
pp. 362-367 ◽  
Author(s):  
Hajime Matsumoto ◽  
Eiichi Sukedai ◽  
Hatsujiro Hashimoto
Keyword(s):  
Electron Beam ◽  
Electron Irradiation ◽  
Beam Current ◽  
Dark Field ◽  
Electron Beam Current ◽  
Ω Phase ◽  
Observation Methods ◽  
Incubation Periods ◽  
Beam Currents

AbstractAnnihilation behaviors of athermal ω-phase crystals formed by cooling at 131 K for 10.8 ks under four different electron irradiation conditions of acceleration voltages of 200 kV and 160 kV, and beam currents of approximately 20 pA/cm2 and 5 pA/cm2 were investigated using in situ dark field and HREM observation methods at 131 K. The effect of acceleration voltages on the lifetimes is recognized, i.e., in the case of approximately equal electron beam current, lifetimes at 200 kV become shorter than those at 160 kV. Also, lifetimes depend on the electron beam current at 200 kV, i.e., the higher the beam currents, the shorter the lifetimes become. However, no distinct dependence can be seen at 160 kV. Since annihilations of athermal ω-phase crystals begin after the electron irradiation for a certain period in each condition, which depends on acceleration voltages and beam currents, it is suggested that the annihilation behaviors have incubation periods.

Rapid formation of ultra-thin dielectrics by Si surface modification using a large area low energy electron beam

Vacuum ◽  
1990 ◽  
Vol 41 (4-6) ◽  
pp. 796-799 ◽  
Author(s):  
Y.C Du ◽  
H Wang ◽  
B.Z Li ◽  
D.C Sun ◽  
Z.Q Yu ◽  
...  
Keyword(s):  
Surface Modification ◽  
Electron Beam ◽  
Low Energy ◽  
Energy Electron ◽  
Large Area ◽  
Rapid Formation ◽  
Low Energy Electron ◽  
Thin Dielectrics

scholarly journals Design of an Einzel Lens with Square Cross-Section

Electronics ◽  
2021 ◽  
Vol 10 (19) ◽  
pp. 2338
Author(s):  
Michał Krysztof
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Cross Section ◽  
Vacuum Chamber ◽  
High Vacuum ◽  
Beam Current ◽  
Electron Beam Current ◽  
Beam Spot ◽  
High Vacuum Chamber ◽  
Beam Spot Diameter

In this paper, the results of modeling and simulation of a microcolumn are presented. The microcolumn is part of a developed miniature MEMS electron microscope equipped with a miniature MEMS high-vacuum micropump. Such an arrangement makes this device the first stand-alone miniature electron-optical device to operate without an external high-vacuum chamber. Before such a device can be fabricated, research on particular elements must be carried out to determine the working principles of the device. The results of the calculations described in this article help us to understand the work of a microcolumn with square holes in the electrodes. The formation of an electron beam spot at the anode is discussed. Further calculations and results show the dependence of the Einzel lens size on the electron beam spot diameter, electron beam current, and microcolumn focusing voltage. The results are used to define the optimal design of the developed MEMS electron microscope.

scholarly journals Low-Energy State Electron Beam in a Uniform Channel

Plasma ◽  
2019 ◽  
Vol 2 (2) ◽  
pp. 222-228 ◽  
Author(s):  
Mikhail Fuks ◽  
Dmitrii Andreev ◽  
Artem Kuskov ◽  
Edl Schamiloglu
Keyword(s):  
Magnetic Field ◽  
Electron Beam ◽  
Space Charge ◽  
Virtual Cathode ◽  
Energy State ◽  
Beam Current ◽  
Low Energy ◽  
Magnetic Mirror ◽  
Limiting Current ◽  
Uniform Channel

In our earlier work, we showed that a low-energy state of an electron beam exists in a nonuniform channel between two virtual cathodes in a magnetron with diffraction output, which consists of three uniform sections with increasing radius. A uniform axial magnetic field fills the interaction space. This led to magnetron operation with >90% efficiency when combined with a magnetic mirror field at the output end. In this present paper, we show that a low-energy state of an electron beam can be realized in a uniform channel in which an increasing magnetic field is used in order to create a magnetic mirror at the output end. We consider two cases, one where the injected beam current slightly exceeds the space-charge-limiting current and the other where the injected beam current greatly exceeds the space-charge-limiting current. On the time scale of relevance to planned experiments (∼30 ns), when the injected current slightly exceeds the space-charge-limiting current a stationary virtual cathode forms and when the injected current greatly exceeds the space-charge-limiting current the virtual cathode oscillates back and forth.

Magnesium Diboride Superconducting Films Synthesized by Different Electron-Beam Annealing Currents

2014 ◽  
Vol 887-888 ◽  
pp. 737-742
Author(s):  
Zhuang Xu ◽  
Xiang Dong Kong ◽  
Jun Wang ◽  
Han Li ◽  
Qian Dai ◽  
...  
Keyword(s):  
Electron Beam ◽  
Magnesium Diboride ◽  
Influence Factors ◽  
Spot Size ◽  
Beam Current ◽  
Annealing Duration ◽  
Zero Field ◽  
Beam Spot ◽  
Beam Spot Size ◽  
Beam Currents

Considerable progress to synthesize magnesium diboride (MgB2) films by electron-beam annealing has been made. A series of MgB2 films with a Tc higher than 35 K had been fabricated. MgB2 film superconductivity is affected by electron-beam accelerating voltage, beam current, annealing duration, beam spot size and Mg/B ratio. In order to fabricate better MgB2 films, these influence factors must be intensively studied. In this paper, the influence of e-beam current on superconductivity was investigated with an accelerating voltage of 32 kV, an annealing time of 0.26 s and different annealing beam currents of 9.9 mA, 10.7 mA, 12.8 mA, 13.3 mA and 14.0 mA. The results show the MgB2 film with 12.8 mA has the highest Tc and the densest structure. Its zero-field Jc at 15K has reached 3.2×106 A/cm2. The variation of the film superconducting properties with the beam currents was grasped, which will lay the foundation for the fabrication of high quality MgB2 thin films

A Study on the Large-Area Image Acquisition Using Stage Transfer Synchronization Method in a Low-Energy Microcolumn System

2021 ◽  
Vol 16 (7) ◽  
pp. 1075-1081
Author(s):  
Young Bok Lee ◽  
Dae Wook Kim ◽  
Seungjoon Ahn ◽  
Ho Seob Kim ◽  
Tae Sik Oh
Keyword(s):  
Electron Beam ◽  
Image Acquisition ◽  
Vertical Direction ◽  
Low Energy ◽  
Horizontal Direction ◽  
Large Area ◽  
Beam Scanning ◽  
Synchronization Method ◽  
Raster Scan

We studied the stage transfer synchronization method to improve the low throughput which is the biggest drawback of the raster scan method when applied to image acquisition in a low energy microcolumn system. Through preliminary experiments, we were able to acquire some sample images and some images of the measured samples by applying the synchronization method to a conventional single-microcolumn system. The image acquired in this preliminary experiment was three times larger than that acquired by the raster scan method in the vertical direction. In this study, we tested two types of the synchronization method: the first method acquires an image by horizontal electron beam scanning followed by a vertical stage transfer, and the second one acquires an image by vertical electron beam scanning followed by a horizontal stage transfer. By applying the vertical stage transfer synchronization method, we could acquire a larger image than that acquired by the conventional raster scan method. The vertical stage transfer synchronization method image was 1.8 times larger in the horizontal direction and 6 times larger in the vertical direction. In addition, a larger image approximately nine times in the horizontal direction and five times in the vertical direction was acquired by applying the horizontal stage transfer synchronization method.

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