scholarly journals Characteristics of Plasma Flow for Microwave Plasma Assisted Aerosol Deposition

Nanomaterials ◽  
2021 ◽  
Vol 11 (7) ◽  
pp. 1705
Author(s):  
In-Je Kang ◽  
Chang-Hyun Cho ◽  
Hyonu Chang ◽  
Soo-Ouk Jang ◽  
Hyun-Jae Park ◽  
...  

To validate the possibility of the developed microwave plasma source with a novel structure for plasma aerosol deposition, the characteristics of the plasma flow velocity generated from the microwave plasma source were investigated by a Mach probe with pressure variation. Simulation with the turbulent model was introduced to deduce calibration factor of the Mach probe and to compare experimental measurements for analyses of collisional plasma conditions. The results show calibration factor does not seem to be a constant parameter and highly dependent on the collision parameter. The measured plasma flow velocity, which witnessed fluctuations produced by a shock flow, was between 400 and 700 m/s. The optimized conditions for microwave plasma assisted aerosol deposition were derived by the results obtained from analyses of the parameters of microwave plasma jet. Under the optimized conditions, Y2O3 coatings deposited on an aluminum substrate were investigated using scanning electron microscope. The results presented in this study show the microwave plasma assisted aerosol deposition with the developed microwave plasma source is highly feasible for thick films with >50 μm.

2006 ◽  
Vol 45 (7) ◽  
pp. 5945-5950 ◽  
Author(s):  
Yong-Sup Choi ◽  
Hyun-Jong Woo ◽  
Kyu-Sun Chung ◽  
Myoung-Jae Lee ◽  
David Zimmerman ◽  
...  

2003 ◽  
Vol 43 (1T) ◽  
pp. 277-279
Author(s):  
G. Y. Kwak ◽  
Y. S. Choi ◽  
Y. H. Jung ◽  
K.-S. Chung ◽  
J. G. Bak ◽  
...  

1986 ◽  
Vol 57 (2) ◽  
pp. 164-166 ◽  
Author(s):  
L. G. Meiners ◽  
D. B. Alford

1992 ◽  
Vol 1 (7) ◽  
pp. 814-817 ◽  
Author(s):  
D.K. Smith ◽  
E. Sevillano ◽  
M. Besen ◽  
V. Berkman ◽  
L. Bourget

2021 ◽  
Vol 11 (12) ◽  
pp. 5358
Author(s):  
Ju-Hong Cha ◽  
Sang-Woo Kim ◽  
Ho-Jun Lee

For a conventional linear microwave plasma source (LMPS) with a quasi-coaxial line transverse electromagnetic (TEM) waveguide, a linearly extended plasma is sustained by the surface wave outside the tube. Due to the characteristics of the quasi-coaxial line MPS, it is easy to generate a uniform plasma with radially omnidirectional surfaces, but it is difficult to maximize the electron density in a curved selected region. For the purpose of concentrating the plasma density in the deposition area, a novel LMPS which is suitable for curved structure deposition has been developed and compared with the conventional LMPS. As the shape of a circular waveguide, it is filled with relatively high-permittivity dielectric instead of a quasi-coaxial line waveguide. Microwave power at 2.45 GHz is transferred to the plasma through the continuous cylindrical-slotted line antenna, and the radiated electric field in the radial direction is made almost parallel to the tangential plane of the window surface. This research includes the advanced 3D numerical analysis and compares the results with the experiment. It shows that the electron density in the deposition area is higher than that of the conventional quasi-coaxial line plasma MPS.


2011 ◽  
Vol 39 (11) ◽  
pp. 2906-2907 ◽  
Author(s):  
Helena Nowakowska ◽  
Mariusz Jasinski ◽  
Jerzy Mizeraczyk

Sign in / Sign up

Export Citation Format

Share Document