Direct fabrication of a diffraction grating onto organic oligomer crystals by focused ion beam lithography followed by plasma etching

AbstractAperture arrays were fabricated in 1.0µm thick gold films supported on 20nm thick silicon nitride membranes. Lithographic milling strategies in gold were evaluated through the use of in-situ sectioning and high resolution SEM imaging with the UWO CrossBeam FIB/SEM. A successful strategy for producing a 250nm diameter hole with sidewalls approaching vertical is summarized.

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Highly Rectifying Heterojunctions Formed by Annealed ZnO Nanorods on GaN Substrates

Nanomaterials ◽

10.3390/nano10030508 ◽

2020 ◽

Vol 10 (3) ◽

pp. 508 ◽

Cited By ~ 1

Author(s):

Stanislav Tiagulskyi ◽

Roman Yatskiv ◽

Hana Faitová ◽

Šárka Kučerová ◽

David Roesel ◽

...

Keyword(s):

Electrical Properties ◽

Leakage Current ◽

Focused Ion Beam ◽

Ion Beam ◽

Zno Nanorods ◽

Carrier Injection ◽

Ion Beam Lithography ◽

Current Voltage ◽

P Type ◽

Surface Leakage

We study the effect of thermal annealing on the electrical properties of the nanoscale p-n heterojunctions based on single n-type ZnO nanorods on p-type GaN substrates. The ZnO nanorods are prepared by chemical bath deposition on both plain GaN substrates and on the substrates locally patterned by focused ion beam lithography. Electrical properties of single nanorod heterojunctions are measured with a nanoprobe in the vacuum chamber of a scanning electron microscope. The focused ion beam lithography provides a uniform nucleation of ZnO, which results in a uniform growth of ZnO nanorods. The specific configuration of the interface between the ZnO nanorods and GaN substrate created by the focused ion beam suppresses the surface leakage current and improves the current-voltage characteristics. Further improvement of the electrical characteristics is achieved by annealing of the structures in nitrogen, which limits the defect-mediated leakage current and increases the carrier injection efficiency.

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Fabrication of Si Micropore and Graphene Nanohole Structures by Focused Ion Beam

Sensors ◽

10.3390/s20061572 ◽

2020 ◽

Vol 20 (6) ◽

pp. 1572

Author(s):

Nik Noor Nabilah Md Ibrahim ◽

Abdul Manaf Hashim

Keyword(s):

Single Molecule ◽

Focused Ion Beam ◽

Deoxyribonucleic Acid ◽

Ion Beam ◽

Si Substrate ◽

Device Structure ◽

Fluidic Channel ◽

Direct Fabrication ◽

Transfer Method ◽

Sensing Membrane

A biosensor formed by a combination of silicon (Si) micropore and graphene nanohole technology is expected to act as a promising device structure to interrogate single molecule biopolymers, such as deoxyribonucleic acid (DNA). This paper reports a novel technique of using a focused ion beam (FIB) as a tool for direct fabrication of both conical-shaped micropore in Si3N4/Si and a nanohole in graphene to act as a fluidic channel and sensing membrane, respectively. The thinning of thick Si substrate down to 50 µm has been performed prior to a multi-step milling of the conical-shaped micropore with final pore size of 3 µm. A transfer of graphene onto the fabricated conical-shaped micropore with little or no defect was successfully achieved using a newly developed all-dry transfer method. A circular shape graphene nanohole with diameter of about 30 nm was successfully obtained at beam exposure time of 0.1 s. This study opens a breakthrough in fabricating an integrated graphene nanohole and conical-shaped Si micropore structure for biosensor applications.

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Fabrication of Nano- and Micro-Scale UV Imprint Stamp Using Diamond-Like Carbon Coating Technology

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2006.17994 ◽

2006 ◽

Vol 6 (11) ◽

pp. 3619-3623

Author(s):

Eung-Sug Lee ◽

Jun-Ho Jeong ◽

Ki-Don Kim ◽

Young-Suk Sim ◽

Dae-Geun Choi ◽

...

Keyword(s):

Nanoimprint Lithography ◽

Focused Ion Beam ◽

Ion Beam ◽

Adhesive Layer ◽

Diamond Like Carbon ◽

Coating Process ◽

Ion Beam Lithography ◽

Two Photon ◽

Dlc Coating ◽

Two Photon Polymerization

Two-dimensional (2-D) and three-dimensional (3-D) diamond-like carbon (DLC) stamps for ultraviolet nanoimprint lithography were fabricated with two methods: namely, a DLC coating process, followed by focused ion beam lithography; and two-photon polymerization patterning, followed by nanoscale-thick DLC coating. We used focused ion beam lithography to fabricate 70 nm deep lines with a width of 100 nm, as well as 70 nm deep lines with a width of 150 nm, on 100 nm thick DLC layers coated on quartz substrates. We also used two-photon polymerization patterning and a DLC coating process to successfully fabricate 200 nm wide lines, as well as 3-D rings with a diameter of 1.35 μm and a height of 1.97 μm, and a 3-D cone with a bottom diameter of 2.88 μm and a height of 1.97 μm. The wafers were successfully printed on an UV-NIL using the DLC stamps without an anti-adhesive layer. The correlation between the dimensions of the stamp's features and the corresponding imprinted features was excellent.

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