scholarly journals CVD Diamond Coated Tungsten Carbide (WC) Tool Inserts

2021 ◽  
Author(s):  
Ramakant Rana ◽  
◽  
Lucky Krishnia ◽  
R.S. Walia ◽  
Qasim Murtaza ◽  
...  
Keyword(s):  
Tungsten Carbide ◽  
Diamond Films ◽  
Indentation Test ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Morphological Studies ◽  
Coated Tools ◽  
Vapor Deposition Technique ◽  
Tungsten Carbide Tool ◽  
Better Than

In this paper a self-developed polycrystalline diamond coating was done on tungsten carbide (WC) tool insets by using simple thermal chemical vapor deposition technique. The growth of these diamond films has been carried out at ~900 ºC temperature. The as-grown polycrystalline diamond films on the surface of tungsten carbide tool inserts have been characterized using Raman spectrometer and scanning electron microscope (SEM). The morphological studies reveal that the as-grown diamond films are of high crystalline quality. The as-grown diamond films possess compressive stress. The micro-hardness indentation test of the as-grown diamond films on WC tool inserts and bare have also been done and it has been found that the Vicker’s hardness of the as-grown diamond WC tool inserts is found to be 1423.32 HV which is 29% better than the un-coated tools.

Chemical Vapor Deposition of Diamond Films Using Water:Alcohol:Organic-Acid Solutions

1992 ◽  
Vol 242 ◽  
Author(s):  
R. A. Rudder ◽  
J. B. Posthill ◽  
G. C. Hudson ◽  
D. P. Malta ◽  
R. E. Thomas ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Water Vapor ◽  
Vapor Deposition ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Power Input ◽  
Low Pressure ◽  
Diamond Growth ◽  
Vapor Deposition Technique

ABSTRACTA low pressure chemical vapor deposition technique using water-alcohol vapors has been developed for the deposition of polycrystalline diamond films and homoepitaxial diamond films. The technique uses a low pressure (0.50 – 1.00 Torr) rf-induction plasma to effectively dissociate the water vapor into atomic hydrogen and OH. Alcohol vapors admitted into the chamber with the water vapor provide the carbon balance to produce diamond growth. At 1.00 Torr, high quality diamond growth occurs with a gas phase concentration of water approximately equal to 47% for methanol, 66% for ethanol, and 83% for isopropanol. A reduction in the critical power necessary to magnetically couple to the plasma gas is achieved through the addition of acetic acid to the water.alcohol solution. The lower input power allows lower temperature diamond growth. Currently, diamond depositions using water:methanol:acetic-acid are occurring as low as 300 ° C with only about 500 W power input to the 50 mm diameter plasma tube.

Micro-Diffraction Studies of the Evolution of Textures in CVD-Grown Diamond Films

2005 ◽  
Vol 105 ◽  
pp. 403-408
Author(s):  
J. te Nijenhuis ◽  
M.J. Fransen ◽  
J.H.A. Vasterink
Keyword(s):  
Morphological Changes ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Deposition Process ◽  
X Ray Diffraction ◽  
X Ray ◽  
Vapor Deposition Technique ◽  
Oriented Layer

In this study a detailed analysis is given of the development of preferred orientations of polycrystalline diamond films, deposited from the gas phase using the combustion-flame assisted chemical vapor deposition technique, as a function of the amount of intentionally added nitrogen. The preferred orientations are studied using X-ray diffraction and are compared with the morphological changes of the sample surfaces. The role of nitrogen in the deposition process is discussed. Low amounts of nitrogen enhance the growth rate and lead from a randomly oriented layer successively to {011} and {001} fiber textures. Higher amounts of nitrogen deteriorate the growth; no preferred orientation is visible anymore.

Characterization of homoepitaxial diamond films by Electron microscopy

1991 ◽  
Vol 49 ◽  
pp. 880-881
Author(s):  
D.P. Malta ◽  
S.A. Willard ◽  
R.A. Rudder ◽  
G.C. Hudson ◽  
J.B. Posthill ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Surface Defects ◽  
Substrate Surface ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Large Degree ◽  
Rf Plasma ◽  
Semiconducting Diamond

Semiconducting diamond films have the potential for use as a material in which to build active electronic devices capable of operating at high temperatures or in high radiation environments. A major goal of current device-related diamond research is to achieve a high quality epitaxial film on an inexpensive, readily available, non-native substrate. One step in the process of achieving this goal is understanding the nucleation and growth processes of diamond films on diamond substrates. Electron microscopy has already proven invaluable for assessing polycrystalline diamond films grown on nonnative surfaces.The quality of the grown diamond film depends on several factors, one of which is the quality of the diamond substrate. Substrates commercially available today have often been found to have scratched surfaces resulting from the polishing process (Fig. 1a). Electron beam-induced current (EBIC) imaging shows that electrically active sub-surface defects can be present to a large degree (Fig. 1c). Growth of homoepitaxial diamond films by rf plasma-enhanced chemical vapor deposition (PECVD) has been found to planarize the scratched substrate surface (Fig. 1b).

Examination of the material properties and performance of thin-diamond film cutting tool inserts produced by arc-jet and hot filament chemical vapor deposition

1996 ◽  
Vol 11 (7) ◽  
pp. 1765-1775 ◽  
Author(s):  
James M. Olson ◽  
Michael J. Dawes
Keyword(s):  
Wear Resistance ◽  
Chemical Vapor Deposition ◽  
Diamond Film ◽  
Vapor Deposition ◽  
Cutting Tool ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
And Performance ◽  
Hot Filament

Thin diamond film coated WC-Co cutting tool inserts were produced using arc-jet and hot-filament chemical vapor deposition. The diamond films were characterized using SEM, XRD, and Raman spectroscopy to examine crystal structure, fracture mode, thickness, crystalline orientation, diamond quality, and residual stress. The performance of the tools was evaluated by comparing the wear resistance of the materials to brazed polycrystalline diamond-tipped cutting tool inserts (PCD) while machining A390 aluminum (18% silicon). Results from the experiments carried out in this study suggest that the wear resistance of the thin diamond films is primarily related to the grain boundary strength, crystal orientation, and the density of microdefects in the diamond film.

Characterization of undoped and boron-doped polycrystalline diamond films synthesized by hot-filament chemical vapor deposition using methanol

1994 ◽  
Vol 3 (4-6) ◽  
pp. 618-622 ◽  
Author(s):  
Takashi Sugino ◽  
Kiyoshi Karasutani ◽  
Fumihiro Mano ◽  
Hiroya Kataoka ◽  
Junji Shirafuji ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Boron Doped ◽  
Hot Filament

Forming Fine V-Grooves on a Tungsten Carbide Workpiece with a PCD Electrode by EDM

2007 ◽  
Vol 329 ◽  
pp. 631-636 ◽  
Author(s):  
Sadao Sano ◽  
Kiyoshi Suzuki ◽  
Wei Li Pan ◽  
Manabu Iwai ◽  
Yoshihiko Murakami ◽  
...  
Keyword(s):  
Tungsten Carbide ◽  
Pulse Duration ◽  
Flat Surface ◽  
Short Pulse ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Chemical Vapor Deposition Diamond ◽  
Electrically Conductive ◽  
Short Pulse Duration ◽  
Low Wear

Polycrystalline diamond (PCD) exhibits a thermal conductivity similar to that of the electrically conductive chemical vapor deposition diamond (EC-CVD diamond) found to function as zero-wear electrodes at short pulse duration. In this study, PCD was used as electrodes applied to EDM on tungsten carbide. Two kinds of PCD (CTB-010 and CTH-025) with a flat surface were used. The wear of the PCD electrodes was about 1.5% for very short pulse duration such as te=1μs, but it was zero wear at te=30μs, though the wear of a Cu-W electrode was 10% even on the machine recommended conditions for the low wear. EDM experiment using a V-shaped PCD electrode with an included angle of 45° was also carried out and the performance was compared with the case using a V-shaped Cu-W electrode. Under the conditions of a no load voltage of 60V, a set peak current of 2A, and a medium pulse duration of te=15μs, there was no wear on PCD electrodes when observed under the SEM, whereas a 50μm-deep wear on the Cu-W electrodes even under the machine recommended condition for the low wear was observed.

Fracture strength and toughness of chemical-vapor-deposited polycrystalline diamond films

2018 ◽  
Vol 44 (15) ◽  
pp. 17845-17851 ◽  
Author(s):  
Kang An ◽  
Liangxian Chen ◽  
Xiongbo Yan ◽  
Xin Jia ◽  
Jinlong Liu ◽  
...  
Keyword(s):  
Fracture Strength ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Chemical Vapor Deposited ◽  
Strength And Toughness
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