Calibration of Displacement Sensors with High-Precision and Large Measurement Range Using Temporal Speckle Pattern Interferometry

Author(s):  
Xi De Li ◽  
Yan Yang
2006 ◽  
Vol 326-328 ◽  
pp. 91-94
Author(s):  
Xi De Li ◽  
Yan Yang

In the present study, a real-time calibration method for micro displacement sensors is introduced, and a calibration system is developed. SPCM, the sequence pulse counting method previously proposed by us, is capable of automatically determining both the larger range displacement and the performance of a sensor, such as the nonlinear error and the displacement sensitivity within a quarter of the light source wavelength. The new calibration system consists of a programmable motor driven platform, an out-of-plane sensitive electronic speckle pattern interferometry (ESPI), and a sequence image acquisition system. The platform is used to provide displacement changes of a moving component and its displacement is measured by the ESPI and calibrated sensor synchronously. The calibration accuracy of the proposed method is in the submicrometer level and the displacement range can be from sub-micrometer to millimeters depending on the storage capacity of the computer and the correlation property of the interferometer. Three capacitance-type displacement sensors have been calibrated successfully, whose displacement ranges are –300μm to 300μm, –30μm to 30μm, and –3μm to 3μm, respectively.


2013 ◽  
Vol 427-429 ◽  
pp. 1060-1063
Author(s):  
Rong Xian Liu ◽  
Yong Fa Qin ◽  
Fan Li

Impact resistance angular displacement sensors are widely used in motion mechanical system, which not only requires the sensor having the advantages of large measurement range, long life, also the sensor need to withstand shock and vibration. We use the finite element analysis on the key structure of the sensor and design the sensor circuit.. The sensor has the advantages of high strength shell and flexible packaging, and it can withstand the impact of the gravitational acceleration 100g on three directions.


2016 ◽  
Vol 36 (1) ◽  
pp. 0105003 ◽  
Author(s):  
司新春 Si Xinchun ◽  
唐燕 Tang Yan ◽  
胡松 Hu Song ◽  
刘俊伯 Liu Junbo ◽  
程依光 Cheng Yiguang ◽  
...  

2013 ◽  
Vol 303-306 ◽  
pp. 124-127
Author(s):  
Bing Tao Lin ◽  
Jian Hua Zhao ◽  
Wen Yun Li ◽  
Qian Zhou ◽  
Xin Man ◽  
...  

A digital closed-loop control quartz accelerometer with new structures is performed, which overcomes the disadvantages of restriction of measurement range and sensitivity of QVBA (quartz vibrating beam accelerometer). It has not only the same precision as QVBA in theory, but also large measurement range without reducing the sensitivity. The accelerometer is proposed to be used in large range and high-precision measurement of acceleration.


2007 ◽  
Vol 364-366 ◽  
pp. 371-376 ◽  
Author(s):  
Jian Ping Yun ◽  
Ling Ling Zhang ◽  
Tie Bang Xie ◽  
Guo Yuan Hu

We have constructed a novel contact stylus profilometer which is, in a certain sense, a combination of a lever system, an x-y stage, a vertical scanning stage and a Linnik microscope interferometer with a spatially and temporally incoherent light source. The system has large measurement range, high precision and small touch force. Its vertical measuring range is ±5 mm with a resolution below 2 nm, and the horizontal measuring range is ±25 mm in x- and y-range with a resolution of 1.25 μm. This paper describes the system and its performance along with results of measuring some samples.


2022 ◽  
Author(s):  
Haofeng Zang ◽  
Zheng Xi ◽  
Zhiyu Zhang ◽  
Yonghua Lu ◽  
Pei Wang

Abstract A long range, high precision and compact transverse displacement metrology method is of crucial importance in many research areas. We propose and experimentally demonstrate the first prototype polarization-encoded metasurface for ultrasensitive transverse displacement metrology. The transverse displacement of the metasurface is encoded into the polarization direction of the outgoing light via the Pancharatnam-Berry phase. By measuring the output light polarization direction, the metasurface’s position can be readout directly according to the Malus law. We experimentally demonstrate nanometer displacement resolution with the uncertainty on the order of 100 pm for a large measurement range of 200 µm with the total area of the metasurface being within 900 µm x 900 µm. The measurement range can be extended further using a larger metasurface. Our work largely broadens the existing application areas of metasurface and opens new avenue of applying metasurface in the field of ultrasensitive optical transverse displacement metrology.


2020 ◽  
pp. 3-8
Author(s):  
L.F. Vitushkin ◽  
F.F. Karpeshin ◽  
E.P. Krivtsov ◽  
P.P. Krolitsky ◽  
V.V. Nalivaev ◽  
...  

The State special primary acceleration measurement standard for gravimetry (GET 190-2019), its composition, principle of operation and basic metrological characteristics are presented. This standard is on the upper level of reference for free-fall acceleration measurements. Its accuracy and reliability were improved as a result of optimisation of the adjustment procedures for measurement systems and its integration within the upgraded systems, units and modern hardware components. A special attention was given to adjusting the corrections applied to measurement results with respect to procedural, physical and technical limitations. The used investigation methods made it possibled to confirm the measurement range of GET 190-2019 and to determine the contributions of main sources of errors and the total value of these errors. The measurement characteristics and GET 90-2019 were confirmed by the results obtained from measurements of the absolute value of the free fall acceleration at the gravimetrical site “Lomonosov-1” and by their collation with the data of different dates obtained from measurements by high-precision foreign and domestic gravimeters. Topicality of such measurements ensues from the requirements to handle the applied problems that need data on parameters of the Earth gravitational field, to be adequately faced. Geophysics and navigation are the main fields of application for high-precision measurements in this field.


Author(s):  
Joon Hyong Cho ◽  
Guoao Sun ◽  
Michael Cullinan

One of the major challenges in producing highly accurate graphene-based nanoelectromechanical (NEMS) resonators is the poor fabrication repeatability of graphene-based NEMS devices due to small variations in the residual stress and initial tension of the graphene film. This has meant that graphene-based nanoelectromechanical resonators tend to have large variations in natural frequency and quality factor from device to device. This poor repeatability makes it impossible to use these resonators to make accurate, high-precision force and displacement sensors or electromechanical filters. However, by actively controlling the tension on the graphene resonator it is possible both to increase repeatability between devices and to increase the force/mass sensitivity of the nanoelectromechanical resonators produced. Such tension control makes it possible to produce electrometrical filters that can be precisely tuned over a frequency range of up to several orders-of-magnitude. In order to controllably strain the graphene resonator, a microelectromechanical system (MEMS) is be used to apply tension to the graphene. The MEMS device consists of a graphene resonator connected between a set of gold electrodes. Each gold electrode is located on a different MEMS stage. Each stage is connected to a set of flexural bearings which are used to guide the motion of the stage. The displacement stage is actuated using a thermal actuator that allows a uniform and constant tension to be applied to the graphene resonator. The displacement of the actuator and the tension applied to the graphene are measured using a pair of differential capacitive actuators. The resonator is actuated electrostatically using the electrical back gate, and the resonant frequency is measured from the change in conductance of the graphene as it approaches resonance. Using this setup, it is possible to tune the natural frequency of the graphene resonator with high precision and accuracy. In addition to designing devices that can compensate for manufacturing errors in nanomanufactured devices, this paper will present several methods that can greatly expand the scope and rate at which nanomaterials-based devices can be fabricated. For example, this paper will present a transfer-free, wafer-scale manufacturing process that can be used to produce suspended graphene-based devices such as the graphene-based NEMS resonators. This new method involves the growth of graphene directly on the device wafer and release of the graphene-based device through etching of the copper catalyst layer. This method replaces traditional graphene fabrication methods, such as mechanical exfoliation, electron beam lithography, or transfer from copper foils, which are slow and require a transfer step that is the source of much of inconsistency in suspended graphene-based devices. Therefore, these new transfer-free, wafer-scale fabrication methods offer the potential to increase the throughput, yield, and repeatability of manufacturing processes for graphene resonators while reducing manufacturing costs and complexity.


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