Oxidation and Corrosion Resistance of Nanocrystalline Copper Deposit Produced by Pulse Electrodeposition

2011 ◽  
Vol 264-265 ◽  
pp. 1519-1525 ◽  
Author(s):  
M. Saremi ◽  
M. Abouie
Keyword(s):  
Corrosion Resistance ◽  
Direct Current ◽  
Copper Deposit ◽  
Pulse Electrodeposition ◽  
Sulfate Electrolyte ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Oxidation And Corrosion

Pulse electrodeposition was used to produce nanocrystalline (nc) copper from copper sulfate electrolyte with saccharin as additive. The grain size of nanocrystalline coatings was determined using x-ray diffraction and atomic force microscopy (AFM) which was about 30 nm. Microcrystalline copper deposits were also produced by direct current electrodeposition processes and compared with pulse plated ones. Corrosion behavior of the coatings was investigated using polarization and Impedance measurements in different solutions. The oxidation test was carried out at 650°C in an electrical furnace. It was demonstrated that the nanocrystalline film was markedly superior to regularly grained films made by direct current (DC) plating; nanocrystalline deposits show higher corrosion resistance and much higher oxidation resistance.

Formation and Corrosion Behavior of Nickel/Alumina Nanocomposites

2020 ◽  
Vol 299 ◽  
pp. 100-106 ◽  
Author(s):  
D.I. Tishkevich ◽  
A.I. Vorobjova ◽  
Denis A. Vinnik
Keyword(s):  
Composite Material ◽  
Corrosion Resistance ◽  
Porous Alumina ◽  
Nanocomposite Materials ◽  
Alumina Matrix ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Potentiodynamic Polarization Curves

Ni nanopillars (Ni NPs) composite materials formation technology was presented. The morphological and structural properties of the composite material were investigated using scanning electron microscopy, atomic force microscopy, X-ray diffraction. The corrosion resistance of the nanocomposite materials has been studied by potentiodynamic polarization curves analysis. The composite represents the array of vertically ordered Ni NPs with the identical size in alumina matrix. XRD investigation indicates that Ni NPs are polynanocrystalline material. It has been shown that Ni NPs and the composite material have sufficient corrosion resistance in a 0.9% aqueous NaCl solution. Porous alumina matrix is the neutral and protective component of the composite. These nanocomposite materials can be excellent candidates for practical use in different applications.

Effect of the Duty Cycle on Boronized Layer Formed by Pulse Electrodeposition

2011 ◽  
Vol 117-119 ◽  
pp. 1293-1297
Author(s):  
Hai Li Yang ◽  
Guo Zhang Tang ◽  
Yun Gang Li ◽  
Ning He ◽  
Yu Zhu Zhang
Keyword(s):  
Duty Cycle ◽  
Steel Substrate ◽  
Silicon Steel ◽  
Pulse Electrodeposition ◽  
X Ray Diffraction ◽  
Electrodeposition Technique ◽  
X Ray ◽  
Force Microscopy ◽  
Fine Grain ◽  
Atomic Force

Boronized layer on silicon steel substrate was fabricated using pulse electrodeposition technique with different duty cycle in KCl-NaCl-NaF-Na2B4O7 molten salts. The effect of the duty cycle on composition and microstructure of obtained layer was investigated. The boronized layer was analyzed by X-ray diffraction analysis (XRD), optical microscopy (OM), glow discharge spectrometry (GDS), and atomic force microscopy (AFM). The results showed that in the range of 10-50%, duty cycle almost had no effect on composition and thickness of the layer. The boronized layers in this range exhibited FeB phase on the surface of silicon steel. However, duty cycle had great effect on the microstructure of the boronized layer. A fine grain size boronized layer can be obtained at a duty cycle of 20%.

scholarly journals INVESTIGATION INTO THE STRUCTURE AND CORROSION RESISTANCE OF MG-AL AND MG-AL-ZR COATINGS PRODUCED BY MAGNETRON SPUTTERING / MAGNETRONINIŲ MG-AL, MG-AL-ZR IR ZR DANGŲ STRUKTŪROS IR KOROZINIO ATSPARUMO TYRIMAS

2012 ◽  
Vol 3 (6) ◽  
pp. 34-38
Author(s):  
Raimonda Lukauskaitė ◽  
Algirdas Vaclovas Valiulis
Keyword(s):  
Corrosion Resistance ◽  
Magnetron Sputtering ◽  
Nacl Solution ◽  
X Ray Diffraction ◽  
Solution Ph ◽  
X Ray ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force ◽  
Zr Alloys

Thin cathode layers of 200 nm thickness of Mg-Al and Mg-Al-Zr alloys and pure Zr were formed on glass substrates using a magnetron sputtering technique. X-ray diffraction and atomic force microscopy were used for structure and morphology analysis of magnetron sputtered alloys. The corrosion resistance of the sputtered Mg-Al and Mg-Al-Zr coatings in 0.1 M (NH4)3BO3 and 0.1 M NaCl solution (pH = 8.6), was evaluated according to anodic polarization behavior. Santrauka Plonos, 1–2 μm storio, Mg-Al ir Mg-Al-Zr lydinių ir gryno Zr dangos buvo suformuotos ant stiklinių padėklų magnetroninio nusodinimo metodu. Šių dangų struktūra ir morfologija tirta fizikiniais analizės metodais: rentgeno spindulių difrakcija (toliau – RSD) ir atominės jėgos mikroskopija (toliau – AJM). Korozinis dangų atsparumas vertintas veikiant 0,1 M NH4BO3 ir 0,1 M NaCl tirpalu (pH = 8,6), be to, atlikti anodinės poliarizacijos tyrimai. Magnetroniniu būdu nusodintų dangų korozinis atsparumas lygintas su tradiciniais metalurginiais metodais pagamintų cirkonio ir Mg-Al lydinių koroziniu atsparumu. Nustatytos koreliacijos tarp lydinių struktūros ir korozinio atsparumo.

Investigation of the Effect of Uv-Assisted Oxidation and Nitridation of Hafnium Metal Films

2003 ◽  
Vol 780 ◽  
Author(s):  
C. Essary ◽  
V. Craciun ◽  
J. M. Howard ◽  
R. K. Singh
Keyword(s):  
Uv Radiation ◽  
Photoelectron Spectroscopy ◽  
Grazing Angle ◽  
X Ray Diffraction ◽  
Metal Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Si Substrates ◽  
Atomic Force ◽  
Silicon Interface

AbstractHf metal thin films were deposited on Si substrates using a pulsed laser deposition technique in vacuum and in ammonia ambients. The films were then oxidized at 400 °C in 300 Torr of O2. Half the samples were oxidized in the presence of ultraviolet (UV) radiation from a Hg lamp array. X-ray photoelectron spectroscopy, atomic force microscopy, and grazing angle X-ray diffraction were used to compare the crystallinity, roughness, and composition of the films. It has been found that UV radiation causes roughening of the films and also promotes crystallization at lower temperatures.Furthermore, increased silicon oxidation at the interface was noted with the UVirradiated samples and was shown to be in the form of a mixed layer using angle-resolved X-ray photoelectron spectroscopy. Incorporation of nitrogen into the film reduces the oxidation of the silicon interface.

Low Molecular Weight Microfibers with Light Sensing Properties

2017 ◽  
Vol 54 (4) ◽  
pp. 655-658
Author(s):  
Andrei Bejan ◽  
Dragos Peptanariu ◽  
Bogdan Chiricuta ◽  
Elena Bicu ◽  
Dalila Belei
Keyword(s):  
Molecular Weight ◽  
Low Molecular Weight ◽  
X Ray Diffraction ◽  
Aromatic Rings ◽  
X Ray ◽  
Force Microscopy ◽  
Light Sensing ◽  
Sensing Applications ◽  
Atomic Force ◽  
Low Molecular Weight Compounds

Microfibers were obtained from organic low molecular weight compounds based on heteroaromatic and aromatic rings connected by aliphatic spacers. The obtaining of microfibers was proved by scanning electron microscopy. The deciphering of the mechanism of microfiber formation has been elucidated by X-ray diffraction, infrared spectroscopy, and atomic force microscopy measurements. By exciting with light of different wavelength, florescence microscopy revealed a specific optical response, recommending these materials for light sensing applications.

Nanocrystalline Solutions as Precursors to The Spray Deposition of Cdte Thin Films

1995 ◽  
Vol 382 ◽  
Author(s):  
Martin Pehnt ◽  
Douglas L. Schulz ◽  
Calvin J. Curtis ◽  
Helio R. Moutinho ◽  
Amy Swartzlander ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Grain Size ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Cdte Nanoparticles ◽  
Atomic Force ◽  
Vis Spectroscopy ◽  
Cdte Thin Films

ABSTRACTIn this article we report the first nanoparticle-derived route to smooth, dense, phase-pure CdTe thin films. Capped CdTe nanoparticles were prepared by injection of a mixture of Cd(CH3)2, (n-C8H17)3 PTe and (n-C8H17)3P into (n-C8H17)3PO at elevated temperatures. The resultant nanoparticles 32-45 Å in diameter were characterized by x-ray diffraction, UV-Vis spectroscopy, transmission electron microscopy, thermogravimetric analysis and energy dispersive x-ray spectroscopy. CdTe thin film deposition was accomplished by dissolving CdTe nanoparticles in butanol and then spraying the solution onto SnO2-coated glass substrates at variable susceptor temperatures. Smooth and dense CdTe thin films were obtained using growth temperatures approximately 200 °C less than conventional spray pyrolysis approaches. CdTe films were characterized by x-ray diffraction, UV-Vis spectroscopy, atomic force microscopy, and Auger electron spectroscopy. An increase in crystallinity and average grain size as determined by x-ray diffraction was noted as growth temperature was increased from 240 to 300 °C. This temperature dependence of film grain size was further confirmed by atomic force microscopy with no remnant nanocrystalline morphological features detected. UV-Vis characterization of the CdTe thin films revealed a gradual decrease of the band gap (i.e., elimination of nanocrystalline CdTe phase) as the growth temperature was increased with bulk CdTe optical properties observed for films grown at 300 °C.

Frequency and Temperature Dependence of Dielectric Properties of Orthorhombic HoMnO3 Thin Films

2014 ◽  
Vol 1025-1026 ◽  
pp. 427-431
Author(s):  
Ping Gao ◽  
Wei Zhang ◽  
Wei Tian Wang
Keyword(s):  
Dielectric Properties ◽  
Pulsed Laser ◽  
Signal Amplitude ◽  
Debye Model ◽  
Laser Deposition ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Cole Diagram

Orthorhombic HoMnO3 films were prepared epitaxially on Nb-doped SrTiO3 single crystal substrates by using pulsed laser deposition technique. The films showed perfectly a-axis crystallographic orientations. X-ray diffraction and atomic force microscopy were used to characterize the films. The complex dielectric properties were measured as functions of frequency (40 Hz~1 MHz) and temperature (80 K~300 K) with a signal amplitude of 50 mv. The respective dielectric relaxation peaks shifted to higher frequency as the measuring temperature increased, with the same development of real part of the complex permittivity. The cole-cole diagram was obtained according to the Debye model, and the effects of relaxation process were discussed.

Lateral Size of Self-Patterned Nanostructures Controlled by Multi-Step Deposition

2005 ◽  
Vol 106 ◽  
pp. 117-122 ◽  
Author(s):  
Izabela Szafraniak ◽  
Dietrich Hesse ◽  
Marin Alexe
Keyword(s):  
Electron Microscopy ◽  
Ultrathin Films ◽  
Lateral Size ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Non Volatile Memory ◽  
Ferroelectric Capacitors ◽  
Scanning Electron

Self-patterning presents an appealing alternative to lithography for the production of arrays of nanoscale ferroelectric capacitors for use in high density non-volatile memory devices. Recently a self-patterning method, based on the use of the instability of ultrathin films during hightemperature treatments, was used to fabricate nanosized ferroelectrics. This paper reports the use of the method for the preparation of PZT nanoislands on different single crystalline substrates - SrTiO3, MgO and LaAlO3. Moreover, a multi-step deposition procedure in order to control lateral the dimension of the crystals was introduced. The nanostructures obtained were studied by atomic force microscopy, scanning electron microscopy and X-ray diffraction.

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