scholarly journals INVESTIGATION INTO THE STRUCTURE AND CORROSION RESISTANCE OF MG-AL AND MG-AL-ZR COATINGS PRODUCED BY MAGNETRON SPUTTERING / MAGNETRONINIŲ MG-AL, MG-AL-ZR IR ZR DANGŲ STRUKTŪROS IR KOROZINIO ATSPARUMO TYRIMAS

2012 ◽  
Vol 3 (6) ◽  
pp. 34-38
Author(s):  
Raimonda Lukauskaitė ◽  
Algirdas Vaclovas Valiulis
Keyword(s):  
Corrosion Resistance ◽  
Magnetron Sputtering ◽  
Nacl Solution ◽  
X Ray Diffraction ◽  
Solution Ph ◽  
X Ray ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force ◽  
Zr Alloys

Thin cathode layers of 200 nm thickness of Mg-Al and Mg-Al-Zr alloys and pure Zr were formed on glass substrates using a magnetron sputtering technique. X-ray diffraction and atomic force microscopy were used for structure and morphology analysis of magnetron sputtered alloys. The corrosion resistance of the sputtered Mg-Al and Mg-Al-Zr coatings in 0.1 M (NH4)3BO3 and 0.1 M NaCl solution (pH = 8.6), was evaluated according to anodic polarization behavior. Santrauka Plonos, 1–2 μm storio, Mg-Al ir Mg-Al-Zr lydinių ir gryno Zr dangos buvo suformuotos ant stiklinių padėklų magnetroninio nusodinimo metodu. Šių dangų struktūra ir morfologija tirta fizikiniais analizės metodais: rentgeno spindulių difrakcija (toliau – RSD) ir atominės jėgos mikroskopija (toliau – AJM). Korozinis dangų atsparumas vertintas veikiant 0,1 M NH4BO3 ir 0,1 M NaCl tirpalu (pH = 8,6), be to, atlikti anodinės poliarizacijos tyrimai. Magnetroniniu būdu nusodintų dangų korozinis atsparumas lygintas su tradiciniais metalurginiais metodais pagamintų cirkonio ir Mg-Al lydinių koroziniu atsparumu. Nustatytos koreliacijos tarp lydinių struktūros ir korozinio atsparumo.

The Study of Al-N Codoped ZnO Thin Films Prepared by DC Magnetron Sputtering

2015 ◽  
Vol 754-755 ◽  
pp. 591-594
Author(s):  
Haslinda Abdul Hamid ◽  
M.N. Abdul Hadi
Keyword(s):  
Magnetron Sputtering ◽  
Structural Investigation ◽  
Annealing Treatment ◽  
X Ray Diffraction ◽  
Dc Magnetron Sputtering ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Oxygen Gas ◽  
Film Roughness

The codoped ZnO thin film were deposited by DC magnetron sputtering on silicon (111) followed by annealing treatment at 200 °C and 600 °C for 1 hour in nitrogen and oxygen gas mixture. Structural investigation was carried out by scanning electron microscopy (SEM), atomic force microscopy and x-ray diffraction (XRD). Film roughness and grain shape were found to be correlated with the annealing temperatures.

Synthesis and Characterization of Nb-Doped TiO2 Thin Films Prepared by RF Magnetron Sputtering

2015 ◽  
Vol 1117 ◽  
pp. 139-142 ◽  
Author(s):  
Marius Dobromir ◽  
Radu Paul Apetrei ◽  
A.V. Rogachev ◽  
Dmitry L. Kovalenko ◽  
Dumitru Luca
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Rf Magnetron Sputtering ◽  
X Ray ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force ◽  
Vis Spectroscopy ◽  
Diffraction Patterns

Amorphous Nb-doped TiO2 thin films were deposited on (100) Si and glass substrates at room temperature by RF magnetron sputtering and a mosaic-type Nb2O5-TiO2 sputtering target. To adjust the amount of the niobium dopant in the film samples, appropriate numbers of Nb2O5 pellets were placed on the circular area of the magnetron target with intensive sputtering. By adjusting the discharge conditions and the number of niobium oxide pellets, films with dopant content varying between 0 and 16.2 at.% were prepared, as demonstrated by X-ray photoelectron spectroscopy data. The X-ray diffraction patterns of the as-deposited samples showed the lack of crystalline ordering in the samples. Surfaces roughness and energy band gap values increase with dopant concentration, as showed by atomic force microscopy and UV-Vis spectroscopy measurements.

Optical and Electrical Properties of SnS: Ag Films as Solar Cell Absorbers

2009 ◽  
Vol 60-61 ◽  
pp. 11-15 ◽  
Author(s):  
Pe Min Lu ◽  
Hong Jie Jia ◽  
Shu Ying Cheng
Keyword(s):  
X Ray Diffraction ◽  
Average Roughness ◽  
X Ray ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force ◽  
Semiconducting Properties ◽  
Direct Band ◽  
Diffraction Peaks ◽  
P Type

SnS and Ag films were deposited on glass substrates by vacuum thermal evaporation successively, then they were annealed in N2 ambience at a temperature of 300 oC for 2h. By controlling the Ag evaporation voltage to roughly alter content of Ag in SnS films, different Ag-doped SnS films were obtained. The microstructures, composition and properties of the films were characterized with X-ray diffraction ( XRD ), atomic force microscopy(AFM) and some other methods. With the increase of Ag evaporation voltage (VAg), there exist new phases of Ag8SnS6 and Ag2S, whose intensity of diffraction peaks increases with the increasing Ag-dopant, and the average roughness of the films varies from 18.7nm to 23.6nm, and grain size increases from 192nm to 348nm. With the increase of VAg, the evaluated direct band gap Eg of the films decreases from 2.28eV(undoped) to 2.05eV (VAg=70V), the carrier concentration value and Hall mobility of the films diminishes from 2.048×1014cm-3 and 25.96 cm2.v-2.s-1 to 1.035×1016 cm-3 and 5.66 cm2.v-2.s-1, respectively; while the resistivity of the films decreases sharply from 1174Ω.cm(undoped ) to 107Ω.cm (VAg=70V ). All the films are of p-type conductivity. The above results show that the semiconducting properties of the SnS films have been improved by silver-doping.

ON THE ELECTRONIC TRANSPORT MECHANISM IN MAGNETRON-SPUTTERED POLYCRYSTALLINE ZnO THIN FILMS

2010 ◽  
Vol 24 (31) ◽  
pp. 6079-6090 ◽  
Author(s):  
I. I. RUSU ◽  
M. SMIRNOV ◽  
G. G. RUSU ◽  
A. P. RAMBU ◽  
G. I. RUSU
Keyword(s):  
Thin Films ◽  
Electronic Transport ◽  
Hexagonal Structure ◽  
Zno Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force ◽  
Crystallite Boundary

Zinc oxide ( ZnO ) thin films were deposited onto glass substrates by d.c. magnetron sputtering. The structural analysis, by X-ray diffraction and atomic force microscopy, indicate that the studied films are polycrystalline and have a wurtzite (hexagonal) structure. The film crystallites are preferentially oriented with (002) planes parallel to the substrates. The mechanism of electronic transport is explained in terms of Seto's model elaborated for polycrystalline semiconducting films (crystallite boundary trapping theory). Some parameters of used model (impurity concentration, density and energy of the trapping states, etc.) have been calculated. The optical bandgap (Eg0 = 3.28–3.37 eV ) was determined from absorption spectra.

Hydroxyapatite Coatings Produced by Right Angle Magnetron Sputtering for Biomedical Applications

2007 ◽  
Vol 1008 ◽  
Author(s):  
Zhendong Hong ◽  
Alexandre Mello ◽  
Tomohiko Yoshida ◽  
Lan Luan ◽  
Paula H. Stern ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Biomedical Applications ◽  
Titanium Substrate ◽  
Degree Of Crystallinity ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Hydroxyapatite Coatings

AbstractHydroxyapatite coatings have been widely recognized for their biocompatibility and utility in promoting biointegration of implants in both osseous and soft tissue. Conventional sputtering techniques have shown some advantages over the commercially available plasma spraying method; however, the as-sputtered coatings are usually non-stoichiometric and amorphous which can cause some serious problems such as poor adhesion and excessive coating dissolution rate. A versatile right-angle radio frequency magnetron sputtering (RAMS) approach has been developed to deposit HA coatings on various substrates at low power levels. Using this alternative magnetron geometry, as-sputtered HA coatings are nearly stoichiometric, highly crystalline, and strongly bound to the substrate, as evidenced by analyses using x-ray diffraction (XRD), atomic force microscopy (AFM), x-ray photoelectron spectroscopy (XPS), and Fourier transform infrared spectroscopy (FTIR). In particular, coatings deposited on oriented substrates show a polycrystalline XRD pattern but with some strongly preferred orientations, indicating that HA crystallization is sensitive to the nature of the substrate. Post deposition heat treatment under high temperature does not result in a marked improvement in the degree of crystallinity of the coatings. To study the biocompatibility of these coatings, murine osteoblast cells were seeded onto various substrates. Cell density counts using fluorescence microscopy show that the best osteoblast proliferation is achieved on an HA RAMS-coated titanium substrate. These experiments demonstrate that RAMS is a promising coating technique for biomedical applications.

Formation and Corrosion Behavior of Nickel/Alumina Nanocomposites

2020 ◽  
Vol 299 ◽  
pp. 100-106 ◽  
Author(s):  
D.I. Tishkevich ◽  
A.I. Vorobjova ◽  
Denis A. Vinnik
Keyword(s):  
Composite Material ◽  
Corrosion Resistance ◽  
Porous Alumina ◽  
Nanocomposite Materials ◽  
Alumina Matrix ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Potentiodynamic Polarization Curves

Ni nanopillars (Ni NPs) composite materials formation technology was presented. The morphological and structural properties of the composite material were investigated using scanning electron microscopy, atomic force microscopy, X-ray diffraction. The corrosion resistance of the nanocomposite materials has been studied by potentiodynamic polarization curves analysis. The composite represents the array of vertically ordered Ni NPs with the identical size in alumina matrix. XRD investigation indicates that Ni NPs are polynanocrystalline material. It has been shown that Ni NPs and the composite material have sufficient corrosion resistance in a 0.9% aqueous NaCl solution. Porous alumina matrix is the neutral and protective component of the composite. These nanocomposite materials can be excellent candidates for practical use in different applications.

Effects of Growth Temperature on the Structural Properties of Zinc Oxide Nanograins Deposited by RF Magnetron Sputtering

2014 ◽  
Vol 895 ◽  
pp. 500-504
Author(s):  
N. Ameera ◽  
A. Shuhaimi ◽  
S. Najwa ◽  
K.M. Hakim ◽  
M. Mazwan ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Growth Temperature ◽  
Deposition Time ◽  
Rf Magnetron Sputtering ◽  
Rf Power ◽  
X Ray Diffraction ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force

Nanograins zinc oxide (ZnO) withc-axis preferred orientation was deposited on glass substrates by RF magnetron sputtering. It was performed with a ZnO target with 99.999% purity at RF power of 200 W. The deposition was carried out in argon and oxygen ambient at the ratio flow-rates of 10 and 5 sccm respectively, with total deposition time of 1 hour. The films were grown atgrowth temperatures were specified at RT, 100, 200, 300, 400 and 500°C. The effects of the growth temperature on the ZnO structural property was investigated by x-ray diffraction (XRD). The best ZnO crystalline quality obtained at growth temperature, TGof 300°C was further characterized by field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM).

Synthesis and Morphology of ZnO Films Prepared by Magnetron Sputtering

2013 ◽  
Vol 307 ◽  
pp. 333-336
Author(s):  
Shiuh Chuan Her ◽  
Tsung Chi Chi
Keyword(s):  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Rf Magnetron Sputtering ◽  
Zno Thin Films ◽  
Zno Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Xrd Patterns

Zinc oxide (ZnO) thin films were deposited on glass substrate by Radio frequency (RF) magnetron sputtering. The effect of substrate temperature on the microstructure of the ZnO films has been investigated. Crystal structure and surface morphology of the films were examined by X-ray diffraction (XRD) and atomic force microscopy (AFM). XRD patterns and AFM images show that the crystallinity and grain size are increasing with the increase of substrate temperature.

Oxidation and Corrosion Resistance of Nanocrystalline Copper Deposit Produced by Pulse Electrodeposition

2011 ◽  
Vol 264-265 ◽  
pp. 1519-1525 ◽  
Author(s):  
M. Saremi ◽  
M. Abouie
Keyword(s):  
Corrosion Resistance ◽  
Direct Current ◽  
Copper Deposit ◽  
Pulse Electrodeposition ◽  
Sulfate Electrolyte ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Oxidation And Corrosion

Pulse electrodeposition was used to produce nanocrystalline (nc) copper from copper sulfate electrolyte with saccharin as additive. The grain size of nanocrystalline coatings was determined using x-ray diffraction and atomic force microscopy (AFM) which was about 30 nm. Microcrystalline copper deposits were also produced by direct current electrodeposition processes and compared with pulse plated ones. Corrosion behavior of the coatings was investigated using polarization and Impedance measurements in different solutions. The oxidation test was carried out at 650°C in an electrical furnace. It was demonstrated that the nanocrystalline film was markedly superior to regularly grained films made by direct current (DC) plating; nanocrystalline deposits show higher corrosion resistance and much higher oxidation resistance.

Optical Constants of Al-Doped Er2O3 Films Prepared by Radio Frequency Reactive Magnetron Sputtering

2010 ◽  
Vol 663-665 ◽  
pp. 361-364
Author(s):  
Yan Yan Zhu ◽  
Ze Bo Fang
Keyword(s):  
Atomic Force Microscopy ◽  
Refractive Index ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Optical Constants ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force

Al doped Er2O3 films were deposited on Si(001) substrates by radio frequency magnetron technique. X-ray diffraction and atomic force microscopy show the Al doped Er2O3 films obtained are amorphous and uniform. The optical constants are studied which shows a proper value of refractive index and a lower reflectivity, indicating it could be a usefully material for solar cells.

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