Modeling Investigation of the Oxidation Kinetics of Copper and Aluminum Alloys

2011 ◽  
Vol 402 ◽  
pp. 17-21 ◽  
Author(s):  
Feng Jin ◽  
Qun Luo ◽  
Biao Zhou ◽  
Qian Li

The oxidation kinetics of copper or aluminum added with magnesium was investigated by a modified Chou model. The effect of the addition of magnesium in copper or aluminum was discussed. The calculation results showed that the activation energy of CuMg0.34 was the highest among Cu-Mg alloys at 600-900 °C, which indicated that it had the best oxidation resistance in all of the samples. The aluminum alloy AA3004 containing 1.0 wt.% Mg showed the better anti-oxide behavior than AA5182 with 4.0 wt.% Mg, and the relation between oxidation rate and oxygen partial pressure could be expressed as 0.71 times power law.

Author(s):  
Orif Sh. Davlatov ◽  
◽  
Izatullo N. Ganiev ◽  
Haydar Odina Odinazoda ◽  
Safomudin S. Rajabaliev ◽  
...  

The purpose of this work was to find out the features of oxidation of the aluminum alloy АЖ2.4М5.3Мг1.1Ц4Кр3 doped with tin and to develop new alloy compositions with improved characteristics. The thermogravimetric method was used to determine the oxidation kinetics of the aluminum alloy АЖ2.4М5.3Мг1.1Ц4Кр3, containing up to 0.5 wt% tin. The results showed that the process of weight gain of alloys during first 15-20 minutes of oxidation grows intensively, and then acquires an almost constant value. Oxide films formed at the beginning of the oxidation process did not possess protective properties, that fact explains an increase in the rate of oxidation of alloys with temperature in the first period. An increase in the rate of oxidation of alloy samples with temperature is noted. As well, the results revealed that tin at concentrations of 0.01 - 0.5 wt.% reduces the oxidability of the initial alloy, which is accompanied by an increase in the apparent activation energy from 82.1 to 104.3 kJ/mol.


2012 ◽  
Vol 31 (6) ◽  
pp. 775-779 ◽  
Author(s):  
Z. Grzesik ◽  
Z. Jurasz ◽  
K. Adamaszek ◽  
S. Mrowec

AbstractThe oxidation kinetics of four Fe-Cr-Mn-Ni based steels, utilized in automobile industry, have been studied as a function of temperature (973–1273 K) and oxygen partial pressure (5–105 Pa). It has been shown that the rate of corrosion of these steels under isothermal conditions is determined by diffusion of reagents through the scale, which phase composition and morphology depend first of all on chromium and to some extend also on nickel and manganese contents. The highest oxidation resistance at high temperatures is observed in the case of the X33CrNiMn23-8 steel, containing highest chromium concentration, equal 23.4 wt.% and nickel equal 7.8 wt.%. The remaining three steels with virtually the same chromium content (≈20 wt.%), but lower than that in the first one, show comparable oxidation resistance. Small differences in the oxidation rates of these three steels may be related to different nickel and manganese contents. It has been found also that the rate of corrosion of all steels under investigation does not depend under steady state conditions on oxygen partial pressure.


2019 ◽  
Vol 66 (5) ◽  
pp. 638-643
Author(s):  
Jinsong Luo ◽  
Ligong Zhang ◽  
Haigui Yang ◽  
Nan Zhang ◽  
Yongfu Zhu ◽  
...  

Purpose This paper aims to study the oxidation kinetics of the nanocrystalline Al ultrathin films. The influence of structure and composition evolution during thermal oxidation will be observed. The reason for the change in the oxidation activation energy on increasing the oxidation temperature will be discussed. Design/methodology/approach Al thin films are deposited on the silicon wafers as substrates by vacuumed thermal evaporation under the base pressure of 2 × 10−4 Pa, where the substrates are not heated. A crystalline quartz sensor is used to monitor the film thickness. The film thickness varies in the range from 30 to 100 nm. To keep the silicon substrate from oxidation during thermal oxidation of the Al film, a 50-nm gold film was deposited on the back side of silicon substrate. Isothermal oxidation studies of the Al film were carried out in air to assess the oxidation kinetics at 400-600°C. Findings The activation energy is positive and low for the low temperature oxidation, but it becomes apparently negative at higher temperatures. The oxide grains are nano-sized, and γ-Al2O3 crystals are formed at above 500°C. In light of the model by Davies, the grain boundary diffusion is believed to be the reason for the logarithmic oxidation rate rule. The negative activation energy at higher temperatures is apparent, which comes from the decline of diffusion paths due to the formation of the γ-Al2O3 crystals. Originality/value It is found that the oxidation kinetics of nanocrystalline Al thin films in air at 400-600°C follows the logarithmic law, and this logarithmic oxidation rate law is related to the grain boundary diffusion. The negative activation energies in the higher temperature range can be attributed to the formation of γ-Al2O3 crystal.


2008 ◽  
Vol 368-372 ◽  
pp. 1750-1752 ◽  
Author(s):  
Ting Yan Tian ◽  
Chang Ling Zhou ◽  
Feng Sun ◽  
Zhi Qiang Cheng ◽  
Chong Hai Wang ◽  
...  

An oxidation kinetics model of hot-pressed ZrB2-SiC composites was established and then proved by experiments. The relationship between oxidation rate and temperature was attained by reaction activation energy and frequency factor at the different oxidation stages. Results showed that the relations between the oxidation gain of unit area and the oxidation time are linear, conic and parabolic, respectively, during the stage of the oxidation prophase, midterm and anaphase.


1996 ◽  
Vol 15 (6) ◽  
pp. 465-468 ◽  
Author(s):  
J. Brito Correia ◽  
M. Pereira Caldas ◽  
N. Shohoji ◽  
A. Cabral Ferro

RSC Advances ◽  
2017 ◽  
Vol 7 (62) ◽  
pp. 39341-39348 ◽  
Author(s):  
Min Chen ◽  
Xianhe Deng ◽  
Feiqiang He

Through a stirred bubbling apparatus, the kinetics of S(iv) oxidation in basic aluminum sulfate (BAS) rich solution were investigated by varying the components of the BAS solution, concentration of S(iv), temperature, air flow and oxygen partial pressure.


Author(s):  
Tomoyuki Shinoda ◽  
Shumpei Ozawa ◽  
Kenta Kawashima ◽  
Kazuhiko Kuribayashi ◽  
Tomoki Yamayoshi ◽  
...  

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