Study of the Sensing Mechanism of SnO2 Thin-Film Gas Sensors Using Hall Effect Measurements

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pp. 357-360 ◽  
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Regina da Conceição Corredeira Monteiro ◽  
Elvira Fortunato ◽  
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Yujia Wang ◽  
Guohua Jin ◽  
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1993 ◽  
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pp. 677-678 ◽  
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Hisao Ohnishi ◽  
Hirokazu Sasaki ◽  
Takeshi Matsumoto ◽  
Masamichi Ippommatsu


1991 ◽  
Vol 30 (Part 2, No. 2A) ◽  
pp. L172-L174 ◽  
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Tadashi Serikawa ◽  
Seiiti Shirai ◽  
Akio Okamoto ◽  
Shiro Suyama


1996 ◽  
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Ryosuke Konishi ◽  
Tomoyuki Osaki ◽  
Satoru Abe ◽  
Hiroasa Tanioka ◽  
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F. Quaranta ◽  
R. Rella ◽  
...  


1991 ◽  
Vol 69 (12) ◽  
pp. 8368-8374 ◽  
Author(s):  
Masamichi Ippommatsu ◽  
Hisao Ohnishi ◽  
Hirokazu Sasaki ◽  
Takeshi Matsumoto


2018 ◽  
Vol 31 (3) ◽  
pp. 20
Author(s):  
Sarmad M. M. Ali ◽  
Alia A.A. Shehab ◽  
Samir A. Maki

In this study, the ZnTe thin films were deposited on a glass substrate at a thickness of 400nm using vacuum evaporation technique (2×10-5mbar) at RT. Electrical conductivity and Hall effect measurements have been investigated as a function of variation of the doping ratios (3,5,7%) of the Cu element on the thin ZnTe films. The temperature range of (25-200°C) is to record the electrical conductivity values. The results of the films have two types of transport mechanisms of free carriers with two values of activation energy (Ea1, Ea2), expect 3% Cu. The activation energy (Ea1) increased from 29meV to 157meV before and after doping (Cu at 5%) respectively. The results of Hall effect measurements of ZnTe , ZnTe:Cu films show that all films were (p-type), the carrier concentration (1.1×1020 m-3) , Hall mobility (0.464m2/V.s) for pure ZnTe film, increases the carrier concentration (6.3×1021m-3) Hall mobility (2m2/V.s) for doping (Cu at 3%) film, but  decreases by increasing Cu concentration.



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