Effects of Boron-Doped on Photocatalysis and Hydrophilicity of TiO2 Film

2007 ◽  
Vol 336-338 ◽  
pp. 1924-1926 ◽  
Author(s):  
Hong Li ◽  
Gao Ling Zhao ◽  
Gang Xu ◽  
Gao Rong Han
Keyword(s):  
Thin Films ◽  
Photocatalytic Activity ◽  
Sol Gel ◽  
Tio2 Films ◽  
X Ray Diffraction ◽  
Tio2 Thin Films ◽  
X Ray ◽  
Glass Substrates ◽  
Atomic Force ◽  
Boron Doped

In order to investigate the effects of doping boron on the self-cleaning properties of TiO2 thin films, sol-gel method was employed to prepare TiO2 films with various amount of boron on the glass substrates. Atomic Force Microscope (AFM) and X-ray diffraction (XRD) were carried out to investigate the effects of boron on the microstructure and crystallization behavior of the thin films. The photocatalytic activity and the hydrophilicity of the films were also measured. The results showed that the photocatalytic activity of TiO2 films was improved by doping boron, and its hydrophilicity wasn’t destroyed. This can be ascribed to the enhancement of the surface energy, which was caused by the reduction of the crystal grain size of TiO2.

Visible-Light-Induced Photocatalytic Activity of Boron-Doped BiVO4

2014 ◽  
Vol 809-810 ◽  
pp. 890-894
Author(s):  
Dan Li ◽  
Lian Wei Shan ◽  
Gui Lin Wang ◽  
Li Min Dong ◽  
Wei Li ◽  
...  
Keyword(s):  
Photocatalytic Activity ◽  
Visible Light ◽  
Diffuse Reflectance ◽  
Diffuse Reflectance Spectroscopy ◽  
Sol Gel ◽  
Reflectance Spectroscopy ◽  
Scheelite Structure ◽  
X Ray Diffraction ◽  
X Ray ◽  
Boron Doped

Boron-BiVO4 samples were synthesized by sol-gel method. They were characterized by UV-vis diffuse reflectance spectroscopy, X-ray diffraction. Photocatalytic activity of the obtained BiVO4 samples was investigated through degrading methylene blue (MB). The results reveal that boron-BiVO4 catalysts have monoclinic scheelite structure. The BiVO4 and Co-BiVO4 photocatalysts were responsive to visible light. Co-BiVO4 photocatalyst showed higher photocatalytic activity than pure BiVO4, resulting in the significantly improved efficiency of degradation of MB.

scholarly journals Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method

Cerâmica ◽  
2002 ◽  
Vol 48 (305) ◽  
pp. 38-42 ◽  
Author(s):  
M. I. B. Bernardi ◽  
E. J. H. Lee ◽  
P. N. Lisboa-Filho ◽  
E. R. Leite ◽  
E. Longo ◽  
...  
Keyword(s):  
Thin Films ◽  
Growth Parameters ◽  
Structural Characteristics ◽  
Chemical Vapor ◽  
X Ray Diffraction ◽  
Tio2 Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Deposition Parameters

The synthesis of TiO2 thin films was carried out by the Organometallic Chemical Vapor Deposition (MOCVD) method. The influence of deposition parameters used during growth on the final structural characteristics was studied. A combination of the following experimental parameters was studied: temperature of the organometallic bath, deposition time, and temperature and substrate type. The high influence of those parameters on the final thin film microstructure was analyzed by scanning electron microscopy with electron dispersive X-ray spectroscopy, atomic force microscopy and X-ray diffraction.

Dielectric Properties of Sol-Gel Derived MgAl2O4 Thin Films

2012 ◽  
Vol 151 ◽  
pp. 314-318
Author(s):  
Ching Fang Tseng ◽  
Cheng Hsing Hsu ◽  
Chun Hung Lai
Keyword(s):  
Thin Films ◽  
Annealing Temperature ◽  
Sol Gel ◽  
Dissipation Factor ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Preheating Temperature ◽  
Surface Morphologies

This paper describes microstructure characteristics of MgAl2O4 thin films were deposited by sol-gel method with various preheating temperatures and annealing temperatures. Particular attention will be paid to the effects of a thermal treatment in air ambient on the physical properties. The annealed films were characterized using X-ray diffraction. The surface morphologies of treatment film were examined by scanning electron microscopy and atomic force microscopy. At a preheating temperature of 300oC and an annealing temperature of 700oC, the MgAl2O4 films with 9 μm thickness possess a dielectric constant of 9 at 1 kHz and a dissipation factor of 0.18 at 1 kHz.

STUDIES ON THE TiO2 THIN FILMS DOPED WITH Fe3+

2005 ◽  
Vol 19 (01n03) ◽  
pp. 671-673
Author(s):  
PENG XIAO ◽  
WANLU WANG
Keyword(s):  
Thin Films ◽  
Raman Spectroscopy ◽  
Electrical Properties ◽  
Sol Gel ◽  
Experimental Results ◽  
X Ray Diffraction ◽  
Tio2 Thin Films ◽  
Gel Method ◽  
X Ray ◽  
Nanometer Particles

The Fe 3+- TiO 2 thin films obtained through sol-gel method were characterized by x-ray diffraction, AFM and Raman spectroscopy. It was found that TiO 2 films consisted of nanometer particles. The experimental results shows that the nanometer TiO 2 thin films doped with Fe 3+ were greatly improved in the activity aspect. This may be ascribed to change their structure and electrical properties after doping with Fe 3+. The results were discussed theoretically in detail.

scholarly journals Characteristics and optical properties of Fe3+ doped SiO2/TiO2 thin films prepared by the sol-gel dip-coating method

2013 ◽  
Vol 16 (1) ◽  
pp. 92-100
Author(s):  
Chien Mau Dang ◽  
Dam Duy Le ◽  
Tam Thi Thanh Nguyen ◽  
Dung Thi My Dang
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Sol Gel ◽  
Dip Coating ◽  
X Ray Diffraction ◽  
Tio2 Thin Films ◽  
Water Contact ◽  
Glass Substrates ◽  
Coating Method ◽  
Dip Coating Method

In this study, we have successfully synthesized Fe3+ doped SiO2/TiO2 thin films on glass substrates using the sol-gel dip-coating method. After synthesizing, the samples were annealed at 5000C in the air for 1 hour. The characteristics and optical properties of Fe3+ doped SiO2/TiO2 films were then investigated by X-ray diffraction (XRD), ultraviolet-visible spectroscopy (UV-vis) and Fourier transform infrared spectroscopy (FT-IR). An antifogging ability of the glass substrates coated with the fabricated film is investigated and explained by a water contact angle under visible-light. The analyzed results also show that the crystalline phase of TiO2 thin films comprised only the anatase TiO2, but the crystalline size decreased from 8.8 to 5.9 nm. We also observed that the absorption edge of Fe3+- doped SiO2/TiO2 thin films shifted towards longer wavelengths (i.e. red shifted) from 371.7nm to 409.2 nm when the Fe3+-doped concentration increased from 0 to 1 % mol.

Growth of the Sol-Gel Based ZnO:Al Thin Films with High Doping Concentration

2012 ◽  
Vol 485 ◽  
pp. 144-148
Author(s):  
Jian Lin Chen ◽  
Yan Jie Ren ◽  
Jian Chen ◽  
Jian Jun He ◽  
Ding Chen
Keyword(s):  
Thin Films ◽  
Doping Concentration ◽  
Sol Gel ◽  
Zno Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Glass Substrates ◽  
High Doping Concentration ◽  
Doped Zno ◽  
Surface Morphologies

Preferentially oriented Al-doped ZnO thin films with doping concentration of 1, 2, 3, 5 and 10 mol% respectively were prepared on glass substrates via sol-gel route. The crystallinity of films was characterized by X-ray diffraction and the surface morphologies were observed by scanning electron microscopy. The results show that ZnO:Al films at low doping concentration (1, 2 mol%) grow into dense homogenous microstructure. However, as for high doping concentration (3, 5, 10 mol%), Al3+ precipitate in the form of amorphous Al2O3 and ZnO:Al films exhibit heterogeneous nucleation and exceptional growth of the big plate-like crystals at the interface of the amorphous Al2O3 and ZnO:Al matrix.

Comparison between the optical and surface properties of TiO2 and Ag/TiO2 thin films prepared by sol-gel process

2011 ◽  
Vol 1352 ◽  
Author(s):  
Marcelo M. Viana ◽  
Nelcy D. S. Mohallem
Keyword(s):  
Thin Films ◽  
Sol Gel ◽  
Refraction Index ◽  
Titanium Isopropoxide ◽  
X Ray Diffraction ◽  
Tio2 Thin Films ◽  
Force Microscopy ◽  
Atomic Force ◽  
Vis Spectroscopy ◽  
Sol Gel Process

ABSTRACTColloidal precursor solutions, obtained from a mixture of titanium isopropoxide, isopropyl alcohol and silver nitrate, were used to fabricate amorphous TiO2 and Ag/TiO2 thin films by sol-gel process. The films were deposited on borosilicate substrates, which were heated at 400 °C for 30 minutes and cooled rapidly to the formation of amorphous coatings. The films were investigated by X-ray diffraction, scanning electron microscopy, atomic force microscopy and UV-vis spectroscopy. The thickness, roughness, refraction index, and particle size of the TiO2 and Ag/TiO2 films were determined and compared. Finally, hydrophobic-hydrophilic property was evaluated to the thin films produced.

scholarly journals Impact of ZnO Atomic Ratio on Structural, Morphological and Some Optical Properties of (SnO2)1-x (ZnO)x Thin Films

2020 ◽  
pp. 333-340
Author(s):  
Donia Yas Khudair ◽  
Ramiz Ahmed Al Ansari
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Energy Gap ◽  
Atomic Ratio ◽  
X Ray Diffraction ◽  
X Ray ◽  
Glass Substrates ◽  
Atomic Force ◽  
Uv Visible ◽  
Longitudinal Structures

In this work, SnO2 and (SnO2)1-x(ZnO)x composite thin films with different ZnO atomic ratios (x=0, 5, 10, 15 and 20%) were prepared by pulsed laser deposition technique on clean glass substrates at room temperature without any treatment. The deposited thin films were characterized by x-ray diffraction atomic force microscope  and UV-visible spectrophotometer to study the effect of the ZnO atomic ratio on their structural, morphological and optical properties. It was found that the crystallinety and the crystalline size vary according to ZnO atomic ratio. The surface appeared as longitudinal structures which was convert to spherical shapes with increasing ZnO atomic ratio. The optical transmission and energy gap increased with increasing ZnO atomic ratio. 

ON THE ELECTRONIC TRANSPORT MECHANISM IN MAGNETRON-SPUTTERED POLYCRYSTALLINE ZnO THIN FILMS

2010 ◽  
Vol 24 (31) ◽  
pp. 6079-6090 ◽  
Author(s):  
I. I. RUSU ◽  
M. SMIRNOV ◽  
G. G. RUSU ◽  
A. P. RAMBU ◽  
G. I. RUSU
Keyword(s):  
Thin Films ◽  
Electronic Transport ◽  
Hexagonal Structure ◽  
Zno Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force ◽  
Crystallite Boundary

Zinc oxide ( ZnO ) thin films were deposited onto glass substrates by d.c. magnetron sputtering. The structural analysis, by X-ray diffraction and atomic force microscopy, indicate that the studied films are polycrystalline and have a wurtzite (hexagonal) structure. The film crystallites are preferentially oriented with (002) planes parallel to the substrates. The mechanism of electronic transport is explained in terms of Seto's model elaborated for polycrystalline semiconducting films (crystallite boundary trapping theory). Some parameters of used model (impurity concentration, density and energy of the trapping states, etc.) have been calculated. The optical bandgap (Eg0 = 3.28–3.37 eV ) was determined from absorption spectra.

Synthesis and Characterization of Nanocrystalline TiO2 Thin Films by Sol-Gel Dip Coating Method

2013 ◽  
Vol 678 ◽  
pp. 108-112 ◽  
Author(s):  
Narayanaswamy Gokilamani ◽  
N. Muthukumarasamy ◽  
Mariyappan Thambidurai
Keyword(s):  
Thin Films ◽  
Sol Gel ◽  
Dip Coating ◽  
X Ray Diffraction ◽  
Tio2 Thin Films ◽  
Atomic Force ◽  
Coating Method ◽  
Nanocrystalline Titanium ◽  
Dip Coating Method

Nanocrystalline titanium dioxide (TiO2) thin films have been prepared by dip coating method. The TiO2 thin films have been coated on glass substrate and annealed at 400, 450 and 500° C respectively. The X- ray diffraction pattern shows that TiO2 nanocrystalline thin films are of anatase structure and the grain size is found to be in the range of 20-35 nm. The annealed films have been observed to be nanocrystalline in nature and the crystallinity has been observed to improve on annealing. The surface topography of the films has been studied using atomic force microscope. The optical properties have been studied using transmittance spectra. The band gap has been found to lie in the range of 3.70 to 3.83 eV depending on the annealing temperature.

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