Fluorine Doped Tin Oxide Coatings - Over 50 Years and Going Strong

2008 ◽  
Vol 380 ◽  
pp. 169-178 ◽  
Author(s):  
Peter Gerhardinger ◽  
David Strickler

Thin film coatings of fluorine doped tin oxide on glass were first produced in the 1940’s as part of the World War II effort. Generically known as TCO (Transparent Conductive Oxide) Coatings, the primary use was for antifogging coatings for aircraft transparencies using an electrical current to heat the glass assembly. Nearly 60 years later, these coatings are still used in cockpit glazings. Although the first generation coatings were applied using spray pyrolysis on heated glass panes, by 1990 these coatings were being applied directly on the float glass ribbon during the primary glass manufacturing operation, using Atmospheric Pressure Chemical Vapor Deposition (APCVD). As part of a color suppressed multi-layer structure, these coatings met the aesthetic and performance criteria for architectural low E glazings, and spawned new applications in electrochromic devices, heated freezer doors, radiant glass heaters, EMI/RFI Shielding, and the largest growing segment in glass – thin film photovoltaic panels. In this paper we discuss the characteristics of the on-line production, the performance characteristics of the coatings, the end use requirements, and the massive infrastructure in place worldwide to support the volume requirements. We compare the properties of SnO2:F to other emerging TCO materials such as zinc oxide.

2009 ◽  
Vol 1165 ◽  
Author(s):  
Xiaonan Li

AbstractTin oxide (SnO2) is a durable, inexpensive transparent conducting oxide (TCO) material used for thin-film photovoltaic devices. However, the optical properties of conducting SnO2:F are generally not as good as in other conducting TCO materials such as ITO and ZnO:Al. Our previous analyses indicate that for thin-film solar cells, improving the optical properties of SnO2-coated glass could enhance photon collection and gain up to 10% additional photocurrent. Previously, we showed that some commercial SnO2 samples could have much higher optical absorption than others [2]. In this work, we continue our study on causes that could contribute to the high optical absorption of SnO2 films. The SnO2:F samples are fabricated by low-pressure metal-organic chemical vapor deposition or atmospheric-pressure chemical vapor deposition with tin precursors that includes different amounts of chlorine. Optical, electrical, and compositional analyses were performed. In addition to the free-carrier-introduced optical absorption, the non-active dopant also impacts the optical absorption. Among the SnO2 films fabricated with different precursors, the optical properties show a relationship based on the level of chlorine in the precursors and films. With a low-optical-absorption SnO2 layer, the solar cell could have better photon collection and a higher short-circuit current density.


1996 ◽  
Vol 426 ◽  
Author(s):  
Peter F. Gerhardinger ◽  
Richard J. Mccurdy

AbstractThe flat glass industry successfully commercialized pyrolytically deposited low emissivity glass based on color-suppressed fluorine-doped tin oxide in 1990. The current production capability of this product approaches 500,000 m2 of coated glass per year. Spin-off products for the photovoltaic (PV) industry were introduced by LOF in 1991 and enjoy considerable success in this emerging technology. Many PV researchers, however, still prefer to produce optimized tin oxide off-line in CVD furnaces as they can be produced on higher performing but higher cost substrates. In this paper, we discuss the characteristics of on-line production of PV transparent conductors (TCO), including the tradeoffs required when a coating process is incorporated onto a float glass line. We conclude by suggesting that eventual large scale commercialization of thin film photovoltaics dictates the use of on-line TCO based on economics, the excellent uniformity and repeatability, and ready availability. We believe that the PV researchers are best served by understanding the capabilities of on-line tin oxide production, and tailoring their programs towards the characteristics of these new cost effective TCOs.


2018 ◽  
Author(s):  
Muhammad Arif Riza ◽  
Abu Bakar Abd Rahman ◽  
Suhaila Sepeai ◽  
Norasikin Ahmad Ludin ◽  
Mohd Asri Mat Teridi ◽  
...  

RSC Advances ◽  
2016 ◽  
Vol 6 (108) ◽  
pp. 106374-106379 ◽  
Author(s):  
Po-Tsun Liu ◽  
Chih-Hsiang Chang ◽  
Chur-Shyang Fuh

The influence of a backchannel passivation layer on the ambient stability of amorphous indium-zinc-tin-oxide thin-film transistors was studied. The ALD Al2O3 films and plasma-enhanced chemical vapor deposited SiO2 films were separately used as channel passivation layers.


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