In Situ RHEED Analysis of the Ge-Induced Surface Reconstructions on 6H-SiC(0001)

2002 ◽  
Vol 389-393 ◽  
pp. 725-728 ◽  
Author(s):  
Petia Weih ◽  
Thomas Stauden ◽  
Jörg Pezoldt
Author(s):  
O.L. Krivanek ◽  
G.J. Wood

Electron microscopy at 0.2nm point-to-point resolution, 10-10 torr specimei region vacuum and facilities for in-situ specimen cleaning presents intere; ing possibilities for surface structure determination. Three methods for examining the surfaces are available: reflection (REM), transmission (TEM) and profile imaging. Profile imaging is particularly useful because it giv good resolution perpendicular as well as parallel to the surface, and can therefore be used to determine the relationship between the surface and the bulk structure.


1997 ◽  
Vol 482 ◽  
Author(s):  
X. Q. Shen ◽  
S. Tanaka ◽  
S. Iwai ◽  
Y. Aoyagi

AbstractGaN growth was performed on 6H-SiC (0001) substrates by gas-source molecular beam epitaxy (GSMBE), using ammonia (NH3) as a nitrogen source. Two kinds of reflection high-energy electron diffraction (RHEED) patterns, named (1×1) and (2×2), were observed during the GaN growth depending on the growth conditions. By careful RHEED study, it was verified that the (1×1) pattern was corresponded to a H2-related nitrogen-rich surface, while (2×2) pattern was resulted from a Ga-rich surface. By x-ray diffraction (XRD), photoluminescence (PL) and atomic force microscopy (AFM) characterizations, it was found that the GaN quality changed drastically grown under different RHEED patterns. GaN film grown under the (1×1) RHEED pattern showed much better qualities than that grown under the (2×2) one.


1991 ◽  
Vol 237 ◽  
Author(s):  
R. Stalder ◽  
C. Schwarz ◽  
H. Sirringhaus ◽  
H. VON Känel

ABSTRACTEpitaxial single-domain CoSi2(100) layers were grown on Si(100) by use of a template technique. In-situ scanning tunneling microscopy (STM) and reflection high energy electron diffraction (RHEED) were used for a detailed surface study. The (√2×√2)R45 reconstruction of the Co-rich “C-surface” and the (3√2×√2)R45 as well as a newly discovered (√2×√2)R45 of the Si-rich “S-surface” were resolved in real space and are discussed in detail. The transition from the C- to the S-surface above 500 °C is related to a (2×2) reconstruction.


2001 ◽  
Vol 79 (15) ◽  
pp. 2354-2356 ◽  
Author(s):  
J. J. Zinck ◽  
R. S. Ross ◽  
J. H. G. Owen ◽  
W. Barvosa-Carter ◽  
F. Grosse ◽  
...  

Author(s):  
Ping Lu ◽  
David J. Smith

Surface profile imaging at resolutions of better than 2Å is highly suitable for studies of surface structures and reactions. In the case of semiconductor materials, the main challenge is to prepare surfaces free of any contamination. The technique has previously been used to study surface reconstructions of Si and CdTe. In our previous observations, clean surfaces of CdTe were obtained by careful control of the incident electron beam within a JEM-4000EX high resolution electron microscope with a pressure of 10-7 torr. In the present study, observations of reconstructions and dynamic phenomena on CdTe surfaces were carried out with a Phillips-430ST, modified for Ultra-High Vacuum in the vicinity of the specimen and equipped with an in situ heating facility. The base vacuum in the region of the sample could usually reach ∼3×l0-9 torr after baking the microscope column at ∼120°C for 36 hours. The CdTe specimen was prepared by cutting a large single crystal into 3mm discs in a [110] direction, then mechanically polishing to a thickness of ∼20 microns, and finally ion milling to perforation.When viewed along a [110] projection, the CdTe sample was found to be dominated by clean or nearly clean (111) and (110) surfaces(with amorphous materials less than 5Å) whilst the (001) surface was usually very short and rough. A completely clean surface was obtained by in situ annealing of the crystal to about 200°. The (110) surface was then found to be reconstructed with a very characteristic chevron appearance in the manner described previously. Long and flat CdTe(OOl) surfaces were obtained by insitu annealing of the crystal at ∼510°C at which temperature edges of the crystal started to gradually sublime. Characterization of the surface structure was then possible when the crystal was cooled back down to temperatures below about 300°C. It was found that the (001) surface had a (2×1) reconstruction at temperatures below about 200°C which transformed reversibly into a (3×1) reconstruction over the approximate temperature range of 200°C<T<300°C. Figures la and lb show the (2×1) and (3×1) reconstructed (001) surfaces, viewed along the [110] projection, which were recorded at temperatures of 140°C and 240°C respectively. Structural models for the (2×1) and (3×1) reconstructions, obtained directly on the basis of the experimental images, are shown in Figs.2a and 2b respectively. The (2×1) reconstruction involves a 1/2 monolayer of Cd vacancies and a very large inward contraction of the remaining Cd surface atoms, which then displace the second layer of Te atoms as indicated. This model is similar to that proposed by Chadi for the Ga-rich (2×1) reconstructed GaAs(100) surface. The (3×1) reconstruction involves both the formation of surface dimers and the presence of vacancies at the surface. Every third atomic-pair is missing along the [1,-1,0] direction, and the remaining two atom pairs at the surface form the surface dimer. Although the (3×1) reconstruction has a larger number of electrons in dangling bonds, a surface with vacancies can be relaxed to reduce the strain energy due to the surface dimers. The directions of the atomic displacements away from the ideal dimer positions are indicated in the figure. Relatively large atomic displacements for several layers into the bulk are clearly visible in experimental images, as seen in Fig.lb. Further details of the surface reconstructions can be found elsewhere.


2016 ◽  
Vol 109 (20) ◽  
pp. 201601 ◽  
Author(s):  
Weizong Xu ◽  
Preston C. Bowes ◽  
Everett D. Grimley ◽  
Douglas L. Irving ◽  
James M. LeBeau

Author(s):  
T. S. Savage ◽  
R. Ai ◽  
L. D. Marks

A variety of techniques including LEED, STM and RHEED have been used to study surface reconstructions on the silicon <111> surface. Additionally, ultra high vacuum-transmission electron microscopy (UHV-TEM) has been used for a limited number of studies most notably on the 7x7 reconstructed surface. The limiting factor in these studies has been the availability of microscopes capable of in-situ sample preparation and imaging in a UHV environment. The Hitachi UHV-H9000 located at Northwestern University has recently been used to observe several surface reconstructions on a single crystal silicon <111> thin film. Transmission electron diffraction (TED) patterns were obtained for 7x7, and 5x1 surface reconstructions.


Materials ◽  
2021 ◽  
Vol 14 (23) ◽  
pp. 7332
Author(s):  
Yunjie Liu ◽  
Huanhuan Yuan ◽  
Hui Wang ◽  
Zhiwei Wang

We report on thermal stability and phase transition behaviors of triangular Au nanoprisms through in situ heating transmission electron microscopy. With rising temperature, Au nanoprisms exhibit fluctuating surface reconstructions at the corner regions. When a quasi-melting state is reached at the temperature below bulk melting points, the evaporation is initiated commonly at a corner with low curvature and containing sharp intersection points. The subsequent annealing process leads to the gradual evaporation, which, in the absence of thick carbon coverages, is accompanied by marked shape reconstructions. The thermal stability and evaporation behaviors are not evidently regulated by nanoprism aggregations.


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