scholarly journals CVD of CrO2 Thin Films: Influence of the Deposition Parameters on their Structural and Magnetic Properties

2006 ◽  
Vol 514-516 ◽  
pp. 284-288 ◽  
Author(s):  
Ana F.S. Mota de Oliveira ◽  
António J. Silvestre ◽  
Pedro M. Sousa ◽  
Olinda Conde ◽  
M. Alexandra Rosa ◽  
...  

This work reports on the synthesis of CrO2 thin films by atmospheric pressure CVD using chromium trioxide (CrO3) and oxygen. Highly oriented (100) CrO2 films containing highly oriented (0001) Cr2O3 were grown onto Al2O3(0001) substrates. Films display a sharp magnetic transition at 375 K and a saturation magnetization of 1.92 µB/f.u., close to the bulk value of 2 µB/f.u. for the CrO2.

2013 ◽  
Vol 690-693 ◽  
pp. 1702-1706 ◽  
Author(s):  
Shuang Jun Nie ◽  
Hao Geng ◽  
Jun Bao Wang ◽  
Lai Sen Wang ◽  
Zhen Wei Wang ◽  
...  

NiZn-ferrite thin films were deposited onto silicon and glass substrates by radio frequency magnetron sputtering at room temperature. The effects of the relative oxygen flow ratio on the structure and magnetic properties of the thin films were investigated. The study results reveal that the films deposited under higher relative oxygen flow ratio show a better crystallinity. Static magnetic measurement results indicated that the saturation magnetization of the films was greatly affected by the crystallinity, grain dimension, and cation distribution in the NiZn-ferrite films. The NiZn-ferrite thin films with a maximum saturation magnetization of 151 emucm-3, which is about 40% of the bulk NiZn ferrite, was obtained under relative oxygen flow ratio of 60%.


2021 ◽  
Vol 118 (15) ◽  
pp. 152402
Author(s):  
Sudhir Regmi ◽  
Zhong Li ◽  
Abhishek Srivastava ◽  
Rabin Mahat ◽  
Shambhu KC ◽  
...  

2014 ◽  
Vol 50 (8) ◽  
pp. 1-4 ◽  
Author(s):  
Robina Ashraf ◽  
Saira Riaz ◽  
Mahwish Bashir ◽  
Usman Khan ◽  
Shahzad Naseem

2015 ◽  
Vol 2015 ◽  
pp. 1-5 ◽  
Author(s):  
Gui-fang Li ◽  
Shibin Liu ◽  
Shanglin Yang ◽  
Yongqian Du

We prepared magnetic thin films Ni81Fe19on single-crystal Si(001) substrates via single graphene layer through magnetron sputtering for Ni81Fe19and chemical vapor deposition for graphene. Structural investigation showed that crystal quality of Ni81Fe19thin films was significantly improved with insertion of graphene layer compared with that directly grown on Si(001) substrate. Furthermore, saturation magnetization of Ni81Fe19/graphene/Si(001) heterostructure increased to 477 emu/cm3with annealing temperatureTa=400°C, which is much higher than values of Ni81Fe19/Si(001) heterostructures withTaranging from 200°C to 400°C.


2002 ◽  
Vol 189 (3) ◽  
pp. 883-887
Author(s):  
Sam Jin Kim ◽  
Woo Chul Kim ◽  
In Bo Shim ◽  
Chul Sung Kim ◽  
Seung Wha Lee

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