scholarly journals Ultra-Low Temperature Chillers for Semiconductor Manufacturing Process

2021 ◽  
Author(s):  
Jung-In Yoon ◽  
Chang-Hyo Son ◽  
Sung-Hoon Seol ◽  
Ji-Hoon Yoon

The growth of the semiconductor market and advancement of manufacturing technology have led to an increase in wafer size and highly integrated semiconductor devices. The temperature of the supplied cooling medium from the chiller that removes the heat produced in the semiconductor manufacturing process is required to be at a lower level because of the high integration. The Joule-Thomson cooling cycle, which uses a mixed refrigerant (MR) to produce the cooling medium at a level of −100°C required for the semiconductor process, has recently gained attention. When a MR is used, the chiller’s performance is heavily influenced by the composition and proportions of the refrigerant charged to the chiller system. Therefore, this paper introduces a cooling cycle that uses an MR to achieve the required low temperature of −100°C in the semiconductor manufacturing process and provides the results of simple experiments to determine the effects of different MR compositions.

Author(s):  
Anqi Qiu ◽  
William Lowe ◽  
Mridul Arora

Abstract Nanoprobing systems have evolved to meet the challenges from recent innovations in the semiconductor manufacturing process. This is demonstrated through an exhibition of standard SRAM measurements on TSMC 7 nm FinFET technology. SEM based nanoprober is shown to meet or exceed the requirements for measuring 7nm technology and beyond. This paper discusses in detail of the best-known methods for nanoprobing on 7nm technology.


2020 ◽  
Vol 8 (6) ◽  
pp. 1915-1922 ◽  
Author(s):  
Yunhuan Yuan ◽  
Senpei Xie ◽  
Chaogang Ding ◽  
Xianbiao Shi ◽  
Jie Xu ◽  
...  

In this work, we proposed a scheme to obtain flexible wafer-size inorganic semiconductor devices and discussed their mechanism of this super flexibility.


RSC Advances ◽  
2015 ◽  
Vol 5 (126) ◽  
pp. 103901-103906 ◽  
Author(s):  
Fuyun He ◽  
Zhisheng Zhang

In semiconductor manufacturing, the multilayer overlay lithography process is a typical multistage manufacturing process; one of the key factors that restrict the reliability and yield of integrated circuit chips is overlay error between the layers.


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