Doped Oxide Films by Chemical Vapor Deposition in an Evacuated System

Denki Kagaku oyobi Kogyo Butsuri Kagaku ◽

10.5796/kogyobutsurikagaku.41.491 ◽

1973 ◽

Vol 41 (7) ◽

pp. 491-497 ◽

Author(s):

Eiki TANIKAWA ◽

Taro OKABE ◽

Kazuo MAEDA

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

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NaCl-Type Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l1448 ◽

1993 ◽

Vol 32 (Part 2, No. 10A) ◽

pp. L1448-L1450 ◽

Author(s):

Eiji Fujii ◽

Atsushi Tomozawa ◽

Satoru Fujii ◽

Hideo Torii ◽

Masumi Hattori ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Metalorganic Chemical

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Preparation and characterization of aluminum oxide films by plasma enhanced chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/s0257-8972(96)03100-3 ◽

1997 ◽

Vol 90 (1-2) ◽

pp. 102-106 ◽

Author(s):

C.H. Lin ◽

H.L. Wang ◽

M.H. Hon

Keyword(s):

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

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Chemical Vapor Deposition of Transparent, Electrically Conductive Tin Oxide Films Formed from Dibutyl Tin Diacetate

Journal of The Electrochemical Society ◽

10.1149/1.2134412 ◽

1975 ◽

Vol 122 (8) ◽

pp. 1144-1149 ◽

Author(s):

James Kane ◽

H. P. Schweizer ◽

Werner Kern

Keyword(s):

Chemical Vapor Deposition ◽

Tin Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Electrically Conductive ◽

Tin Oxide Films

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Effect of fluorine on chemical and electrical properties of room temperature oxide films prepared by plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.121027 ◽

1998 ◽

Vol 72 (10) ◽

pp. 1247-1249 ◽

Author(s):

Kihong Kim ◽

Juho Song ◽

Daehyuk Kwon ◽

G. S. Lee

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Room Temperature ◽

Oxide Films ◽

Chemical Vapor ◽

Temperature Oxide

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Properties of nitrogen-doped indium oxide films prepared using chemical vapor deposition technique for photoelectrochemical application

Materials Chemistry and Physics ◽

10.1016/j.matchemphys.2021.125244 ◽

2022 ◽

Vol 275 ◽

pp. 125244

Author(s):

T.M. Aper ◽

F.K. Yam ◽

K.P. Beh

Keyword(s):

Chemical Vapor Deposition ◽

Indium Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Deposition Technique ◽

Nitrogen Doped ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Indium Oxide Films

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Properties of fluorine-doped tin oxide films produced by atmospheric pressure chemical vapor deposition from tetramethyltin, bromotrifluoromethane and oxygen

Thin Solid Films ◽

10.1016/0040-6090(92)90767-6 ◽

1992 ◽

Vol 214 (2) ◽

pp. 175-187 ◽

Author(s):

James Proscia ◽

Roy G. Gordon

Keyword(s):

Chemical Vapor Deposition ◽

Tin Oxide ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Oxide Films ◽

Chemical Vapor ◽

Pressure Chemical ◽

Tin Oxide Films

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Macroscale computer simulations to investigate the chemical vapor deposition of thin metal-oxide films

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2007.04.102 ◽

2007 ◽

Vol 201 (22-23) ◽

pp. 8838-8841 ◽

Author(s):

E. Neyts ◽

A. Bogaerts ◽

M. De Meyer ◽

S. Van Gils

Keyword(s):

Chemical Vapor Deposition ◽

Metal Oxide ◽

Computer Simulations ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Metal Oxide Films

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Chemical vapor deposition of tin oxide films

10.1109/iedm.1975.188836 ◽

1975 ◽

Author(s):

B.J. Baliga ◽

S.K. Ghandhi

Keyword(s):

Chemical Vapor Deposition ◽

Tin Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Tin Oxide Films

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Plasma enhanced chemical vapor deposition of silicon oxide films using TMOS/O2 gas and plasma diagnostics

Thin Solid Films ◽

10.1016/s0040-6090(03)01127-1 ◽

2003 ◽

Vol 444 (1-2) ◽

pp. 125-131 ◽

Author(s):

S.B. Bang ◽

T.H. Chung ◽

Y. Kim

Keyword(s):

Chemical Vapor Deposition ◽

Plasma Diagnostics ◽

Vapor Deposition ◽

Silicon Oxide ◽

Oxide Films ◽

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Plasma-assisted chemical vapor deposition and characterization of high quality silicon oxide films

Thin Solid Films ◽

10.1016/0040-6090(90)90211-u ◽

1990 ◽

Vol 193-194 ◽

pp. 595-609 ◽

Author(s):

S.V Nguyen ◽

D Dobuzinsky ◽

D Dopp ◽

R Gleason ◽

M Gibson ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Oxide ◽

Oxide Films ◽

Chemical Vapor ◽

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