Robust Data Retention and Superior Endurance of Silicon–Oxide–Nitride–Oxide–Silicon-Type Nonvolatile Memory with NH3-Plasma-Treated and Pd-Nanocrystal-Embedded Charge Storage Layer
2012 ◽
Vol 51
(4S)
◽
pp. 04DD05
◽
2012 ◽
Vol 51
◽
pp. 04DD05
◽
Keyword(s):
2012 ◽
Vol 52
(8)
◽
pp. 1627-1631
◽
Keyword(s):
2007 ◽
Vol 46
(10A)
◽
pp. 6463-6468
◽
2005 ◽
Vol 44
(9A)
◽
pp. 6380-6384
◽
Keyword(s):
Keyword(s):
2004 ◽
Vol 43
(4B)
◽
pp. 2207-2210
◽
Keyword(s):