Investigation and Comparison of Quantum-Capacitance Induced Inversion-Charge Loss for Ultra-Thin-Body and Double-Gate III-V n-MOSFETs

Author(s):  
S.L. Shen ◽  
H.H. Shen ◽  
C.H. Yu ◽  
P. Su
2008 ◽  
Vol 17 (8) ◽  
pp. 3077-3082 ◽  
Author(s):  
Luan Su-Zhen ◽  
Liu Hong-Xia

2006 ◽  
Vol 53 (6) ◽  
pp. 3363-3371 ◽  
Author(s):  
D. Munteanu ◽  
V. Ferlet-Cavrois ◽  
J. L. Autran ◽  
P. Paillet ◽  
J. Baggio ◽  
...  

2013 ◽  
Vol 12 (01) ◽  
pp. 1350005 ◽  
Author(s):  
VIMALA PALANICHAMY ◽  
N. B. BALAMURUGAN

An analytical model for double-gate (DG) MOSFETs considering quantum mechanical effects is proposed in this paper. Schrödinger and Poisson's equations are solved simultaneously using a variational approach. Solving the Poisson and Schrödinger equations simultaneously reveals quantum effects (QME) that influence the performance of DG MOSFETs. This model is developed to provide an analytical expression for inversion charge distribution function for all regions of device operation. This expression is used to calculate the other important parameters like inversion layer centroid, inversion charge, gate capacitance, drain current and transconductance. We systematically evaluate and analyze the parameters of DG MOSFETs considering QME. The analytical solutions are simple, accurate and provide good physical insight into the quantization caused by quantum confinement under various gate biases. The analytical results of this model are verified by comparing the data obtained with one-dimensional self-consistent numerical solutions of Poisson and Schrödinger equations known as SCHRED.


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