Pixe, A Method of High Sensitivity for Multi-Elemental Analysis of Thin Samples and Surface Layers

1980 ◽  
pp. 398-401
Author(s):  
F. Gloystein ◽  
H. Jupe ◽  
F.-W. Richter ◽  
U. Wätjen
Keyword(s):  
Elemental Analysis ◽  
High Sensitivity ◽  
Surface Layers ◽  
Thin Samples

A New Technique for the Elemental Analysis of Thin Surface Layers of Solids

1971 ◽  
Vol 19 (9) ◽  
pp. 350-352 ◽  
Author(s):  
J. W. Coburn ◽  
Eric Kay
Keyword(s):  
Elemental Analysis ◽  
New Technique ◽  
Surface Layers ◽  
A New Technique

High-Sensitivity ESCA Instrument

1972 ◽  
Vol 16 ◽  
pp. 90-101 ◽  
Author(s):  
R. D. Davies ◽  
H. K. Herglotz ◽  
J. D. Lee ◽  
H. L. Suchan
Keyword(s):  
Electron Spectroscopy ◽  
Chemical Shifts ◽  
High Sensitivity ◽  
Energy Analyzer ◽  
Surface Layers ◽  
Solid Samples ◽  
Efficient Operation ◽  
X Ray ◽  
Analysis Instrument ◽  
Sample Chamber

AbstractA new ESCA (electron spectroscopy for chemical analysis) instrument has been developed to provide high sensitivity and efficient operation for laboratory analysis of composition and chemical bonding in very thin surface layers of solid samples. High sensitivity is achieved by means of the high-intensity, efficient X-ray source described by Davies and Herglotz at the 1968 Denver X-Ray Conference, in combination with the new electron energy analyzer described by Lee at the 1972 Pittsburgh Conference on Analytical Chemistry and Applied Spectroscopy. A sample chamber designed to provide for rapid introduction and replacement of samples has adequate facilities for various sample treatments and conditioning followed immediafely by ESCA analysis of the sample.Examples of application are presented, demonstrating the sensitivity and resolution achievable with this instrument. Its usefulness in trace surface analysis is shown and some “chemical shifts” measured by the instrument are compared with those obtained by X-ray spectroscopy.

scholarly journals Composition of uranium oxide surface layers analyzed by μ-Raman Spectroscopy

2003 ◽  
Vol 802 ◽  
Author(s):  
Wigbert J. Siekhaus
Keyword(s):  
Raman Spectroscopy ◽  
Fourier Transform ◽  
Uranium Oxide ◽  
Diffuse Reflectance ◽  
High Sensitivity ◽  
Depth Resolution ◽  
Oxide Thickness ◽  
Oxide Surface ◽  
Surface Layers ◽  
The Past

AbstractOxide thickness and composition averaged over a few square millimeter have been measured with nm thickness resolution by diffuse reflectance Fourier transform infrared (FTIR) spectroscopy. μ-Raman spectroscopy has been done on powders and bulk samples in the past, and can now be done on surfaces layers with μm lateral and depth resolution using con-focal microscopy. Here we apply con-focal-microscopy-based μ -Raman spectroscopy to a freshly polished/lightly oxidized and to heavily oxidized uranium to determine its sensitivity. The spectra show that μ-Raman spectroscopy does detect oxide thickness and oxide composition with high sensitivity.

Surface Characterization by Reflection Electron Microscopy (REM)

1984 ◽  
Vol 41 ◽  
Author(s):  
Tung Hsu ◽  
J. M. Cowley
Keyword(s):  
Electron Microscopy ◽  
Surface Characterization ◽  
Crystal Surface ◽  
Stacking Faults ◽  
High Sensitivity ◽  
High Energy ◽  
Surface Layers ◽  
High Energy Electrons ◽  
Unique Method ◽  
Reflection Electron Microscopy

AbstractReflection electron microscopy (REM) utilizes the Bragg reflected high energy electrons to form the image of a crystal surface. Images of dislocations, atomic steps, reconstructions of surface layers of atoms and adatoms, stacking faults and twinning, superlattices, etc., have been successfully observed on a wide variety of specimens. Contrast is mainly due to diffraction and phase, which distiguished REM as a unique method for high spacial resolution and high sensitivity imaging of the surfaces of bulk specimens. REM can be effectively performed under UHV as well as under the moderate vacuum of an ordinary commercial electron microscope.

scholarly journals High Definition X-Ray Fluorescence: Principles and Techniques

2008 ◽  
Vol 2008 ◽  
pp. 1-10 ◽  
Author(s):  
Z. W. Chen ◽  
Walter M. Gibson ◽  
Huapeng Huang
Keyword(s):  
Elemental Analysis ◽  
State Of The Art ◽  
Industrial Process ◽  
High Sensitivity ◽  
Industrial Applications ◽  
High Definition ◽  
X Ray ◽  
Online Measurements ◽  
Edxrf Technique ◽  
Doubly Curved

Energy dispersive X-ray fluorescence (EDXRF) is a well-established and powerful tool for nondestructive elemental analysis of virtually any material. It is widely used for environmental, industrial, pharmaceutical, forensic, and scientific research applications to measure the concentration of elemental constituents or contaminants. The fluorescing atoms can be excited by energetic electrons, ions, or photons. A particular EDXRF method, monochromatic microfocus X-ray fluorescence (MμEDXRF), has proven to be remarkably powerful in measurement of trace element concentrations and distributions in a large variety of important medical, environmental, and industrial applications. When used with state-of-the-art doubly curved crystal (DCC) X-ray optics, this technique enables high-sensitivity, compact, low-power, safe, reliable, and rugged analyzers for insitu, online measurements in industrial process, clinical, and field settings. This new optic-enabled MμEDXRF technique, called high definition X-ray fluorescence (HD XRF), is described in this paper.

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