Study on a multifield coupling mechanism and a numerical simulation method of a pulsed laser deposition process from a disk laser

2021 ◽  
Vol 127 (1) ◽  
Author(s):  
Xing Han ◽  
Cheng Da Zhang ◽  
Chang Li ◽  
Zhi Bin Yu ◽  
BaoGui Zhang
Keyword(s):  
Numerical Simulation ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Simulation Method ◽  
Deposition Process ◽  
Laser Deposition ◽  
Coupling Mechanism ◽  
Disk Laser ◽  
Numerical Simulation Method

A Numerical Simulation of Pulsed Laser Deposition

1994 ◽  
Vol 354 ◽  
Author(s):  
William T. Laughlin ◽  
Edmond Y. Lo
Keyword(s):  
Numerical Simulation ◽  
Pulsed Laser Deposition ◽  
Cross Sections ◽  
Pulsed Laser ◽  
Deposition Process ◽  
Laser Wavelength ◽  
Film Deposition ◽  
Laser Deposition ◽  
Laser Fluences ◽  
Deposition Parameters

AbstractA numerical simulation of the pulsed laser deposition process has been developed. This model is applied to pulsed laser deposition of carbon, a solid lubricant material. At laser fluences above the ablation threshold, the vapor density and temperature at the substrate are sufficiently high that a continuum flow exists. For typical pulsed laser deposition parameters, plume vapor temperatures and densities are insufficient for significant ionization. However, plume absorption does take place and is regulated by wavelength dependent absorption cross sections of the molecular species. Vapor expansion velocities depend on the absorption of laser radiation and thus the laser wavelength. A simple kinetic theory of deposition predicts the film deposition rate and film thickness profile.

Effects of Single-Crystalline GaN Target on GaN Thin Films in Pulsed Laser Deposition Process

2005 ◽  
Vol 44 (11) ◽  
pp. 7896-7900 ◽  
Author(s):  
Takahiro Nagata ◽  
Young-Zo Yoo ◽  
Parhat Ahmet ◽  
Toyohiro Chikyow
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Deposition Process ◽  
Laser Deposition ◽  
Single Crystalline

Pulsed laser deposition process of PLZT thin films using an infrared Nd:YAG laser

2006 ◽  
Vol 252 (10) ◽  
pp. 3783-3788 ◽  
Author(s):  
T. García ◽  
E. de Posada ◽  
P. Bartolo-Pérez ◽  
J.L. Peña ◽  
R. Diamant ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Nd:Yag Laser ◽  
Pulsed Laser ◽  
Deposition Process ◽  
Laser Deposition ◽  
Plzt Thin Films

New developments of pulsed-laser deposition process

1998 ◽  
Author(s):  
Tatsuo Okada ◽  
Yoshiki Nakata ◽  
Junichi Muramoto ◽  
Mitsuo Maeda
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Deposition Process ◽  
Laser Deposition ◽  
New Developments

Cross-Sectional Nanoindentation of Alumina Thin Films Deposited by Pulsed Laser Deposition Process

2006 ◽  
Author(s):  
Sudheer Neralla ◽  
Sergey Yarmolenko ◽  
Dhananjay Kumar ◽  
Devdas Pai ◽  
Jag Sankar
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
High Hardness ◽  
Deposition Process ◽  
Laser Deposition ◽  
Cross Sectional ◽  
Adhesion Properties ◽  
Force Microscopy ◽  
Atomic Force

Alumina is a widely used ceramic material due to its high hardness, wear resistance and dielectric properties. The study of phase transformation and its correlation to the mechanical properties of alumina is essential. In this study, interfacial adhesion properties of alumina thin films are studied using cross-sectional nanoindentation (CSN) technique. Alumina thin films are deposited at 200 and 700 °C, on Si (100) substrates with a weak Silica interface, using pulsed laser deposition (PLD) process. Effect of annealing on the surface morphology of the thin films is studied using atomic force microscopy. Xray diffraction studies revealed that alumina thin films are amorphous in nature at 200 °C and polycrystalline with predominant gamma alumina phase at 700 °C.

Ionic liquid/ZnO(0001̄) single crystal and epitaxial film interfaces studied through a combination of electrochemical measurements and a pulsed laser deposition process under vacuum

2019 ◽  
Vol 21 (45) ◽  
pp. 25506-25512
Author(s):  
Mariko Kanai ◽  
Ko Watanabe ◽  
Shingo Maruyama ◽  
Yuji Matsumoto
Keyword(s):  
Ionic Liquid ◽  
Ionic Liquids ◽  
Pulsed Laser Deposition ◽  
Epitaxial Film ◽  
Pulsed Laser ◽  
Deposition Process ◽  
Laser Deposition ◽  
Zno Films ◽  
Doped Zno ◽  
Mg Doped

O-Polar ZnO(0001̄) single crystals and ZnO and Mg-doped ZnO films which were subsequently deposited on the ZnO crystals by pulsed laser deposition were electrochemically investigated through the interfaces with ionic liquids in a vacuum.

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