Investigation of O2- and Air-Exposure Effects on Amorphous In–Ga–Zn–O Thin-Film Surface by X-ray Photoelectron Spectroscopy

Deposition ofSb2Te3thin films on soda-lime glass substrates by coevaporation of Sb and Te is described in this paper.Sb2Te3thin films were characterized by x-ray diffraction (XRD), x-ray fluorescence (XRF), atomic force microscopy (AFM), x-ray photoelectron spectroscopy (XPS), electrical conductivity measurements, and Hall measurements. The abnormal electrical transport behavior occurred fromin situelectrical conductivity measurements. The results indicate that as-grownSb2Te3thin films are amorphous and undergo an amorphous-crystalline transition after annealing, and the posttreatment can effectively promote the formation of Sb-Te bond and prevent oxidation of thin film surface.

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Real-time X-ray studies of the effect of chemical transients on oxide thin-film surface structure

Acta Crystallographica Section A Foundations of Crystallography ◽

10.1107/s0108767310097916 ◽

2010 ◽

Vol 66 (a1) ◽

pp. s97-s97

Author(s):

P. H. Fuoss ◽

M. J. Highland ◽

T. T. Fister ◽

S. O. Hruszkewycz ◽

M. -I. Richard ◽

...

Keyword(s):

Thin Film ◽

Surface Structure ◽

Real Time ◽

Film Surface ◽

Oxide Thin Film ◽

X Ray ◽

Thin Film Surface

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Soft X-ray photoelectron spectroscopic investigation of Au-deposited amorphous In–Ga–Zn–O thin-film surface

Current Applied Physics ◽

10.1016/j.cap.2013.11.042 ◽

2014 ◽

Vol 14 ◽

pp. S53-S56 ◽

Cited By ~ 2

Author(s):

Se-Jun Kang ◽

Jaeyoon Baik ◽

Hyun-Joon Shin

Keyword(s):

Thin Film ◽

Spectroscopic Investigation ◽

Film Surface ◽

X Ray ◽

Thin Film Surface

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Sensitivity Enhancement of Pb(II) Ion Detection in Rivers Using SPR-Based Ag Metallic Layer Coated with Chitosan–Graphene Oxide Nanocomposite

Sensors ◽

10.3390/s19235159 ◽

2019 ◽

Vol 19 (23) ◽

pp. 5159 ◽

Cited By ~ 5

Author(s):

Nurul Fariha Lokman ◽

Nur Hidayah Azeman ◽

Fatihah Suja ◽

Norhana Arsad ◽

Ahmad Ashrif A Bakar

Keyword(s):

Thin Film ◽

Graphene Oxide ◽

Photoelectron Spectroscopy ◽

Film Surface ◽

Detection Accuracy ◽

Ion Detection ◽

Force Microscopy ◽

Adsorption Sites ◽

Thin Film Surface ◽

Atomic Force

The detection of Pb(II) ions in a river using the surface plasmon resonance (SPR)-based silver (Ag) thin film technique was successfully developed. Chitosan–graphene oxide (CS-GO) was coated on top of the Ag thin film surface and acted as the active sensing layer for Pb(II) ion detection. CS-GO was synthesized and characterized, and the physicochemical properties of this material were studied prior to integration with the SPR. In X-ray photoelectron spectroscopy (XPS), the appearance of the C=O, C–O, and O–H functional groups at 531.2 eV and 532.5 eV, respectively, confirms the success of CS-GO nanocomposite synthesis. A higher surface roughness of 31.04 nm was observed under atomic force microscopy (AFM) analysis for Ag/CS-GO thin film. The enhancement in thin film roughness indicates that more adsorption sites are available for Pb(II) ion binding. The SPR performance shows a good sensor sensitivity for Ag/CS-GO with 1.38° ppm−1 ranging from 0.01 to 5.00 ppm of standard Pb(II) solutions. At lower concentrations, a better detection accuracy was shown by SPR using Ag/CS-GO thin film compared to Ag/CS thin film. The SPR performance using Ag/CS-GO thin film was further evaluated with real water samples collected from rivers. The results are in agreement with those of standard Pb(II) ion solution, which were obtained at incidence angles of 80.00° and 81.11° for local and foreign rivers, respectively.

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Microstructural and Energy-Dispersive X-ray Analyses on Argon Ion Implantations in Tantalum Thin Films for Microelectronic Substrates

Electronics ◽

10.3390/electronics10232941 ◽

2021 ◽

Vol 10 (23) ◽

pp. 2941

Author(s):

Amir Hoshang Ramezani ◽

Siamak Hoseinzadeh ◽

Zhaleh Ebrahiminejad ◽

Milad Sangashekan ◽

Saim Memon

Keyword(s):

Thin Film ◽

Film Surface ◽

Sem Analysis ◽

Energy Dispersive ◽

Height Distribution ◽

Correlation Lengths ◽

X Ray ◽

Thin Film Surface ◽

Before And After ◽

Argon Ion

In the present study, the microstructural and statistical properties of unimplanted in comparison to argon ion-implanted tantalum-based thin film surface structures are investigated for potential application in microelectronic thin film substrates. In the study, the argon ions were implanted at the energy of 30 keV and the doses of 1×1017, 3×1017, and 7×1017 (ion/cm2) at an ambient temperature. Two primary goals have been pursued in this study. First, by using atomic force microscopy (AFM) analysis, the roughness of samples, before and after implantation, has been studied. The corrosion apparatus wear has been used to compare resistance against tantalum corrosion for all samples. The results show an increase in resistance against tantalum corrosion after the argon ion implantation process. After the corrosion test, scanning electron microscopy (SEM) analysis was applied to study the sample morphology. The elemental composition of the samples was characterized by using energy-dispersive X-ray (EDX) analysis. Second, the statisticalcharacteristics of both unimplanted and implanted samples, using the monofractal analysis with correlation function and correlation length of samples, were studied. The results show, however, that all samples are correlated and that the variation of ion doses has a negligible impact on the values of correlation lengths. Moreover, the study of height distribution and higher-order moments show the deviation from Gaussian distribution. The calculations of the roughness exponent and fractal dimension indicates that the implanted samples are the self-affine fractal surfaces.

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