Influence of Quantum Capacitance on Charge Carrier Density Estimation in a Nanoscale Field-Effect Transistor with a Channel Based on a Monolayer WSe2 Two-Dimensional Crystal Semiconductor

2019 ◽  
Vol 48 (6) ◽  
pp. 3504-3513 ◽  
Author(s):  
M. K. Bera ◽  
R. Kharb ◽  
N. Sharma ◽  
A. K. Sharma ◽  
R. Sehrawat ◽  
...  
Materials ◽  
2022 ◽  
Vol 15 (2) ◽  
pp. 446
Author(s):  
Minghui Zhang ◽  
Fang Lin ◽  
Wei Wang ◽  
Feng Wen ◽  
Genqiang Chen ◽  
...  

In this work, a hydrogen-terminated (H-terminated) diamond field effect transistor (FET) with HfAlOx/Al2O3 bilayer dielectrics is fabricated and characterized. The HfAlOx/Al2O3 bilayer dielectrics are deposited by the atomic layer deposition (ALD) technique, which can protect the H-terminated diamond two-dimensional hole gas (2DHG) channel. The device demonstrates normally-on characteristics, whose threshold voltage (VTH) is 8.3 V. The maximum drain source current density (IDSmax), transconductance (Gm), capacitance (COX) and carrier density (ρ) are −6.3 mA/mm, 0.73 mS/mm, 0.22 μF/cm2 and 1.53 × 1013 cm−2, respectively.


ACS Nano ◽  
2021 ◽  
Author(s):  
Parvin Fathi-Hafshejani ◽  
Nurul Azam ◽  
Lu Wang ◽  
Marcelo A. Kuroda ◽  
Michael C. Hamilton ◽  
...  

2018 ◽  
Vol 114 ◽  
pp. 62-74 ◽  
Author(s):  
R. Ranjith ◽  
Remya Jayachandran ◽  
K.J. Suja ◽  
Rama S. Komaragiri

2021 ◽  
Author(s):  
Qizhi Xu ◽  
Boyuan Zhang ◽  
Yihang Zeng ◽  
Amirali Zangiabadi ◽  
Hongwei Ni ◽  
...  

Ultrathin porous films held together by non-covalent van der Waals interactions was obtained by a top-down approach, which is then utilized as channel material in a two-dimensional planar field-effect transistor device through easy stamp transfer.


2020 ◽  
Vol 12 ◽  
pp. 100174 ◽  
Author(s):  
Ranjit A. Patil ◽  
Hao-Wei Tu ◽  
Ming-Hsing Jen ◽  
Jing-Jia Lin ◽  
Ching-Cherng Wu ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document