Hole diffusion length in high purity n-GaAs

1972 ◽  
Vol 15 (8) ◽  
pp. 865-868 ◽  
Author(s):  
R.D. Ryan ◽  
J.E. Eberhardt
2020 ◽  
Vol 10 (16) ◽  
pp. 5553
Author(s):  
Zhigang Lou ◽  
Shuyan Liang ◽  
Jiabei Yuan ◽  
Kang Ji ◽  
Jianyu Yuan ◽  
...  

In this work, the ultrafast transient absorption spectroscopy (TAs) was utilized to first investigate the charge transfer from the emerging FAPbI3 (FA = CH(NH2)2) perovskite quantum dots (PQDs) to charge transport layers. Specifically, we compared the TAs in pure FAPbI3 PQDs, PQDs grown with both electron and hole transfer layers (ETL and HTL), and PQDs with only ETL or HTL. The TA signals induced by photoexcited electrons decay much faster in PQDs samples with the ETL (~20 ps) compared to the pure FAPbI3 PQDs (>1 ns). These results reveal that electrons can effectively transport between coupled PQDs and transfer to the ETL (TiO2) at a time scale of 20 ps, much faster than the bimolecular charge recombination inside the PQDs (>1 ns), and the electron transfer efficiency is estimated to be close to 100%. In contrast, the temporal evolution of the TA signals in the PQDs with and without HTL exhibit negligible change, and no substantive hole transfer to the HTL (poly[bis(4-phenyl)(2,4,6-trimethylphenyl)amine], PTAA) occurs within 1 ns. The much slower hole transfer implies the further potential of increasing the overall photo-carrier conversion efficiency through enhancing the hole diffusion length and fine-tuning the coupling between the HTL and PQDs.


2016 ◽  
Vol 858 ◽  
pp. 345-348 ◽  
Author(s):  
Anatoly M. Strel'chuk ◽  
Baptiste Berenguier ◽  
Eugene B. Yakimov ◽  
Laurent Ottaviani

Commercial 4H-SiC p+n structures with an uncompensated donor concentration (Nd-Na) of ~1.5∙1015 cm-3 in the n-type epitaxial layer are studied. The measurement of the photocurrent, electron beam induced current and transient switching characteristics (from forward to reverse voltage), altogether showed that the value of the hole diffusion length, about 2 μm at room temperature, increases to at least 7 μm at 620 K.


2003 ◽  
Vol 762 ◽  
Author(s):  
O. Saadane ◽  
S. Lebib ◽  
A.V. Kharchenko ◽  
V. Suendo ◽  
C. Longeaud ◽  
...  

AbstractWe compare the deposition rate, hydrogen incorporation and optoelectronic properties of hydrogenated polymorphous silicon films produced either by the decomposition of silane-hydrogen or of silane-helium mixtures. Our results clearly show that He dilution allows to drastically reduce the RF power needed to achieve the same deposition rate as in the case of H2 dilution. Infrared spectroscopy and hydrogen effusion experiments show clear differences in the hydrogen bonding and content in both series of films. Interestingly, both He and hydrogen dilution result in films with improved transport properties, in particular the hole diffusion length, with respect to standard amorphous silicon. These results indicate that He dilution is a good alternative to H2 dilution to prepare intrinsic layers for solar cells.


1996 ◽  
Vol 420 ◽  
Author(s):  
A. S. Abramov ◽  
A. I. Kosarev ◽  
P. Roca i Cabarrocas ◽  
A. J. Vinogradov

AbstractConcomitant studies of kinetics of defects ND(t), photoconductivity σph(t), electron and hole diffision lengths Le(t), Lh(t) during light soaking have been carried out. The data have been fitted by stretched exponential expressions and characteristic parameters of kinetics have been determined. Correlation between the kinetics is discussed. In contrast to Nd(t), σph(t) and Le(t), the hole diffusion length Lh(t) was observed to remain constant during initial time (˜ 103s) and then decreased with characteri stic time ˜ 104s.


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