The influence of substrate temperature variation on tungsten oxide thin film growth in an HFCVD system
2007 ◽
Vol 253
(6)
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pp. 3317-3325
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2013 ◽
Vol 734-737
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pp. 2377-2381
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2001 ◽
Vol 175-176
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pp. 709-714
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2010 ◽
Vol 16
(47)
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pp. 13925-13929
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2010 ◽
Vol 31
(12)
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pp. 3579-3582
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1997 ◽
Vol 04
(02)
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pp. 219-222
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2014 ◽
Vol 254
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pp. 291-297
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