scholarly journals Analysis of mechanical and thermal stresses due to TiN coating of Fe substrate by physical vapor deposition

2021 ◽  
Vol 4 ◽  
pp. 100042
Author(s):  
Tri Widodo Besar Riyadi ◽  
David Setiadhi ◽  
Agus Dwi Anggono ◽  
Waluyo Adi Siswanto ◽  
Hussain H. Al-Kayiem
Keyword(s):  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Thermal Stresses ◽  
Tin Coating

scholarly journals Application of a Novel CVD TiN Coating on a Biomedical Co–Cr Alloy: An Evaluation of Coating Layer and Substrate Characteristics

Materials ◽  
2020 ◽  
Vol 13 (5) ◽  
pp. 1145 ◽  
Author(s):  
Si Hoon Song ◽  
Bong Ki Min ◽  
Min-Ho Hong ◽  
Tae-Yub Kwon
Keyword(s):  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Cast Alloy ◽  
Chemical Vapor ◽  
Scratch Test ◽  
Face Centered Cubic ◽  
Cobalt Chromium ◽  
Tin Coating ◽  
Promising Alternative ◽  
Coated Alloy

Titanium nitride (TiN) was deposited on the surface of a cobalt–chromium (Co–Cr) alloy by a hot-wall type chemical vapor deposition (CVD) reactor at 850 °C, and the coating characteristics were compared with those of a physical vapor deposition (PVD) TiN coating deposited on the same alloy at 450 °C. Neither coating showed any reactions at the interface. The face-centered cubic (fcc) structure of the alloy was changed into a hexagonal close-packed (hcp) phase, and recrystallization occurred over at 10 μm of depth from the surface after CVD coating. Characteristic precipitates were also generated incrementally depending on the depth, unlike the precipitates in the matrix of the as-cast alloy. On the other hand, the microstructure and phase of the PVD-coated alloy did not change. Depth-dependent nano-hardness measurements showed a greater increase in hardness in the recrystallization zone of the CVD-coated alloy than in the bulk center of the alloy. The CVD coating showed superior adhesion to the PVD coating in the progressive scratch test. The as-cast, PVD-coated, and CVD-coated alloys all showed negative cytotoxicity. Within the limitations of this study, CVD TiN coating to biomedical Co–Cr alloy may be considered a promising alternative to PVD technique.

Microstructure and Mechanical Properties Comparative Analysis of TiN Coated on Cemented Carbide

2017 ◽  
Vol 14 (1) ◽  
pp. 441-447 ◽  
Author(s):  
Ruyi Gou ◽  
Xiaodong Zhang ◽  
Chunyu Feng ◽  
Xin Wei
Keyword(s):  
Mechanical Properties ◽  
Chemical Vapor Deposition ◽  
Natural Gas ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Chemical Vapor ◽  
Cemented Carbide ◽  
Tin Coating ◽  
Plasma Chemical Vapor Deposition ◽  
Hardness Tester

The cemented carbide of natural gas throttle valve has serious erosion phenomenon in natural gas exploitation. The titanium nitride (TiN) coating on cemented carbide is an effective method to prevent failure of cemented carbide. Three different processes physical vapor deposition (PVD), chemical vapor deposition (CVD) and plasma chemical vapor deposition (PCVD) are used to deposit TiN coating on cemented carbide. The experiments carried on the scanning electron microscopy, the digital micro hardness tester and scratch tester. The results indicate TiN coating deposited by PVD has characteristics of dense structure, uniform thickness, smooth surface. The coating hardness from big to small: PVD > PCVD > CVD. The coating elasticity modulus from big to small: PCVD > CVD > PVD. The bonding force between coating and substrate from big to small: PVD > CVD > PCVD. The results demonstrate that TiN coating deposited by PVD mechanical properties are superior to TiN coating deposited by CVD and PCVD.

Diamond-ceramic composite tool coatings

1994 ◽  
Vol 9 (11) ◽  
pp. 2850-2867 ◽  
Author(s):  
W.D. Fan ◽  
X. Chen ◽  
K. Jagannadham ◽  
J. Narayan
Keyword(s):  
Wear Resistance ◽  
Diamond Film ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Thermal Stresses ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Diamond Coatings ◽  
Composite Layers ◽  
Composite Diamond

We have developed multilayer composite diamond coatings with improved adhesion and wear resistance on WC(Co) tool substrates. The coatings consist of a first layer of discontinuous diamond crystallites that are anchored to the WC(Co) substrate by an interposing layer of ceramic films. These films consist of TiC, TiN, SiC, Si3N4 or WC deposited to provide a conformal coverage on the first layer of diamond. A second or final layer of continuous diamond film is deposited to provide the cutting edge of the tool. The diamond film in the composite layers is deposited by hot filament chemical vapor deposition (HFCVD) and the interposing layer is deposited by laser physical vapor deposition (LPVD). The different parameters associated with the deposition of diamond and interposing layers are optimized to improve the adhesion and wear resistance. We have studied the adhesion characteristics by indentation tests in which the critical load for peeling of the diamond films is determined. Adhesion and wear resistance of the films are also tested using an overlap polishing on diamond paste with 5–6 μm particle size. The diamond and interposing layers in the composite are characterized by scanning electron microscopy and Raman spectroscopy. Results of improvement in adhesion and wear resistance are correlated with the quality of the diamond film and the interposing layer. Better accommodation of thermal stresses and strains in the composite layers has been shown to be responsible for improvement in the adhesion and wear resistance of the composite diamond films.

TEM characterization of WSix films

1994 ◽  
Vol 52 ◽  
pp. 848-849
Author(s):  
V. C. Kannan ◽  
S. M. Merchant ◽  
R. B. Irwin ◽  
A. K. Nanda ◽  
M. Sundahl ◽  
...  
Keyword(s):  
Integrated Circuits ◽  
Vapor Deposition ◽  
High Purity ◽  
Physical Vapor Deposition ◽  
Thermal Treatments ◽  
Rapid Thermal Anneal ◽  
Tungsten Silicide ◽  
Tem Characterization ◽  
Metal Silicides

Metal silicides such as WSi2, MoSi2, TiSi2, TaSi2 and CoSi2 have received wide attention in recent years for semiconductor applications in integrated circuits. In this study, we describe the microstructures of WSix films deposited on SiO2 (oxide) and polysilicon (poly) surfaces on Si wafers afterdeposition and rapid thermal anneal (RTA) at several temperatures. The stoichiometry of WSix films was confirmed by Rutherford Backscattering Spectroscopy (RBS). A correlation between the observed microstructure and measured sheet resistance of the films was also obtained.WSix films were deposited by physical vapor deposition (PVD) using magnetron sputteringin a Varian 3180. A high purity tungsten silicide target with a Si:W ratio of 2.85 was used. Films deposited on oxide or poly substrates gave rise to a Si:W ratio of 2.65 as observed by RBS. To simulatethe thermal treatments of subsequent processing procedures, wafers with tungsten silicide films were subjected to RTA (AG Associates Heatpulse 4108) in a N2 ambient for 60 seconds at temperatures ranging from 700° to 1000°C.

scholarly journals Noble Metals for Modern Implant Materials: MOCVD of Film Structures and Cytotoxical, Antibacterial, and Histological Studies

Biomedicines ◽  
2021 ◽  
Vol 9 (8) ◽  
pp. 851
Author(s):  
Svetlana I. Dorovskikh ◽  
Evgeniia S. Vikulova ◽  
Elena V. Chepeleva ◽  
Maria B. Vasilieva ◽  
Dmitriy A. Nasimov ◽  
...  
Keyword(s):  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Noble Metals ◽  
Mononuclear Cells ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Ti Alloy ◽  
Peripheral Blood Mononuclear ◽  
Histological Studies

This work is aimed at developing the modification of the surface of medical implants with film materials based on noble metals in order to improve their biological characteristics. Gas-phase transportation methods were proposed to obtain such materials. To determine the effect of the material of the bottom layer of heterometallic structures, Ir, Pt, and PtIr coatings with a thickness of 1.4–1.5 μm were deposited by metal–organic chemical vapor deposition (MOCVD) on Ti6Al4V alloy discs. Two types of antibacterial components, namely, gold nanoparticles (AuNPs) and discontinuous Ag coatings, were deposited on the surface of these coatings. AuNPs (11–14 nm) were deposited by a pulsed MOCVD method, while Ag films (35–40 nm in thickness) were obtained by physical vapor deposition (PVD). The cytotoxic (24 h and 48 h, toward peripheral blood mononuclear cells (PBMCs)) and antibacterial (24 h) properties of monophase (Ag, Ir, Pt, and PtIr) and heterophase (Ag/Pt, Ag/Ir, Ag/PtIr, Au/Pt, Au/Ir, and Au/PtIr) film materials deposited on Ti-alloy samples were studied in vitro and compared with those of uncoated Ti-alloy samples. Studies of the cytokine production by PBMCs in response to incubation of the samples for 24 and 48 h and histological studies at 1 and 3 months after subcutaneous implantation in rats were also performed. Despite the comparable thickness of the fibrous capsule after 3 months, a faster completion of the active phase of encapsulation was observed for the coated implants compared to the Ti alloy analogs. For the Ag-containing samples, growth inhibition of S. epidermidis, S. aureus, Str. pyogenes, P. aeruginosa, and Ent. faecium was observed.

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