Co- or Ni-modified Sn-MnOx low-dimensional multi-oxides for high-efficient NH3-SCR De-NOx: Performance optimization and reaction mechanism

2022 ◽  
Vol 113 ◽  
pp. 204-218
Author(s):  
Fengyu Gao ◽  
Chen Yang ◽  
Xiaolong Tang ◽  
Honghong Yi ◽  
Chengzhi Wang
2021 ◽  
Vol 896 ◽  
pp. 45-50
Author(s):  
Lian Yi Huo ◽  
Xue Tao Shi ◽  
Si Ming Chen ◽  
Meng Yao Zhang

Hyperbranched polymers (HBPs) have been applied in various fields because of its outstanding biodegradability and biocompatibility. At present, there are a variety of methods that are used to fabricate HBPs, such as polycondensation, reactive polymerization and ring-opening polymerization according to reaction mechanism. These methods are all environmental-friendly and high-efficient to generate HBPs, and are valuable for industrialization. In this work, we conclude some common methods of HBPs fabrication and make the comparison between them to analyze their advantages and disadvantages, which contribute in how to improve the synthesis process in the future research.


2019 ◽  
Vol 9 (13) ◽  
pp. 3554-3567 ◽  
Author(s):  
Hao Liu ◽  
Chuanzhi Sun ◽  
Zhongxuan Fan ◽  
XuanXuan Jia ◽  
Jingfang Sun ◽  
...  

A good balance between the redox properties and surface acidity induces the high activity of the Sm doped TiO2/CeO2 catalyst.


2020 ◽  
Vol 503 ◽  
pp. 144190 ◽  
Author(s):  
Qiulin Zhang ◽  
Yaqing Zhang ◽  
Tengxiang Zhang ◽  
Huimin Wang ◽  
YanPing Ma ◽  
...  

2016 ◽  
Vol 874 ◽  
pp. 415-419
Author(s):  
Ze Wei Yuan ◽  
Yan He ◽  
Quan Wen ◽  
Hai Yang Du

In order to avoid the environmental pollution and the harm to body of traditional polishing slurries, an environment-friendly chemical mechanical polishing technology is proposed for SiC wafer in this study. With this method, SiC material is removed by utilizing the strong oxidability of nanotitanium dioxide particles in chemical mechanical slurry in the existence of ultraviolet. While, the oxidbillity will recede in absence of ultraviolet when the polishing process finishes. On the basis of investigating in the reaction mechanism between SiC and nanotitanium dioxide, the slurries are prepared for the environment-friendly chemical mechanical polishing technology. The results show that the ultraviolet-assisted CMP slurry has strong oxidation for SiC material. This method is high-efficient for polishing SiC wafer. The surface roughness is reduced to about Ra 0.1μm from Ra 0.818μm after polishing for one hour.


2018 ◽  
Vol 20 (35) ◽  
pp. 22744-22752 ◽  
Author(s):  
Yiqing Zeng ◽  
Yanan Wang ◽  
Shule Zhang ◽  
Qin Zhong

Oxygen vacancies on TiO2make the impossible possible!


2020 ◽  
Vol 534 ◽  
pp. 147592 ◽  
Author(s):  
Jing Li ◽  
Jiaxiu Guo ◽  
Xueke Shi ◽  
Xinru Wen ◽  
Yinghao Chu ◽  
...  

2017 ◽  
Vol 443 ◽  
pp. 25-37 ◽  
Author(s):  
Bohan Jia ◽  
Jiaxiu Guo ◽  
Song Shu ◽  
Ningjie Fang ◽  
Jianjun Li ◽  
...  
Keyword(s):  

Author(s):  
Jian Zeng ◽  
Liang Xu ◽  
Xin Luo ◽  
Bojun Peng ◽  
Zongle Ma ◽  
...  

Searching economical low-dimensional materials to construct the high-efficient type-II heterojunction photocatalyst for splitting water into hydrogen is very strategic. In this study, using the first-principles calculations, we construct a novel...


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