Chemical etching of glasses in hydrofluoric Acid: A brief review

2021 ◽  
Author(s):  
Shubhava ◽  
A. Jayarama ◽  
Ganesh K. Kannarpady ◽  
Sangeeta Kale ◽  
Shriganesh Prabhu ◽  
...  
Keyword(s):  
Hydrofluoric Acid ◽  
Chemical Etching

Chemical etching of porous silicon in diluted hydrofluoric acid

1998 ◽  
Vol 109 (3) ◽  
pp. 195-199 ◽  
Author(s):  
Takashi Tsuboi ◽  
Tetsuo Sakka ◽  
Yukio H. Ogata
Keyword(s):  
Porous Silicon ◽  
Hydrofluoric Acid ◽  
Chemical Etching

Electrochemical Formation of Porous Silicon Carbide for Micro-Device Applications

2018 ◽  
Vol 924 ◽  
pp. 943-946
Author(s):  
Gael Gautier ◽  
Thomas Defforge ◽  
Guillaume Gommé ◽  
Damien Valente ◽  
Daniel Alquier
Keyword(s):  
Silicon Carbide ◽  
Porous Silicon ◽  
Hydrofluoric Acid ◽  
Chemical Etching ◽  
State Of The Art ◽  
Electrolyte Composition ◽  
Substrate Properties ◽  
Device Applications ◽  
Porous Sic ◽  
Doping Type

Anodization of silicon carbide (SiC) in hydrofluoric acid (HF) solutions is a promising way to etch this material which is very resistant against traditional chemical etching methods. Moreover, it has been shown that several reproducible porous SiC morphologies can be performed varying anodization conditions (current density, electrolyte composition, UV lighting) and/or substrate properties (doping type and level). This paper proposes a state of the art of porous SiC etching in GREMAN and a presentation of the morphologies achievable using anodization in HF based electrolytes.

Chemically Etched Axicon Fiber as a Sensor Probe of Optical Coherence Tomography

2014 ◽  
Vol 625 ◽  
pp. 754-758
Author(s):  
Kozo Taguchi ◽  
Motohiko Takatsu
Keyword(s):  
Optical Coherence Tomography ◽  
Hydrofluoric Acid ◽  
Chemical Etching ◽  
Single Mode ◽  
Etching Time ◽  
Fourier Domain ◽  
Optical Coherence ◽  
Common Path ◽  
Fourier Domain Oct ◽  
Sensor Probe

In this paper, we investigated a high lateral resolution common-path Fourier domain OCT system with the use of a chemically etched single mode fiber. In our experiments, single mode optical fiber for 840nm was used for preparing the tapered tips. Our system used a conical microlens that was chemically etched by selective chemical etching technique using an etching solution of buffered hydrofluoric acid (BHF). From experimental results, we verified that our proposed optical coherence tomography system could operate as a common-path Fourier domain OCT (FD-OCT) system. Furthermore, we experimentally investigated the chemical etching process of silica-based optical fiber probes by controlling the etching time when applying chemical etching techniques using hydrofluoric acid. We evaluated the beam profile from fiber probe. From these investigations, it was found that etching time was important parameter for sensor probe of optical coherence tomography.

scholarly journals Self-organization in porous 6H–SiC

2000 ◽  
Vol 15 (9) ◽  
pp. 1860-1863 ◽  
Author(s):  
S. Zangooie ◽  
J. A. Woollam ◽  
H. Arwin
Keyword(s):  
Acid Concentration ◽  
Current Density ◽  
Basal Plane ◽  
Hydrofluoric Acid ◽  
Chemical Etching ◽  
Sample Surface ◽  
Rate Of Change ◽  
Self Organization ◽  
Pore Sizes ◽  
Etching Parameters

Pores in porous 6H–SiC were found to propagate first nearly parallel with the basal plane and gradually change direction and align with the c axis. As a consequence, well-defined columnar pores were formed. It was shown that the rate of change of propagation directions was influenced by the etching parameters, such as hydrofluoric acid concentration and current density. Larger currents resulted in formation of larger pores. Pore sizes were found to increase with depth due to a decrease of the acid concentration. In addition, due to chemical etching effects, larger pore sizes were obtained close to the sample surface.

Fabrication of Tuning-Fork Gyroscope Resonator using Directed Chemical Etching of Fused Silica

2019 ◽  
pp. 32-44
Author(s):  
V.S. Kuznetsov ◽  
D.V. Maiorov ◽  
P.A. Andreev
Keyword(s):  
Hydrofluoric Acid ◽  
Laser Processing ◽  
Chemical Etching ◽  
Tuning Fork ◽  
Etching Rate ◽  
Pulsed Laser ◽  
Fused Silica ◽  
Pulsed Laser Radiation ◽  
Processing Mode ◽  
Operational Modes

The article presents the results of the experimental and practical work devoted to the study of directed chemical etching of fused silica locally exposed to ultra-short pulsed laser radiation as a way to produce sensitive elements of precision instruments of orientation, stabilization and navigation as resonators of tuning fork gyroscopes. The essence of the directed chemical etching method is presented. The created experimental setup structure and components are purposed and the laser processing and chemical etching operational modes are described. The laser processing mode obtained as a result of the experiment was used to fabricate the tuning fork gyroscope resonator. The etching rate of exposed fused silica in 5 % hydrofluoric acid is 27.5 to 68.8 µm/hour. That is much faster than the etching rate of the non-affected material. Based on this results the application of the method in the precision instruments fabrication area can be considered promising and subjected to further study.

scholarly journals Differential etching after lithic heat treatment: First results of an experimental study

2018 ◽  
Vol 5 (1) ◽  
Author(s):  
Linda Kiers
Keyword(s):  
Heat Treatment ◽  
Hydrofluoric Acid ◽  
Chemical Etching ◽  
Smooth Surface ◽  
Weathering Processes ◽  
Heat Treated ◽  
First Results ◽  
Differential Etching ◽  
Pre Treatment ◽  
Control Samples

The practice of lithic heat treatment creates a combination of initial dull flake scars and subsequent smooth flake scars when the implement is finished after heating. Experiments were done to test the susceptibility of dull and smooth flake scars to etching. The points were etched in 40% hydrofluoric acid for either 40 or 60 seconds. In the 40 seconds experiment, the smooth flake scars of 9 (out of 25) heated points showed less etching than the dull flake scars or no etching at all. These artefacts formed a weathering pattern that is similar to double patina in reworked flints. Ten unheated control samples did not form differential weathering between different generations of flake scars. In the 60 seconds experiment 4 (out of 25) heated points showed some parts of the smooth surface to be less affected. Ten unheated control samples did not form differential weathering. The experiments show that sometimes smooth flake scars are more resistant to etching initially. In Scanning Electron Microscopy, flint artefacts are sometimes pre-treated with hydrofluoric acid. Heat treated flints are susceptible to differential weathering by hydrofluoric acid. Thus, pre-treatment with hydrofluoric acid of heat treated SEM samples can lead to surfaces that are etched to a different extent. The chemical etching in this study does not replicate any natural patination process. How heat treated lithics respond to natural weathering processes cannot be predicted. Further studies should produce natural patination and test selected artefacts in contexts of intentional heat treatment for signs of heating.

Investigation on Dynamic Chemical Etching of Fiber Probe for Cell Isolation

2012 ◽  
Vol 523-524 ◽  
pp. 1065-1069
Author(s):  
Kozo Taguchi ◽  
Jun Okada ◽  
Nobuyuki Watanabe
Keyword(s):  
Yeast Cell ◽  
Hydrofluoric Acid ◽  
Chemical Etching ◽  
Fiber Optic ◽  
Optical Trap ◽  
Three Dimensional ◽  
Protective Layer ◽  
Single Mode ◽  
Cell Isolation ◽  
Single Mode Fiber

A novel single fiber optic tweezers was proposed for cell isolation. Fiber tips were fabricated by dynamic chemical etching. The mechanically cleaved bare single mode fiber was dipped into Hydrofluoric acid containing a protective layer of Toluene at the top. By moving the fiber at variable speeds, a variety of tip shapes could be created. In our experiments, tip angle could be adjusted from 7deg to 55deg. Three-dimensional optical trap of a yeast cell could be formed by the fiber tip with less than 23deg tip.

The observation of defects on (100) CdTe surfaces by chemical etching

1992 ◽  
Vol 50 (2) ◽  
pp. 1424-1425
Author(s):  
M.E. Lee
Keyword(s):  
Single Crystal ◽  
Grain Boundaries ◽  
Single Crystals ◽  
Chemical Etching ◽  
Crystalline Perfection ◽  
Crystalline Defects ◽  
High Incidence ◽  
Crystallographic Defects ◽  
Cdznte Substrates ◽  
Device Technology

The crystalline perfection of bulk CdTe substrates plays an important role in their use in infrared device technology. The application of chemical etchants to determine crystal polarity or the density and distribution of crystallographic defects in (100) CdTe is not well understood. The lack of data on (100) CdTe surfaces is a result of the apparent difficulty in growing (100) CdTe single crystal substrates which is caused by a high incidence of twinning. Many etchants have been reported to predict polarity on one or both (111) CdTe planes but are considered to be unsuitable as defect etchants. An etchant reported recently has been considered to be a true defect etchant for CdTe, MCT and CdZnTe substrates. This etchant has been reported to reveal crystalline defects such as dislocations, grain boundaries and inclusions in (110) and (111) CdTe. In this study the effect of this new etchant on (100) CdTe surfaces is investigated.The single crystals used in this study were (100) CdTe as-cut slices (1mm thickness) from Bridgman-grown ingots.

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