Inductively coupled plasma nanoetching of atomic layer deposition alumina

Microelectronic Engineering ◽

10.1016/j.mee.2018.02.023 ◽

2018 ◽

Vol 193 ◽

pp. 28-33 ◽

Author(s):

Anpan Han ◽

Bingdong Chang ◽

Matteo Todeschini ◽

Hoa Thanh Le ◽

William Tiddi ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Inductively Coupled Plasma ◽

Atomic Layer ◽

Inductively Coupled ◽

Layer Deposition

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Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition

Plasma Sources Science and Technology ◽

10.1088/0963-0252/20/1/015008 ◽

2011 ◽

Vol 20 (1) ◽

pp. 015008 ◽

Author(s):

S Tinck ◽

A Bogaerts

Keyword(s):

Atomic Layer Deposition ◽

Computer Simulations ◽

Inductively Coupled Plasma ◽

Atomic Layer ◽

Inductively Coupled ◽

Layer Deposition

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Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment

Journal of Applied Physics ◽

10.1063/1.4768839 ◽

2012 ◽

Vol 112 (12) ◽

pp. 124102 ◽

Author(s):

Hsin-Wei Huang ◽

Wen-Chih Chang ◽

Su-Jien Lin ◽

Yu-Lun Chueh

Keyword(s):

Atomic Layer Deposition ◽

Plasma Treatment ◽

Inductively Coupled Plasma ◽

Atomic Layer ◽

Deposition Technique ◽

Zno Film ◽

Inductively Coupled ◽

Layer Deposition ◽

Atomic Layer Deposition Technique

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Area-Selective Atomic Layer Deposition Using an Inductively Coupled Plasma Polymerized Fluorocarbon Layer: A Case Study for Metal Oxides

The Journal of Physical Chemistry C ◽

10.1021/acs.jpcc.6b09406 ◽

2016 ◽

Vol 120 (46) ◽

pp. 26393-26401 ◽

Author(s):

Ali Haider ◽

Petro Deminskyi ◽

Talha M. Khan ◽

Hamit Eren ◽

Necmi Biyikli

Keyword(s):

Atomic Layer Deposition ◽

Metal Oxides ◽

Inductively Coupled Plasma ◽

Atomic Layer ◽

Inductively Coupled ◽

Layer Deposition

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Inductively coupled plasma etching of amorphous Al[sub 2]O[sub 3] and TiO[sub 2] mask layers grown by atomic layer deposition

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2353844 ◽

2006 ◽

Vol 24 (5) ◽

pp. 2350 ◽

Author(s):

J. Dekker ◽

K. Kolari ◽

R. L. Puurunen

Keyword(s):

Atomic Layer Deposition ◽

Plasma Etching ◽

Inductively Coupled Plasma ◽

Atomic Layer ◽

Inductively Coupled Plasma Etching ◽

Inductively Coupled ◽

Layer Deposition

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Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures

Thin Solid Films ◽

10.1016/j.tsf.2014.07.031 ◽

2014 ◽

Vol 566 ◽

pp. 93-98 ◽

Author(s):

Bo-Heng Liu ◽

Hung Ji Huang ◽

Sheng-Hsin Huang ◽

Chien-Nan Hsiao

Keyword(s):

Atomic Layer Deposition ◽

Chemical Stability ◽

Low Temperatures ◽

Inductively Coupled Plasma ◽

Atomic Layer ◽

Inductively Coupled ◽

Layer Deposition ◽

Thermal And Chemical Stability

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Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/6.0000021 ◽

2020 ◽

Vol 38 (3) ◽

pp. 032408 ◽

Author(s):

Masaki Hirayama ◽

Akinobu Teramoto ◽

Shigetoshi Sugawa

Keyword(s):

Atomic Layer Deposition ◽

Inductively Coupled Plasma ◽

Plasma Reactor ◽

Atomic Layer ◽

Ion Flux ◽

Inductively Coupled ◽

Layer Deposition ◽

Inductively Coupled Plasma Reactor ◽

Interfacial Mixing

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Plasma Enhanced Atomic Layer Deposition of High Purity Titanium Nitride: Comparison of Hollow Cathode and Inductively Coupled Discharges

61st Annual Technical Conference Proceedings ◽

10.14332/svc18.proc.0058 ◽

2018 ◽

Author(s):

S. Woodward

Keyword(s):

Atomic Layer Deposition ◽

Titanium Nitride ◽

Hollow Cathode ◽

High Purity ◽

Atomic Layer ◽

Inductively Coupled ◽

Layer Deposition ◽

Purity Titanium

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Application of Atomic Layer Deposition in Dye-Sensitized Photoelectrosynthesis Cells

Trends in Chemistry ◽

10.1016/j.trechm.2020.11.002 ◽

2021 ◽

Vol 3 (1) ◽

pp. 59-71

Author(s):

Degao Wang ◽

Qing Huang ◽

Weiqun Shi ◽

Wei You ◽

Thomas J. Meyer

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Dye Sensitized ◽

Layer Deposition

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Growth and Characteristics of ZnO Nanotube Arrays on Si Substrate by Atomic Layer Deposition in Anodic Aluminum Oxide

10.1557/proc-1109-b09-09 ◽

2008 ◽

Author(s):

Soo Jin Chua ◽

Miao Wang ◽

Han Gao ◽

Carl V. Thompson ◽

Lee Kheng Tan

Keyword(s):

Atomic Layer Deposition ◽

Aluminum Oxide ◽

Anodic Aluminum Oxide ◽

Atomic Layer ◽

Nanotube Arrays ◽

Si Substrate ◽

Anodic Aluminum ◽

Zno Nanotube ◽

Layer Deposition

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Atomic Layer Deposition on Active Pharmaceutical Particles

10.26226/morressier.57d6b2bed462b8028d88d866 ◽

2016 ◽

Author(s):

Tommi Kääriäinen

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Layer Deposition

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