Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition

2011 ◽  
Vol 20 (1) ◽  
pp. 015008 ◽  
Author(s):  
S Tinck ◽  
A Bogaerts
2018 ◽  
Vol 193 ◽  
pp. 28-33 ◽  
Author(s):  
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Bingdong Chang ◽  
Matteo Todeschini ◽  
Hoa Thanh Le ◽  
William Tiddi ◽  
...  

2021 ◽  
Vol 3 (1) ◽  
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Author(s):  
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Qing Huang ◽  
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Wei You ◽  
Thomas J. Meyer

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