Inductively coupled plasma etching of amorphous Al[sub 2]O[sub 3] and TiO[sub 2] mask layers grown by atomic layer deposition

2006 ◽  
Vol 24 (5) ◽  
pp. 2350 ◽  
Author(s):  
J. Dekker ◽  
K. Kolari ◽  
R. L. Puurunen
Keyword(s):  
Atomic Layer Deposition ◽  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Atomic Layer ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled ◽  
Layer Deposition

scholarly journals Inductively coupled plasma nanoetching of atomic layer deposition alumina

2018 ◽  
Vol 193 ◽  
pp. 28-33 ◽  
Author(s):  
Anpan Han ◽  
Bingdong Chang ◽  
Matteo Todeschini ◽  
Hoa Thanh Le ◽  
William Tiddi ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Inductively Coupled Plasma ◽  
Atomic Layer ◽  
Inductively Coupled ◽  
Layer Deposition

Inductively coupled plasma etching for delineation of InAs/GaSb pixels

2012 ◽  
Author(s):  
Jean Nguyen ◽  
John Gill ◽  
Sir B. Rafol ◽  
Alexander Soibel ◽  
Arezou Khoshakhlagh ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Inductively coupled plasma etching of HgCdTe using a CH4-based mixture

2005 ◽  
Vol 34 (6) ◽  
pp. 740-745 ◽  
Author(s):  
E. Laffosse ◽  
J. Baylet ◽  
J. P. Chamonal ◽  
G. Destefanis ◽  
G. Cartry ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled
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