Effect of interfacial InZnO conducting layer on electrical performance and bias stress stability of InAlZnO thin-film transistors

In this study, the effects of capping layers with different metals on the electrical performance and stability of p-channel SnO thin-film transistors (TFTs) were examined. Ni- or Pt-capped SnO TFTs exhibit a higher field-effect mobility (μFE), a lower subthreshold swing (SS), a positively shifted threshold voltage (VTH), and an improved negative-gate-bias-stress (NGBS) stability, as compared to pristine TFTs. In contrast, Al-capped SnO TFTs exhibit a lower μFE, higher SS, negatively shifted VTH, and degraded NGBS stability, as compared to pristine TFTs. No significant difference was observed between the electrical performance of the Cr-capped SnO TFT and that of the pristine SnO TFT. The obtained results were primarily explained based on the change in the back-channel potential of the SnO TFT that was caused by the difference in work functions between the SnO and various metals. This study shows that capping layers with different metals can be practically employed to modulate the electrical characteristics of p-channel SnO TFTs.

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Influence of Thermal Stress and Kinetic Bias Stress on The Electrical Performance of Mixed Oxide Thin Film Transistors

ECS Meeting Abstracts ◽

10.1149/ma2012-02/42/3082 ◽

2012 ◽

Keyword(s):

Thin Film ◽

Thermal Stress ◽

Mixed Oxide ◽

Thin Film Transistors ◽

Oxide Thin Film ◽

Electrical Performance ◽

Bias Stress

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Amorphous Oxide Thin Film Transistors with Nitrogen-Doped Hetero-Structure Channel Layers

10.20944/preprints201709.0028.v1 ◽

2017 ◽

Author(s):

Haiting Xie ◽

Guochao Liu ◽

Lei Zhang ◽

Yan Zhou ◽

Chengyuan Dong

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Oxide Semiconductor ◽

Oxide Thin Film ◽

Electrical Performance ◽

Large Field ◽

Stress Tests ◽

Amorphous Oxide ◽

Nitrogen Doped ◽

Bias Stress

The nitrogen-doped amorphous oxide semiconductor (AOS) thin film transistors (TFTs) with double-stacked channel layers (DSCL) were prepared and characterized. The DSCL structure composed of nitrogen-doped amorphous InGaZnO and InZnO films (a-IGZO:N/a-IZO:N or a-IZO:N/a-IGZO:N) made the corresponding TFT devices exhibit quite large field-effect mobility due to the existence of double conduction channels. Especially, the a-IZO:N/a-IGZO:N TFTs showed even better electrical performance (μFE = 15.0 cm2·V-1·s-1, SS = 0.5 V/dec, VTH = 1.5 V, ION/IOFF = 1.1×108) and stability (VTH shift of 1.5, -0.5, and -2.5 V for positive bias-stress, negative bias-stress and thermal stress tests, respectively) than the a-IGZO:N/a-IZO:N TFTs. Based on the X-ray photoemission spectroscopy measurements and energy band analysis, it was assumed that the optimized interface trap states, the less ambient gas adsorption, and the better suppression of oxygen vacancies in the a-IZO:N/a-IGZO:N hetero-structures might be responsible for the better behaviors of the corresponding TFTs.

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Effects of Channel Thickness on Electrical Performance and Stability of High-Performance InSnO Thin-Film Transistors

Membranes ◽

10.3390/membranes11120929 ◽

2021 ◽

Vol 11 (12) ◽

pp. 929

Author(s):

Qi Li ◽

Junchen Dong ◽

Dedong Han ◽

Yi Wang

Keyword(s):

Thin Film ◽

Electrical Properties ◽

Integrated Circuits ◽

Thin Film Transistors ◽

High Performance ◽

Low Cost ◽

Electrical Performance ◽

Trap States ◽

Bias Stress ◽

Channel Thickness

InSnO (ITO) thin-film transistors (TFTs) attract much attention in fields of displays and low-cost integrated circuits (IC). In the present work, we demonstrate the high-performance, robust ITO TFTs that fabricated at process temperature no higher than 100 °C. The influences of channel thickness (tITO, respectively, 6, 9, 12, and 15 nm) on device performance and positive bias stress (PBS) stability of the ITO TFTs are examined. We found that content of oxygen defects positively correlates with tITO, leading to increases of both trap states as well as carrier concentration and synthetically determining electrical properties of the ITO TFTs. Interestingly, the ITO TFTs with a tITO of 9 nm exhibit the best performance and PBS stability, and typical electrical properties include a field-effect mobility (µFE) of 37.69 cm2/Vs, a Von of −2.3 V, a SS of 167.49 mV/decade, and an on–off current ratio over 107. This work paves the way for practical application of the ITO TFTs.

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Effective performance improvement of organic thin film transistors with multi-layer modifications

The European Physical Journal Applied Physics ◽

10.1051/epjap/2020200138 ◽

2020 ◽

Vol 91 (3) ◽

pp. 30201

Author(s):

Hang Yu ◽

Jianlin Zhou ◽

Yuanyuan Hao ◽

Yao Ni

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Performance Enhancement ◽

Organic Thin Film Transistors ◽

Electrical Performance ◽

Hole Injection ◽

Organic Thin Film ◽

Effective Performance ◽

Significant Performance ◽

P Type

Organic thin film transistors (OTFTs) based on dioctylbenzothienobenzothiophene (C8BTBT) and copper (Cu) electrodes were fabricated. For improving the electrical performance of the original devices, the different modifications were attempted to insert in three different positions including semiconductor/electrode interface, semiconductor bulk inside and semiconductor/insulator interface. In detail, 4,4′,4′′-tris[3-methylpheny(phenyl)amino] triphenylamine (m-MTDATA) was applied between C8BTBTand Cu electrodes as hole injection layer (HIL). Moreover, the fluorinated copper phthalo-cyanine (F16CuPc) was inserted in C8BTBT/SiO2 interface to form F16CuPc/C8BTBT heterojunction or C8BTBT bulk to form C8BTBT/F16CuPc/C8BTBT sandwich configuration. Our experiment shows that, the sandwich structured OTFTs have a significant performance enhancement when appropriate thickness modification is chosen, comparing with original C8BTBT devices. Then, even the low work function metal Cu was applied, a normal p-type operate-mode C8BTBT-OTFT with mobility as high as 2.56 cm2/Vs has been fabricated.

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Effect of Illumination on Organic Polymer Thin-Film Transistors

MRS Proceedings ◽

10.1557/proc-771-l10.17 ◽

2003 ◽

Vol 771 ◽

Cited By ~ 3

Author(s):

Michael C. Hamilton ◽

Sandrine Martin ◽

Jerzy Kanicki

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Drain Current ◽

Charge Carriers ◽

Electrical Performance ◽

Organic Polymer ◽

Light Illumination ◽

Polymer Thin Film ◽

Channel Region ◽

White Light Illumination

AbstractWe have investigated the effects of white-light illumination on the electrical performance of organic polymer thin-film transistors (OP-TFTs). The OFF-state drain current is significantly increased, while the drain current in the strong accumulation regime is relatively unaffected. At the same time, the threshold voltage is decreased and the subthreshold slope is increased, while the field-effect mobility of the charge carriers is not affected. The observed effects are explained in terms of the photogeneration of free charge carriers in the channel region due to the absorbed photons.

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