scholarly journals Assessment of plasma power deposition on the ITER ICRH antennas

2021 ◽  
pp. 101021
Author(s):  
M. Brank ◽  
R.A. Pitts ◽  
G. Simič ◽  
P. Lamalle ◽  
M. Kocan ◽  
...  
2018 ◽  
Vol 25 (10) ◽  
pp. 103512 ◽  
Author(s):  
Shuai Cao ◽  
Junxue Ren ◽  
Haibin Tang ◽  
Zhe Zhang ◽  
Yibai Wang ◽  
...  

2020 ◽  
pp. 89-94 ◽  
Author(s):  
Ekaterina V. Lovlya ◽  
Oleg A. Popov

RF inductor power losses of ferrite-free electrode-less low pressure mercury inductively-coupled discharges excited in closed-loop dielectric tube were studied. The modelling was made within the framework of low pressure inductive discharge transformer model for discharge lamps with tubes of 16, 25 and 38 mm inner diam. filled with the mixture of mercury vapour (7.5×10–3 mm Hg) and argon (0.1, 0.3 and 1.0 mm Hg) at RF frequencies of 1, 7; 3.4 and 5.1 MHz and plasma power of (25–500) W. Discharges were excited with the help of the induction coil of 3, 4 and 6 turns placed along the inner perimeter of the closed-loop tube. It was found that the dependence of coil power losses, Pcoil, on the discharge plasma power, Ppl, had the minimum while Pcoil decreased with RF frequency, tube diameter and coil number of turns. The modelling results were found in good qualitative agreement with the experimental data; quantitative discrepancies are believed to be due skin-effect and RF electric field radial inhomogeneity that were not included in discharge modelling.


Coatings ◽  
2019 ◽  
Vol 9 (5) ◽  
pp. 315 ◽  
Author(s):  
Ali Salimian ◽  
Roohollah Haghpanahan ◽  
Abul Hasnath ◽  
Hari Upadhyaya

The photometric properties of an radio frequency (RF)-based sputtering plasma source were monitored through optical spectroscopy. The colour of the plasma source was deduced based on conventional chromaticity index analysis and it was compared to the direct spectral data plots of the emission peaks to investigate the possibility of characterising the plasma based on its specific colour and exploring the potential of defining a new method by which the plasma sputtering process can be addressed based on the plasma colour parameters. The intention of this investigation is to evaluate the possibility of simplifying the monitoring and assessment of the sputtering process for applied scientists operating plasma sputter deposition systems. We demonstrate a viable potential for this technique in terms of providing information regarding the stability of the plasma, chamber pressure, and plasma power; however, further work is underway to verify and assess a relationship between the quality of the thin film coating and the colour characteristics of the deposition plasma. Here, we only focus on the feasibility of such an approach and demonstrate interesting observations. We observed a linear relationship between the colour functions and the plasma power, while the stability of the sputtering plasma can be assessed based on the plasma colour functions. The colour functions also follow a unique pattern when the working gas pressure is increased.


1988 ◽  
Vol 40 (3) ◽  
pp. 407-417 ◽  
Author(s):  
Cheng Chu ◽  
J. L. Sperling

Electromagnetic fluctuations, induced by energetic charged particles, are calculated using correlation techniques for a uniform magnetized plasma. Power emission in the ion-cyclotron range of frequencies (ICRF) is calculated for a specific model of velocity distribution function. The emissive spectra are distinct from that of the black-body radiation and have features that are consistent with experimental observation.


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