Determining the refractive index and the dielectric constant of PPDT2FBT thin film using spectroscopic ellipsometry

2020 ◽  
Vol 110 ◽  
pp. 110445
Author(s):  
Chandan Howlader ◽  
Mehedhi Hasan ◽  
Alex Zakhidov ◽  
Maggie Yihong Chen
Keyword(s):  
Thin Film ◽  
Dielectric Constant ◽  
Refractive Index ◽  
Spectroscopic Ellipsometry

scholarly journals Graded refractive index silicon oxynitride thin film characterized by spectroscopic ellipsometry

1992 ◽  
Vol 10 (4) ◽  
pp. 1462-1466 ◽  
Author(s):  
Paul G. Snyder ◽  
Yi‐Ming Xiong ◽  
John A. Woollam ◽  
Ghanim A. Al‐Jumaily ◽  
F. J. Gagliardi
Keyword(s):  
Thin Film ◽  
Refractive Index ◽  
Spectroscopic Ellipsometry ◽  
Silicon Oxynitride

HIGH RESISTANCE ANODIC OXIDE FILMS ON ALUMINIUM

1966 ◽  
Vol 44 (20) ◽  
pp. 2409-2413 ◽  
Author(s):  
A. C. Harkness ◽  
L. Young
Keyword(s):  
Thin Film ◽  
Experimental Data ◽  
Dielectric Constant ◽  
Refractive Index ◽  
Steady State ◽  
Oxide Films ◽  
Ionic Current ◽  
Anodic Oxide ◽  
Immersion Method ◽  
State Ionic

The thicknesses of oxide films formed in aqueous borate solutions were obtained by the spectrophotometric method after developing the interference colors by evaporating a very thin film of gold or bismuth onto the oxide. The refractive index of the stripped films was determined by the Becke immersion method as 1.57 to 1.58 at 5 900 Å wavelength. The dielectric constant was estimated as 9.8 ± 0.5. Experimental data on the steady state ionic current density, I, through the oxide as a function of the field strength, E, in the oxide could be represented by I = I0 exp −(W − qaE)/kT where I0 = 2.24 × 107 A cm−2, W = 1.3 ± 0.15 eV, q = 3e, a = 2.95 ± 0.15 Å.

Investigation of temperature dependent dielectric constant of a sputtered TiN thin film by spectroscopic ellipsometry

2014 ◽  
Vol 115 (3) ◽  
pp. 033516 ◽  
Author(s):  
S. Tripura Sundari ◽  
R. Ramaseshan ◽  
Feby Jose ◽  
S. Dash ◽  
A. K. Tyagi
Keyword(s):  
Thin Film ◽  
Dielectric Constant ◽  
Spectroscopic Ellipsometry ◽  
Temperature Dependent

Synthesis of MgO Thin Film Deposited on Soda Lime Glass by Sol-Gel Process

2008 ◽  
Vol 569 ◽  
pp. 61-64
Author(s):  
Dae Yong Shin ◽  
Kyung Nam Kim
Keyword(s):  
Thin Film ◽  
Dielectric Constant ◽  
Refractive Index ◽  
Heating Temperature ◽  
Sol Gel ◽  
Soda Lime ◽  
Dissipation Factor ◽  
Preferred Orientation ◽  
Soda Lime Glass ◽  
Sol Gel Process

MgO thin film was deposited on soda lime glass substrate by sol-gel process. MgO thin film with the (200) preferred orientation were prepared by heat-treated at 300~500°C for 10 min. The crystallization, microstructure and electrical properties with various parameters of MgO thin films were investigated. Consequently, it was shows that the (200) preferred orientation of MgO thin film could be obtained as the heating temperature was increased. At heating temperature of 500°C, MgO thin film was composed of columnar crystals with a size of 120 nm. The dielectric constant of the (200) preferred orientation of MgO thin film at 1 kHz without the electric field was 7.2, with a dissipation factor of 4%. When the electric field was increased, the dielectric constant approaches to 7.9 with the dissipation factor of 2.1%. The refractive index of MgO thin film depended on the film thickness. The refractive index of 250 nm thickness was 1.70.

Thickness Dependent Optical Properties of WO3 Thin Film using Surface Plasmon Resonance

2013 ◽  
Vol 1494 ◽  
pp. 233-238
Author(s):  
Ayushi Paliwal ◽  
Monika Tomar ◽  
Vinay Gupta
Keyword(s):  
Thin Film ◽  
Dielectric Constant ◽  
Refractive Index ◽  
Surface Plasmon Resonance ◽  
Surface Plasmon ◽  
Plasmon Resonance ◽  
Rf Magnetron Sputtering ◽  
Complex Dielectric Constant ◽  
Thin Film Thickness ◽  
Bilayer Films

ABSTRACTThe effect of tungsten oxide (WO3) thin film thickness on the surface plasmon resonance (SPR) properties have been investigated. WO3 films of varying the thickness (36 nm, 60 nm, 80 nm, 100 nm, 150 nm and 200nm) have been deposited onto Au coated prism (Au/prism) by radio frequency (RF) magnetron sputtering technique. The SPR responses of bilayer films were fitted with the Fresnel’s equations in order to calculate the dielectric constant of WO3 thin film. The variation of complex dielectric constant and refractive index with the thickness of WO3 thin film was studied.

Spectroscopic Ellipsometry Studies of Nanocrystalline Silicon in Thin-Film Silicon Dioxide

2002 ◽  
Vol 737 ◽  
Author(s):  
Gerald E. Jellison ◽  
Supriya Jaiswal ◽  
Christopher M. Rouleau ◽  
John T. Simpson ◽  
Clark W. White ◽  
...  
Keyword(s):  
Thin Film ◽  
Refractive Index ◽  
Ion Implantation ◽  
Silicon Dioxide ◽  
Spectroscopic Ellipsometry ◽  
Nanocrystalline Silicon ◽  
Silicon Dioxide Film ◽  
Small Doses ◽  
Linear Optical Properties ◽  
Dioxide Film

ABSTRACTNanocrystalline silicon (n-Si) is formed in a silicon dioxide thin-film matrix by ion implantation followed by thermal annealing in forming gas at 1100 °C for 1 hour. The ion implantation is performed using multiple implants with different implantation energies and doses to create a quasi-flat concentration of silicon atoms throughout the silicon dioxide film. These samples are then analyzed using spectroscopic ellipsometry to characterize their linear optical properties. Implantations with small doses (5 × 1020 Si atoms/cm3) increase the refractive index by a small amount (δn∼0.006 at 600nm), while implantations with moderate dose (5 × 1021 Si atoms/cm3) have a larger increase in refractive index and exhibit optical absorption above ∼1.9 eV (650 nm).

scholarly journals Optical Characterization of Ultra-Thin Films of Azo-Dye-Doped Polymers Using Ellipsometry and Surface Plasmon Resonance Spectroscopy

Photonics ◽  
2021 ◽  
Vol 8 (2) ◽  
pp. 41
Author(s):  
Najat Andam ◽  
Siham Refki ◽  
Hidekazu Ishitobi ◽  
Yasushi Inouye ◽  
Zouheir Sekkat
Keyword(s):  
Refractive Index ◽  
Optical Properties ◽  
Surface Plasmon Resonance ◽  
Surface Plasmon ◽  
Spectroscopic Ellipsometry ◽  
Plasmon Resonance ◽  
Complex Refractive Index ◽  
Resonance Spectroscopy ◽  
Doped Polymers

The determination of optical constants (i.e., real and imaginary parts of the complex refractive index (nc) and thickness (d)) of ultrathin films is often required in photonics. It may be done by using, for example, surface plasmon resonance (SPR) spectroscopy combined with either profilometry or atomic force microscopy (AFM). SPR yields the optical thickness (i.e., the product of nc and d) of the film, while profilometry and AFM yield its thickness, thereby allowing for the separate determination of nc and d. In this paper, we use SPR and profilometry to determine the complex refractive index of very thin (i.e., 58 nm) films of dye-doped polymers at different dye/polymer concentrations (a feature which constitutes the originality of this work), and we compare the SPR results with those obtained by using spectroscopic ellipsometry measurements performed on the same samples. To determine the optical properties of our film samples by ellipsometry, we used, for the theoretical fits to experimental data, Bruggeman’s effective medium model for the dye/polymer, assumed as a composite material, and the Lorentz model for dye absorption. We found an excellent agreement between the results obtained by SPR and ellipsometry, confirming that SPR is appropriate for measuring the optical properties of very thin coatings at a single light frequency, given that it is simpler in operation and data analysis than spectroscopic ellipsometry.

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