scholarly journals Modification of the optical properties and nano-crystallinity of anatase TiO2nanoparticles thin film using low pressure O2 plasma treatment

2020 ◽  
Vol 709 ◽  
pp. 138212 ◽  
Author(s):  
M. Mitronika ◽  
J. Profili ◽  
A. Goullet ◽  
L. Stafford ◽  
A. Granier ◽  
...  
Keyword(s):  
Thin Film ◽  
Optical Properties ◽  
Plasma Treatment ◽  
Low Pressure ◽  
O2 Plasma Treatment ◽  
O2 Plasma

scholarly journals Work Function Tuning of Zinc–Tin Oxide Thin Films Using High-Density O2 Plasma Treatment

Coatings ◽  
2020 ◽  
Vol 10 (11) ◽  
pp. 1026
Author(s):  
Young-Hee Joo ◽  
Jae-Hyung Wi ◽  
Woo-Jung Lee ◽  
Yong-Duck Chung ◽  
Dae-Hyung Cho ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Plasma Treatment ◽  
Work Function ◽  
Band Gap ◽  
Optical Band Gap ◽  
High Density ◽  
Work Function Tuning ◽  
O2 Plasma Treatment ◽  
O2 Plasma

Work function tuning has a significant influence on the performance of semiconductor devices, owing to the formation of potential barriers at the interface between metal-semiconductor junctions. In this work, we introduce a technique for tuning the work function of ZnSnO thin films using high-density O2 plasma treatment. The work function and chemical composition of the ZnSnO thin film surfaces were investigated with regards to plasma treatment time through UPS/XPS systems. The optical band gap was estimated using Tauc’s relationship from transmittance data. The work function of Zn0.6Sn0.4O thin film increased from 4.16 eV to 4.64 eV, and the optical band gap increased from 3.17 to 3.23 eV. The surface of Zn0.6Sn0.4O thin films showed a smooth morphology with an average of 0.65 nm after O2 plasma treatment. The O2 plasma treatment technique exhibits significant potential for application in high-performance displays in optical devices, such as thin-film transistors (TFTs), light-emitting diodes (LEDs), and solar cells.

Low Temperature Solution-Processed Zinc Tin Oxide Thin Film Transistor with O2 Plasma Treatment

2019 ◽  
Vol 33 (5) ◽  
pp. 283-288 ◽  
Author(s):  
Jeong-Soo Lee ◽  
Yong-Jin Kim ◽  
Yong-Uk Lee ◽  
Seung-Hwan Cho ◽  
Yong-Hoon Kim ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Plasma Treatment ◽  
Tin Oxide ◽  
Thin Film Transistor ◽  
Oxide Thin Film ◽  
Zinc Tin Oxide ◽  
Temperature Solution ◽  
O2 Plasma Treatment ◽  
O2 Plasma

Effect of O2 plasma treatment on density-of-states in a-IGZO thin film transistors

2016 ◽  
Vol 13 (1) ◽  
pp. 45-50 ◽  
Author(s):  
Xingwei Ding ◽  
Fei Huang ◽  
Sheng Li ◽  
Jianhua Zhang ◽  
Xueyin Jiang ◽  
...  
Keyword(s):  
Thin Film ◽  
Plasma Treatment ◽  
Density Of States ◽  
Thin Film Transistors ◽  
O2 Plasma Treatment ◽  
O2 Plasma
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