Influence of nitrogen ion beam assisted deposition of Cr on tribological properties of tool steel NW1

Vacuum ◽  
2003 ◽  
Vol 70 (2-3) ◽  
pp. 411-416 ◽  
Author(s):  
P. Budzynski ◽  
P. Tarkowski ◽  
P. Żukowski ◽  
K. Kiszczak ◽  
W. Kasietczuk
Keyword(s):  
Tool Steel ◽  
Tribological Properties ◽  
Ion Beam ◽  
Ion Beam Assisted Deposition ◽  
Nitrogen Ion

Mechanical and Tribological Properties of Chromium-Nitrogen Films Deposited by Ion Beam Assisted Deposition

1996 ◽  
Vol 438 ◽  
Author(s):  
E. J. Tobin ◽  
F. Namavar ◽  
H. F. Karimy ◽  
C. Colerico-Stenstrom ◽  
R. J. Bricault ◽  
...  
Keyword(s):  
Stainless Steel ◽  
Tribological Properties ◽  
Ion Beam ◽  
Fine Grained ◽  
Mechanical And Tribological Properties ◽  
Ion Beam Assisted Deposition ◽  
Uncoated Steel ◽  
Nitrogen Ion ◽  
Steel Substrates ◽  
Chromium Evaporation

AbstractMechanical and tribological properties of chromium-nitrogen films deposited by ion beam assisted deposition (IBAD) were investigated. The films were deposited reactively, i.e., via chromium evaporation with concurrent nitrogen ion beam bombardment, on stainless steel substrates at low deposition temperatures (<200°C). Two primary deposition regimes, with differing Cr/N atom-to-ion arrival ratios, were investigated: approximately 0.8–1.0 and 2.5–3.0. Rutherford Backscattering Spectroscopic analysis showed the lower arrival ratio films to be essentially stoichiometric CrN, whereas films deposited at higher arrival ratios were Cr-rich with Cr/N ratios of about 3:1. Both films were fine grained polycrystalline (typically 5–20 nanometer crystal dimension). The stoichiometric films were approximately two times harder than the Cr-rich films., based on nanohardness indentation measurements, and possessed higher residual stress levels. Both film types substantially improved the wear resistance of stainless steel disks, based on the results of ball-ondisk wear tests against ruby balls. The best performance was obtained with Cr-rich films, which exhibited a very low wear rate and lower friction than either the stoichiometric film or the uncoated steel.

scholarly journals Protective Sliding Carbon-Based Nanolayers Prepared by Argon or Nitrogen Ion-Beam Assisted Deposition on Ti6Al4V Alloy

2016 ◽  
Vol 2016 ◽  
pp. 1-9 ◽  
Author(s):  
Petr Vlcak ◽  
Ivan Jirka
Keyword(s):  
Coefficient Of Friction ◽  
Ion Beam ◽  
Reference Sample ◽  
Surface Hardness ◽  
Ti6al4v Alloy ◽  
Ion Beam Assisted Deposition ◽  
The Coefficient Of Friction ◽  
Nitrogen Ion ◽  
Ion Assistance ◽  
Carbon Based

The microstructure and the surface properties of samples coated by carbon-based nanolayer were investigated in an effort to increase the surface hardness and reduce the coefficient of friction of the Ti6Al4V alloy. Protective carbon-based nanolayers were fabricated by argon or nitrogen ion-beam assisted deposition at ion energy of 700 eV on Ti6Al4V substrates. The Raman spectra indicated that nanolayers had a diamond-like carbon character with sp2rich bonds. The TiC and TiN compounds formed in the surface area were detected by X-ray diffraction. Nanoscratch tests showed increased adhesion of a carbon-based nanolayer deposited with ion assistance in comparison with a carbon nanolayer deposited without ion assistance. The results showed that argon ion assistance leads to greater nanohardness than a sample coated by a carbon-based nanolayer with nitrogen ion assistance. A more than twofold increase in nanohardness and a more than fivefold decrease in the coefficient of friction were obtained for samples coated by a carbon-based nanolayer with ion assistance, in comparison with the reference sample.

scholarly journals Tribomechanical Properties of a Carbon-Based Nanolayer Prepared by Nitrogen Ion Beam Assisted Deposition for Finger Joint Replacements

2018 ◽  
Vol 2018 ◽  
pp. 1-9 ◽  
Author(s):  
Tomas Horazdovsky ◽  
Radka Vrbova
Keyword(s):  
Ion Beam ◽  
Titanium Substrate ◽  
Surface Hardness ◽  
Ion Bombardment ◽  
Ti6al4v Alloy ◽  
Wear Testing ◽  
Ion Beam Assisted Deposition ◽  
Nitrogen Ion ◽  
Ion Assistance ◽  
Carbon Based

This paper presents the tribomechanical test results of Ti6Al4V alloy modified by carbon-based nanolayers with a thickness of 20 nm and 40 nm, prepared by nitrogen ion beam assisted deposition. The presence of carbon and nitrogen compounds was observed in the modified surface after ion bombardment. Nonstoichiometric TiNx was mainly detected near the interface nanolayer/titanium substrate and in the substrate itself. Ion bombardment led to an improved surface hardness of ~13 GPa in comparison to unmodified Ti6Al4V titanium alloy (~5.5 GPa) and alloy coated by carbon nanolayer without nitrogen ion assistance (~7 GPa). The decreasing of friction coefficient was achieved from 0.5–0.6 for untreated Ti6Al4V alloy to 0.1 for treated Ti6Al4V alloy. Wear testing using a joint wear simulator proved that the modified Ti6Al4V alloy has a higher resistance compared to the unmodified Ti6Al4V alloy. The primary local wear fault of the treated surface was observed after 240,000 cycles in comparison to enormous wear on the untreated surface after just 10,000 cycles. Treating the Ti6Al4V load-bearing components of implants with carbon-based nanolayers assisted by nitrogen ions is very promising in terms of extending the lifetime of implants and thereby reduces patient burden.

Effect of Microstructure on Microhardness of AlN Thin Films

2001 ◽  
Vol 695 ◽  
Author(s):  
Shuichi Miyabe ◽  
Masami Aono ◽  
Nobuaki Kitazawa ◽  
Yoshihisa Watanabe
Keyword(s):  
Thin Films ◽  
Film Thickness ◽  
Beam Energy ◽  
Ion Beam ◽  
Columnar Structure ◽  
Granular Structure ◽  
Nano Indentation ◽  
Ion Beam Assisted Deposition ◽  
Film Microstructure ◽  
Nitrogen Ion

ABSTRACTAluminum nitride (AlN) thin films with columnar and granular structures were prepared by ion-beam assisted deposition method by changing nitrogen ion beam energy, and the effects of the film microstructure and film thickness on their microhardness were studied by using a nano-indentation system with the maximum force of 3 mN. For the columnar structure film of 600 nm in thickness, the microhardness is found to be approximately 24 GPa when the normalized penetration depth to the film thickness is about 0.1. For the granular structure film of 700 nm in thickness, the microhardness is found to be approximately 14 GPa. These results reveal that the microhardness of the AlN films strongly depends on the film microstructure, which can be controlled by regulating the nitrogen ion beam energy.

Adhesion and Tribological Properties of Ag and Ag/Ti Films on Zro2 Ceramic Substrates After Heat Treatment at 250°C

1991 ◽  
Vol 239 ◽  
Author(s):  
J. H. Hsieh ◽  
O. O. Ajayi ◽  
A. Erdemir ◽  
F. A. Nichols
Keyword(s):  
Heat Treatment ◽  
Tribological Properties ◽  
Ion Beam ◽  
Negative Effects ◽  
Ceramic Substrates ◽  
Ion Beam Assisted Deposition ◽  
Before And After ◽  
Pin On Disc ◽  
The Relationship ◽  
Ti Films

ABSTRACTAg and Ag/Ti films were deposited on ZrO2 substrates by ion-beam-assisted deposition. Adhesion of these films was measured before and after heat treatment at 250°C in air. The results show that a graded interface between Ag and Ti was necessary for the Ag films to survive the heat treatment. Reciprocating pin-on-disc tests were performed at 150°C after heat treatment to investigate the relationship between adhesion and tribological properties. The failure of Ag and Ag/Ti (without graded interface) films was also observed during wear tests. However, this Ag film failure did not result in negative effects. All three Ag-coated substrates show better tribological behavior.

Thermal Annealing Investigation of the Optical Properties of Si1-xNx Films Fabricated by Ion Beam Assisted Deposition

1988 ◽  
Vol 128 ◽  
Author(s):  
E. P. Donovan ◽  
C. A. Carosella ◽  
D. Van Vechten
Keyword(s):  
Optical Properties ◽  
Ion Beam ◽  
Optical Filters ◽  
Beam Current ◽  
Index Of Refraction ◽  
Silicon Substrates ◽  
Atom Fraction ◽  
Ion Beam Assisted Deposition ◽  
Deposition Parameters ◽  
Nitrogen Ion

ABSTRACTThe annealing behavior of the optical properties of silicon nitride films (Si1-xNx) is described for films fabricated by ion beam assisted deposition. The data are needed for the precise manufacture of optical filters, where the index of refraction must be predicted from deposition parameters and film annealing history.The reflection of homogeneous, amorphous samples deposited on (100) silicon substrates was measured from 500 to 3120 nm. Fits to the interference spectra were obtained over the range 1000 to 3120 nm to obtain the index of refraction vs wavelength as a function of film nitrogen content. Nitrogen atom fraction was varied from.2 to.58 by variation of the incident relative fluxes of nitrogen ion beam current to evaporant silicon flux. The films were annealed in argon at 450 C, 600 C, 750 C, and 1100 C and the measurements repeated. The systematic shifts in index of refraction with annealing temperature are described.

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