Crystalline magnesium oxide films on soda lime glass by sol–gel processing

2002 ◽  
Vol 54 (2-3) ◽  
pp. 120-123 ◽  
Author(s):  
S Chakrabarti ◽  
D Ganguli ◽  
S Chaudhuri ◽  
A.K Pal
1999 ◽  
Vol 30 (1) ◽  
pp. 548 ◽  
Author(s):  
S. H. Woo ◽  
J. J. Kim ◽  
J. H. Ryu ◽  
M. H. Park ◽  
C. W. Park ◽  
...  

2005 ◽  
Vol 192 (3) ◽  
pp. 327-335 ◽  
Author(s):  
Seung Hun Oh ◽  
Jae Seong Kim ◽  
Jin Suk Chung ◽  
Eui Jung Kim ◽  
Sung Hong Hahn

2014 ◽  
Vol 1004-1005 ◽  
pp. 774-777 ◽  
Author(s):  
Ji Wan Liu ◽  
Gui Lin Chen ◽  
Wei Feng Liu ◽  
Guo Shun Jiang ◽  
Chang Fei Zhu

A low-cost non-vacuum process for fabrication of Cu2SnSe3 film by sol-gel method and knife-coating process is described. First, a certain amount of Copper (I) chloride and tin (IV) tetrachloride was dissolve into the mixture of water and alcohol and then some Polyvinyl Pyrrolidone (PVP) was added to the solution to obtain based colloidal solution. Next, precursor thin layer was deposited by knife-blading technique on soda-lime glass (SLG). Finally, precursor layer was annealed at selenium flow atmosphere carried by Ar gas at 550oC. Through X-ray diffraction (XRD) and Raman spectra, it is found that pure Cu2SnSe3 film was prepared successfully. Scanning electron microscopy (SEM) and UV–vis–NIR absorbance spectroscopy were used to characterize its morphology and optical bandgap.


2015 ◽  
Vol 1109 ◽  
pp. 461-465 ◽  
Author(s):  
Nurbaya Zainal ◽  
Mohd Hafiz Wahid ◽  
Mohammad Rusop

Performance of lead titanate, (PbTiO3) thin films have been successfully investigated on microstructural properties, I-V characteristic, dielectric properties, and ferroelectric properties. PbTiO3offers variety of application as transducer, ferroelectric random access memory, transistor, high performance capacitor, sensor, and many more due to its ferroelectric behavior. Preparation of the films are often discussed in order to improve the structural properties, like existence of grain boundaries, particle uniformity, presents of microcrack films, porosities, and many more. Yet, researchers still prepare PbTiO3thin films at high crystallization temperature, certainly above than 600 ̊C to obtain single crystal perovskite structure that would be the reason to gain high spontaneous polarization behavior. Although this will results to high dielectric constant value, the chances that leads to high leakage current is a major failure in device performance. Thus, preparation the thin films at low annealing temperature quite an essential study which is more preferable deposited on low-cost soda lime glass. The study focuses on low annealing temperature of PbTiO3thin films through sol-gel spin coating method and undergo for dielectric and I-V measurements.


2009 ◽  
Vol 620-622 ◽  
pp. 695-698
Author(s):  
Jing Ma ◽  
Wen Xiu Liu ◽  
Xiao Guang Qu ◽  
Dan Ni Yu ◽  
Wen Bin Cao

TiO2 thin film was prepared on soda lime glass by hydrolysis of Ti(OC4H9)4 in alcoholic solutions by sol-gel method combined with spin-coating and calcination different temperatures. Prepared samples were characterized by XRD, FESEM, and measurement of contact angles and transmittance. XRD identification reveals that the films are composed of anatase TiO2 when the annealing temperature was set at 450~550 oC. SiO2 layer was coated on the surface of the glass firstly to barrier the diffusing of sodium ions from the substrate. Light-induced superhydrophilicity of the TiO2 thin film has been investigated. To increase the illumination light intensity will decrease the water contact angle. The superhydrophilicity of the TiO2 thin film will disappear more slowly in the dark than that in the field of ultrasound.


2005 ◽  
Vol 475-479 ◽  
pp. 3897-3900
Author(s):  
Qing Ju Liu ◽  
Jin Zhang ◽  
Zhongqi Zhu ◽  
Yingxia Jin ◽  
Qing Hui Wang

TiO2-Al2O3 composite thin films were fabricated on soda-lime glass with sol-gel technology. By measuring the contact angle of water with the film surface and the analysis of the XRD and XPS, we studied the influence of Al2O3 doping concentration and film thickness on the hydrophilicity of the composite films. The results indicate that the doping of Al2O3 into TiO2 and the relatively large thickness of the films can improve their hydrophilicity.


2005 ◽  
Vol 20 (8) ◽  
pp. 2173-2183 ◽  
Author(s):  
M. Sakai ◽  
J. Zhang ◽  
A. Matsuda

Elastic deformation of coating/substrate composites was examined for axisymmetric indentations with three different geometries of flat-ended cylinder, sphere, and cone. Intensive theoretical considerations were made for the Boussinesq problems not only in its Fredholm integral equation of the second kind, but also in its Green function using the principle of superposition for the approximated contact stress distribution. The agreement and the disagreement between these two different numerical/analytical assessments for elastic surface deformations are discussed. Along with these theoretical considerations, experimental scrutiny was conducted for the theoretical predictions for spherical indentation by the use of a sol-gel-derived MeSiO3/2 film coated on a soda-lime glass plate. A novel technique is also proposed for estimating in a simultaneous manner the elastic moduli of both the coating film and of the substrate or the elastic modulus of the film and its thickness in spherical indentation tests.


1989 ◽  
Vol 4 (4) ◽  
pp. 863-872 ◽  
Author(s):  
Frank B. Ellis ◽  
Jim Houghton

Silicon dioxide for use as a diffusion barrier between soda lime glass and fluorine-doped tin oxide is deposited uniformly by atmospheric chemical vapor deposition from silane. oxygen, and nitrogen using a simple single-slot injector head. With a sufficiently thick silicon dioxide layer, the conductivity of the tin oxide is greatly improved by reducing the diffusion of sodium into the tin oxide as it is deposited between about 500 to 600 °C. Based upon the conductivity of thin lightly doped tin oxide films, it appears that at least 250 nm of silicon dioxide deposited on soda lime glass are required to essentially eliminate the diffusion of sodium into the tin oxide. However, only about 10 nm of silicon dioxide are required to obtain almost the full benefit of 250 nm thick films for moderately doped tin oxide films approximately 500 nm thick, The silicon dioxide deposition process is examined between 350 and 580 °C. The activation energy for the deposition is about 27 kJ/mole. Peak and average film deposition rates greater than 50 nm/sec and 10 nm/sec, respectively, may be obtained. The dependence of the film growth rate on the silane, oxygen, and propylene (an inhibitor) concentration is examined. The deposition rate is found to be limited by the rate of gas-phase reactions. Deposition conditions which yield high silane utilization and good film uniformity are discussed. The origin of undesirable by-product powder is studied. At low silane concentration, powder is mainly formed as the gases cool due to condensation from intermediate species.


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