Orientation Imaging of A Nb-Ti-Si Directionally Solidified In-Situ Composite
In this paper we report on the microstructural characterization of a directionally solidified (DS) Nb-Ti-Si alloy. The solidified ingot had a nominal composition of Nb-33 at%Ti-16 at% Si and was grown using the Czochralski technique with growth rate of 5 mm/min. The as-solidified ingot was approximately 50 mm long with a 10 mm diameter. The microstructure was examined using backscatter electron imaging and the microtexture of each of the phases was determined using the Electron BackScattering Pattern (EBSP) technique for electron diffraction in the scanning electron microscope. The details of the experiments are similar to those we have reported previously. Automated EBSP scans were acquired in order to map the local texture (microtexture) over most of a transverse cross-section through the ingot.Figure 1 is a backscattered electron image (BEI) of a transverse section of the as-solidified microstructure. In this image, the bcc-Nb phase is the lighter gray phase and has a dendritic structure. The dark gray phase is (Nb,Ti)3Si having a Ti3P crystal structure. The silicide phase appears as both multiply-faceted dendrites and irregularly bounded grains. A pattern of shading, due to Ti segregation, can be seen in figure 1 and suggests a cellular solidification structure. Figure 2 is a BEI taken at higher magnification to show a region that was analyzed by automated-EBSP. Figure 3 contains orientation images generated from the automated-EBSP data set. In Figure 3a, the color black signifies positions for which no Nb diffraction patterns could be indexed and other shades of gray signify specific Nb orientations, as described by a set of Euler angles. A similarly generated orientation image for the silicide phase is shown in Figure 3b. The greyscale image presented here is actually a rendering of a truecolor image based on a RGB triplet using the Euler angles.