scholarly journals Hyperbolic plasmon–phonon dispersion on group velocity reversal and tunable spontaneous emission in graphene–ferroelectric substrate

2019 ◽  
Vol 3 (1) ◽  
Author(s):  
Desalegn T. Debu ◽  
Faezeh Tork Ladani ◽  
David French ◽  
Stephen J. Bauman ◽  
Joseph B. Herzog
2015 ◽  
Vol 82 (11) ◽  
Author(s):  
Haonan Luo ◽  
Linli Zhu

This work investigates the phonon properties such as phonon dispersion relation, average group velocity, and phonon density of state (DOS) theoretically in GaN nanofilm under various surface stress fields. By taking into account of the surface energy effects, the elasticity theory is presented to describe the confined phonons of nanofilms with different surface stresses. The calculation results show that the influence of surface stress on the phonon properties depends on the thickness of nanofilm. The negative surface stress leads to a higher average group velocity and corresponding lower phonon DOS. The positive surface stress has the opposite effect. The significant modification of thermal properties, e.g., phonon thermal conductivity, in GaN nanofilms is mostly stemmed from the change of phonon average group velocity and DOS by surface stress. These results suggest that the thermal or electrical properties in GaN nanofilms could be enhanced or reduced by tuning the surface stress acting on the films.


2007 ◽  
Vol 7 (11) ◽  
pp. 4094-4100 ◽  
Author(s):  
Jae Sik Jin ◽  
Joon Sik Lee

An electron–phonon interaction model is proposed and applied to thermal transport in semiconductors at micro/nanoscales. The high electron energy induced by the electric field in a transistor is transferred to the phonon system through electron–phonon interaction in the high field region of the transistor. Due to this fact, a hot spot occurs, which is much smaller than the phonon mean free path in the Si-layer. The full phonon dispersion model based on the Boltzmann transport equation (BTE) with the relaxation time approximation is applied for the interactions among different phonon branches and different phonon frequencies. The Joule heating by the electron–phonon scattering is modeled through the intervalley and intravalley processes for silicon by introducing average electron energy. The simulation results are compared with those obtained by the full phonon dispersion model which treats the electron–phonon scattering as a volumetric heat source. The comparison shows that the peak temperature in the hot spot region is considerably higher and more localized than the previous results. The thermal characteristics of each phonon mode are useful to explain the above phenomena. The optical mode phonons of negligible group velocity obtain the highest energy density from electrons, and resides in the hot spot region without any contribution to heat transport, which results in a higher temperature in that region. Since the acoustic phonons with low group velocity show the higher energy density after electron–phonon scattering, they induce more localized heating near the hot spot region. The ballistic features are strongly observed when phonon–phonon scattering rates are lower than 4 × 1010 s−1.


2007 ◽  
Vol 7 (11) ◽  
pp. 4094-4100
Author(s):  
Jae Sik Jin ◽  
Joon Sik Lee

An electron–phonon interaction model is proposed and applied to thermal transport in semiconductors at micro/nanoscales. The high electron energy induced by the electric field in a transistor is transferred to the phonon system through electron–phonon interaction in the high field region of the transistor. Due to this fact, a hot spot occurs, which is much smaller than the phonon mean free path in the Si-layer. The full phonon dispersion model based on the Boltzmann transport equation (BTE) with the relaxation time approximation is applied for the interactions among different phonon branches and different phonon frequencies. The Joule heating by the electron–phonon scattering is modeled through the intervalley and intravalley processes for silicon by introducing average electron energy. The simulation results are compared with those obtained by the full phonon dispersion model which treats the electron–phonon scattering as a volumetric heat source. The comparison shows that the peak temperature in the hot spot region is considerably higher and more localized than the previous results. The thermal characteristics of each phonon mode are useful to explain the above phenomena. The optical mode phonons of negligible group velocity obtain the highest energy density from electrons, and resides in the hot spot region without any contribution to heat transport, which results in a higher temperature in that region. Since the acoustic phonons with low group velocity show the higher energy density after electron–phonon scattering, they induce more localized heating near the hot spot region. The ballistic features are strongly observed when phonon–phonon scattering rates are lower than 4 × 1010 s−1.


Author(s):  
Jae Sik Jin ◽  
Joon Sik Lee

An electron-phonon interaction model is proposed and applied to the transient thermal transport simulation during electrostatic discharge (ESD) event in the NMOS transistor. The high electron energy induced by the ESD in the transistor is transferred to the lattice phonons through electron-phonon interaction in the local region of the transistor. Due to this fact, a hot spot turns up, the size of which is much smaller than the phonon mean free path in the silicon layer. The full phonon dispersion model based on the Boltzmann transport equation (BTE) with the relaxation time approximation is applied to describe the interactions among different phonon branches and different phonon frequencies. The Joule heating by the electronphonon scattering is modeled through the intervalley and intravalley processes by introducing the average electron energy. In the simulation, the electron-phonon interaction model is used in the hot spot region, and then after a quasi-equilibrium state is achieved there, the temperature of lattice phonons in the silicon is calculated by using the phonon-phonon interaction model. The revolution of peak temperature in the hot spot during the ESD event is simulated and compared to that obtained by the previous full phonon dispersion model which treats the electron-phonon scattering as a volumetric heat source. The results show that the lower group velocity phonon modes (i.e. higher frequency) and optical mode of negligible group velocity obtain the highest energy density from electrons during the ESD event, which induces the devices melting phenomenon. The thermal response of phonon is also investigated, and it is found that the ratio of the phonon group velocity to the phonon specific heat can account for the phonon thermal response. If the ratio is higher than 2, the phonon have a good response to the heat input changes.


2019 ◽  
Vol 33 (27) ◽  
pp. 1950337
Author(s):  
Sanjeev K. Verma ◽  
Anushri Gupta ◽  
Anita Kumari ◽  
B. D. Indu

The expressions for the renormalized phonon group velocity (RPGV) has been developed from renormalized phonon dispersion relations obtained with the help of impurity-induced anharmonic quantum dynamics of phonons via Green’s functions. It is observed that RPGV shows dependence on doping, phonon frequency, temperature, and anharmonicity. The [Formula: see text] superconductor has been taken for model calculations to successfully apply the new results of RPGV.


Author(s):  
Cristina H. Amon ◽  
Jayathi Y. Murthy ◽  
Sreekant V. J. Narumanchi

In modern microelectronics, where extreme miniaturization has led to feature sizes in the sub-micron and nanoscale range, Fourier diffusion has been found to be inadequate for the prediction of heat conduction. Over the past decade, the phonon Boltzmann transport equation (BTE) in the relaxation time approximation has been employed to make thermal predictions in dielectrics and semiconductors at micron and nanoscales. This paper presents a review of the BTE-based solution methods widely employed in the literature. Particular attention is given to the problem of self-heating (hotspot) in sub-micron transistors. First, the solution approaches based on the gray formulation of the BTE are presented. In this class of solution methods, phonons are characterized by one single group velocity and relaxation time. Phonon dispersion is not accounted for in any detail. This is the most widely employed approach in the literature. The semi-gray BTE approach, moments of the Boltzmann equation, the lattice Boltzmann approach, and the ballistic-diffusive approximation are presented. Models which incorporate greater details of phonon dispersion are also discussed. This includes a full phonon dispersion model developed recently by the authors. This full phonon dispersion model satisfies energy conservation, incorporates the different phonon modes, and well as the interactions between the different modes, and accounts for the frequency dependence for both the phonon group velocity and relaxation times. Results which illustrate the differences between some of these models reveal the importance of developing models that incorporate substantial details of phonon physics.


Author(s):  
F. Hasselbach ◽  
A. Schäfer

Möllenstedt and Wohland proposed in 1980 two methods for measuring the coherence lengths of electron wave packets interferometrically by observing interference fringe contrast in dependence on the longitudinal shift of the wave packets. In both cases an electron beam is split by an electron optical biprism into two coherent wave packets, and subsequently both packets travel part of their way to the interference plane in regions of different electric potential, either in a Faraday cage (Fig. 1a) or in a Wien filter (crossed electric and magnetic fields, Fig. 1b). In the Faraday cage the phase and group velocity of the upper beam (Fig.1a) is retarded or accelerated according to the cage potential. In the Wien filter the group velocity of both beams varies with its excitation while the phase velocity remains unchanged. The phase of the electron wave is not affected at all in the compensated state of the Wien filter since the electron optical index of refraction in this state equals 1 inside and outside of the Wien filter.


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