Field-enhanced bulk conductivity and resistive-switching in Ca-doped BiFeO3 ceramics

For examining the carrier movements through tunnel junction, electrically and optically-biased photoreflectance spectroscopy (EBPR and OBPR) were used to investigate the internal electric field in the InGaP/GaAs dual junction solar cell at room temperature. At InGaP and GaAs, the strength of p-n junction electric fields (Fpn) was perturbed by the external DC bias voltage and CW light intensity for EBPR and OBPR experiments, respectively. Moreover, the Fpn was evaluated using the Fast Fourier Transform (FFT) of the Franz—Keldysh oscillation from PR spectra. In the EBPR, the electric field decreased by increasing the DC bias voltage, which also decreased the potential barrier. In OBPR, when incident CW light is absorbed by the top cell, the decrement of the Fpn in the GaAs cell indicates that the photogenerated carriers are accumulated near the p-n junction. Photogenerated carriers in InGaP can pass through the tunnel junction, and the PR results show the contribution of the modification of the electric field by the photogenerated carriers in each cell. We suggest that PR spectroscopy with optical-bias and electrical-bias could be analyzed using the information of the photogenerated carrier passed through the tunnel junction.

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Resistive switching and electric field control of ferromagnetism in SnO2 films deposited at room temperature

Journal of Magnetism and Magnetic Materials ◽

10.1016/j.jmmm.2018.11.013 ◽

2019 ◽

Vol 475 ◽

pp. 368-373 ◽

Cited By ~ 3

Author(s):

Xinran Liu ◽

Jianpei Bu ◽

Xue Ren ◽

Bin Cheng ◽

Jihao Xie ◽

...

Keyword(s):

Electric Field ◽

Resistive Switching ◽

Room Temperature ◽

Field Control

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DC-bias-voltage dependence of degradation of aluminum electrolytic capacitors

Microelectronics Reliability ◽

10.1016/j.microrel.2018.02.012 ◽

2018 ◽

Vol 83 ◽

pp. 115-118 ◽

Cited By ~ 4

Author(s):

K. Hasegawa ◽

K. Tsuzaki ◽

S. Nishizawa

Keyword(s):

Bias Voltage ◽

Voltage Dependence ◽

Electrolytic Capacitors ◽

Dc Bias ◽

Bias Voltage Dependence ◽

Aluminum Electrolytic Capacitors

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Electric control of magnetization in an amorphous Co–Fe–Ta–B–O film by resistive switching

Physical Chemistry Chemical Physics ◽

10.1039/d0cp00824a ◽

2020 ◽

Vol 22 (16) ◽

pp. 8672-8678

Author(s):

Siqi Yin ◽

Chengyue Xiong ◽

Cheng Chen ◽

Xiaozhong Zhang

Keyword(s):

Resistive Switching ◽

Room Temperature ◽

Electric Control

A reversible and nonvolatile control of magnetization was achieved in a Co–Fe–Ta–B–O film at room temperature by resistive switching.

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Full Electric Control of Exchange Bias at Room Temperature by Resistive Switching

Advanced Materials ◽

10.1002/adma.201801885 ◽

2018 ◽

Vol 30 (30) ◽

pp. 1801885 ◽

Cited By ~ 17

Author(s):

Lujun Wei ◽

Zhenzhong Hu ◽

Guanxiang Du ◽

Yuan Yuan ◽

Ji Wang ◽

...

Keyword(s):

Resistive Switching ◽

Exchange Bias ◽

Room Temperature ◽

Electric Control

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Frequency and dc bias voltage dependent dielectric properties and electrical conductivity of BaTiO3SrTiO3/(SiO2)x nanocomposites

Ceramics International ◽

10.1016/j.ceramint.2019.03.092 ◽

2019 ◽

Vol 45 (9) ◽

pp. 11989-12000 ◽

Cited By ~ 29

Author(s):

Y. Slimani ◽

B. Unal ◽

E. Hannachi ◽

A. Selmi ◽

M.A. Almessiere ◽

...

Keyword(s):

Electrical Conductivity ◽

Dielectric Properties ◽

Bias Voltage ◽

Voltage Dependent ◽

Dc Bias

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Critical Parameters and Influence on Dynamic Behaviours of Nonlinear Electrostatic Force in a Micromechanical Vibrating Gyroscope

Shock and Vibration ◽

10.1155/2020/8880124 ◽

2020 ◽

Vol 2020 ◽

pp. 1-15

Author(s):

Shuying Hao ◽

Yulun Zhu ◽

Yuhao Song ◽

Qichang Zhang ◽

Jingjing Feng ◽

...

Keyword(s):

Numerical Simulation ◽

Bias Voltage ◽

Electrostatic Force ◽

Dynamic Performance ◽

Great Influence ◽

Critical Parameters ◽

Multiple Time Scales ◽

Multiple Time ◽

Element Analysis ◽

Dc Bias

The electrostatic force nonlinearity caused by fringe effects of the microscale comb will affect the dynamic performance of the micromechanical vibrating gyroscopes (MVGs). In order to reveal the influence mechanism, a class of four-degree-of-freedom (4-DOF) electrostatically driven MVG is considered. The influence of DC bias voltage and comb spacing on the nonlinearity of electrostatic force and the dynamic response of the MVG by using multiple time scales method and numerical simulation are discussed. The results indicate that the electrostatic force nonlinearity causes the system to show stiffness softening. The softening characteristics of the electrostatic force cause the offset of the resonance frequency and a decrease in sensitivity. Although the electrostatic nonlinearity has a great influence on the dynamic behaviour, its influence can be avoided by the reasonable design of the comb spacing and DC bias voltage. There exists a critical value for comb spacing and DC bias voltage. In this paper, determining the critical values is demonstrated by nonlinear dynamics analysis. The results can be supported by the finite element analysis and numerical simulation.

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Resistive switching behavior and mechanism of room-temperature-fabricated flexible Al/TiS2-PVP/ITO/PET memory devices

Current Applied Physics ◽

10.1016/j.cap.2019.01.017 ◽

2019 ◽

Vol 19 (4) ◽

pp. 458-463 ◽

Cited By ~ 3

Author(s):

Deyuan Lyu ◽

Cong Hu ◽

Yuting Jiang ◽

Na Bai ◽

Qi Wang ◽

...

Keyword(s):

Resistive Switching ◽

Room Temperature ◽

Switching Behavior ◽

Memory Devices ◽

Resistive Switching Behavior

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Zirconia Coatings Deposited by Inductively Coupled Plasma Assisted CVD

MRS Proceedings ◽

10.1557/proc-555-191 ◽

1998 ◽

Vol 555 ◽

Author(s):

P. Colpo ◽

G. Ceccone ◽

B. Leclercq ◽

P. Salvatore ◽

F. Rossi

Keyword(s):

Thin Films ◽

Bias Voltage ◽

Inductively Coupled Plasma ◽

Gas Mixture ◽

Negative Bias ◽

Negative Bias Voltage ◽

Inductively Coupled ◽

Deposition Parameters ◽

Coating Characteristics ◽

Dc Bias

AbstractThin films of zirconia have been deposited by an Inductively Coupled Plasma Assisted CVD (ICP-PACVD) reactor from tetra (tert-butoxy)-zircon precursor diluted in Ar and O2 gas mixture. An independent RF generator is used to control carefully the substrate negative bias voltage during the deposition. Zirconia thin films, with thickness up to 10 microns were deposited on Si (100) polished wafers under different plasma conditions. Correlation between deposition parameters, and microstructure has been established showing that the ion bombardment has a large influence on the coating characteristics. In particular, the possibility of tailoring mechanical properties of the films by controlling the applied DC bias voltage is discussed.

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