scholarly journals Gradient flow approach to an exponential thin film equation: global existence and latent singularity

2019 ◽  
Vol 25 ◽  
pp. 49 ◽  
Author(s):  
Yuan Gao ◽  
Jian-Guo Liu ◽  
Xin Yang Lu

In this work, we study a fourth order exponential equation, ut = Δe−Δu derived from thin film growth on crystal surface in multiple space dimensions. We use the gradient flow method in metric space to characterize the latent singularity in global strong solution, which is intrinsic due to high degeneration. We define a suitable functional, which reveals where the singularity happens, and then prove the variational inequality solution under very weak assumptions for initial data. Moreover, the existence of global strong solution is established with regular initial data.

2000 ◽  
Vol 653 ◽  
Author(s):  
Jie Zhang ◽  
James B. Adams

AbstractWe present FACET: a two dimensional simulator to model polycrystalline thin film growth, which links atomic scale processes to macroscopic phenomena. The model is based on the concept of describing the crystal surface in terms of preferred facets. Line segments were used to depict the profile of the grain and grain boundaries. Multiple nuclei are semi-randomly distributed along the textured or non-textured surface, and crystallographycally appropriate facets are created in the nucleation simulation. We use a Kinetic Lattice Monte Carlo (KLMC) method to calculate the inter-facet diffusion rates and use a continuum approach to grow the facets, hence the multiple grains. The software is Windows(95/98/2000/NT) based and has an integrated Graphical User Interface, within which a user can input deposition conditions and experimental and simulation data, visualize the nucleation and growth of the grains, and obtain the final grain structure and texture.


2021 ◽  
Vol 118 (10) ◽  
pp. 102402
Author(s):  
Hiroaki Shishido ◽  
Akira Okumura ◽  
Tatsuya Saimyoji ◽  
Shota Nakamura ◽  
Shigeo Ohara ◽  
...  

2021 ◽  
Author(s):  
Kristina Ashurbekova ◽  
Karina Ashurbekova ◽  
Iva Saric ◽  
Evgeny Modin ◽  
Mladen Petravic ◽  
...  

We developed a thin film growth with a radical-initiated cross-linking of vinyl groups in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited improved properties like 12% higher density and enhanced stability compared to the non-cross-linked film.


Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...


2008 ◽  
Vol 254 (23) ◽  
pp. 7838-7842 ◽  
Author(s):  
Shigeo Ohira ◽  
Naoki Arai ◽  
Takayoshi Oshima ◽  
Shizuo Fujita

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