Large-area ion source combining microwaves with inductively coupled plasma

2000 ◽  
Vol 71 (2) ◽  
pp. 716-718 ◽  
Author(s):  
S. Okuji ◽  
N. Sakudo ◽  
K. Hayashi ◽  
M. Okada ◽  
T. Onogawa ◽  
...  
2015 ◽  
Vol 2015 (1) ◽  
pp. 000757-000760
Author(s):  
Y. Takaya ◽  
Y. Tanioka ◽  
H. Yoshino ◽  
A. Osawa

In recent years, both low plasma damage and low temperature deposition technic for polymer substrates (e.g. PCB, films and etc.) are often required. We have developed a plasma enhanced dual rotatable magnetron sputter source assisted with inductively coupled plasma (ICP) using low inductance antenna (LIA). LIA has same unique characteristics, a)low voltage high density plasma, b)well controllability of plasma profile to ensure uniformity over large area, c)ionization of sputtered particle and etc. when in being used as a plasma assistant, and besides, LIA can be used as a ICP source for polymer surface modification. We introduce a variety of the possibilities of whether this sputter source is usable for the process of the fabrication of PCB.


Author(s):  
Rob Ellam

Mass spectrometers have become routine laboratory instruments in many disciplines. ‘Measuring isotopes: mass spectrometers’ concentrates on those used to quantify the abundance of different isotopes—gas source isotope ratio, thermal ionization, inductively coupled plasma, and secondary ion mass spectrometers. A mass spectrometer can be used to quantify the concentration of a particular element by monitoring an isotope of that element not overlapped by isotopes of other elements. All mass spectrometers have three essential components: an ion source, a mass filter, and a detector. There are two main types of detector: Faraday detectors measure large signals and a variant of photomultiplier tubes measures small isotope signals.


2003 ◽  
Vol 70 (1) ◽  
pp. 51
Author(s):  
M. A. Kartasheva ◽  
M. N. Maleshin ◽  
G. N. Gerasimov ◽  
V. I. Danilenkov

Sign in / Sign up

Export Citation Format

Share Document