Linear internal inductively coupled plasma (ICP) source with magnetic fields for large area processing
2003 ◽
Vol 435
(1-2)
◽
pp. 275-279
◽
2015 ◽
Vol 2015
(1)
◽
pp. 000757-000760
2014 ◽
Vol 16
(8)
◽
pp. 758-766
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2012 ◽
Vol 45
(47)
◽
pp. 475201
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2000 ◽
Vol 71
(2)
◽
pp. 716-718
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2009 ◽
Vol 48
(11)
◽
pp. 116006
◽
Keyword(s):
1990 ◽
Vol 5
(11)
◽
pp. 2326-2333
◽
2016 ◽
Vol 55
(7S2)
◽
pp. 07LD08
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Keyword(s):
2015 ◽
Vol 15
(11)
◽
pp. 8557-8565
2010 ◽
Vol 38
(2)
◽
pp. 133-136
◽
Keyword(s):