A System for Determining the Mass and Energy of Particles Incident on a Substrate in a Planar Diode Sputtering System

1970 ◽  
Vol 41 (8) ◽  
pp. 1219-1223 ◽  
Author(s):  
J. W. Coburn
Keyword(s):  
Planar Diode ◽  
Sputtering System

Modulated structures in (Bi,Pb)-Sr-Ca-Cu-O films

1990 ◽  
Vol 48 (4) ◽  
pp. 62-63
Author(s):  
Shozo Ikeda ◽  
Hirotoshi Hayakawa ◽  
Daniel R. Dietderich
Keyword(s):  
Rf Magnetron Sputtering ◽  
Potential Method ◽  
High Tc ◽  
Bscco System ◽  
Heat Treated ◽  
Modulated Structures ◽  
High Tc Phase ◽  
Deposited Films ◽  
Sputtering System

Pb addition makes easier to form the high Tc phase in the BSCCO system. However, Pb easily vaporized at high temperature. A controlled Pb potential method has been applied to grow the high Tc phase in films. Initially, films are deposited on cleaved MgO substrates using an rf magnetron sputtering system. These amorphous as-deposited films are heat treated in a sealed gold capsule along with a large pellet of Pb-added BSCCO. Details of the process and characterization of the films have been reported elsewhere (1). Films trated for 0.5h at 850° C contain mainly the low Tc phase with a small amount of the high Tc phase. Hawever, films treated for 3h at 850°C consist mainly of the high Tc phase. This film is superconductive with a Tc(zero) of 106K. The Pb/Bi ratio of the films, analysed by SEM- EDS, are 0.12 and 0.18 for heat tratment times of 0.5 and 3h, respectively. The present study investigates the modulated structures of these films using HREM.

scholarly journals Effects of Thermal Annealing on the Characteristics of High Frequency FBAR Devices

Coatings ◽  
2021 ◽  
Vol 11 (4) ◽  
pp. 397
Author(s):  
Yu-Chen Chang ◽  
Ying-Chung Chen ◽  
Bing-Rui Li ◽  
Wei-Che Shih ◽  
Jyun-Min Lin ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Thermal Annealing ◽  
Electromechanical Coupling ◽  
Zno Thin Films ◽  
Electromechanical Coupling Coefficient ◽  
Back Side ◽  
Zno Thin Film ◽  
Frequency Responses ◽  
Sputtering System

In this study, piezoelectric zinc oxide (ZnO) thin film was deposited on the Pt/Ti/SiNx/Si substrate to construct the FBAR device. The Pt/Ti multilayers were deposited on SiNx/Si as the bottom electrode and the Al thin film was deposited on the ZnO piezoelectric layer as the top electrode by a DC sputtering system. The ZnO thin film was deposited onto the Pt thin film by a radio frequency (RF) magnetron sputtering system. The cavity on back side for acoustic reflection of the FBAR device was achieved by KOH solution and reactive ion etching (RIE) processes. The crystalline structures and surface morphologies of the films were analyzed by X-ray diffraction (XRD) and field emission scanning electron microscope (FE-SEM). The optimized as-deposited ZnO thin films with preferred (002)-orientation were obtained under the sputtering power of 80 W and sputtering pressure of 20 mTorr. The crystalline characteristics of ZnO thin films and the frequency responses of the FBAR devices can be improved by using the rapid thermal annealing (RTA) process. The optimized annealing temperature and annealing time are 400 °C and 10 min, respectively. Finally, the FBAR devices with structure of Al/ZnO/Pt/Ti/SiNx/Si were fabricated. The frequency responses showed that the return loss of the FBAR device with RTA annealing was improved from −24.07 to −34.66 dB, and the electromechanical coupling coefficient (kt2) was improved from 1.73% to 3.02% with the resonance frequency of around 3.4 GHz.

scholarly journals Controlling Film Thickness Distribution by Magnetron Sputtering with Rotation and Revolution

Coatings ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 599
Author(s):  
Handan Huang ◽  
Li Jiang ◽  
Yiyun Yao ◽  
Zhong Zhang ◽  
Zhanshan Wang ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Film Thickness ◽  
Multilayer Film ◽  
Thickness Distribution ◽  
Parabolic Cylinder ◽  
Particle Model ◽  
Planetary Motion ◽  
X Rays ◽  
X Ray ◽  
Sputtering System

The laterally graded multilayer collimator is a vital part of a high-precision diffractometer. It is applied as condensing reflectors to convert divergent X-rays from laboratory X-ray sources into a parallel beam. The thickness of the multilayer film varies with the angle of incidence to guarantee every position on the mirror satisfies the Bragg reflection. In principle, the accuracy of the parameters of the sputtering conditions is essential for achieving a reliable result. In this paper, we proposed a precise method for the fabrication of the laterally graded multilayer based on a planetary motion magnetron sputtering system for film thickness control. This method uses the fast and slow particle model to obtain the particle transport process, and then combines it with the planetary motion magnetron sputtering system to establish the film thickness distribution model. Moreover, the parameters of the sputtering conditions in the model are derived from experimental inversion to improve accuracy. The revolution and rotation of the substrate holder during the final deposition process are achieved by the speed curve calculated according to the model. Measurement results from the X-ray reflection test (XRR) show that the thickness error of the laterally graded multilayer film, coated on a parabolic cylinder Si substrate, is less than 1%, demonstrating the effectiveness of the optimized method for obtaining accurate film thickness distribution.

Microstructure and wettability of novel Al-containing diamond-like carbon films deposited by a hybrid sputtering system

2021 ◽  
Vol 868 ◽  
pp. 159130
Author(s):  
Ji Cheng Ding ◽  
Haijuan Mei ◽  
Jun Zheng ◽  
Qi Min Wang ◽  
Myung Chang Kang ◽  
...  
Keyword(s):  
Carbon Films ◽  
Diamond Like Carbon ◽  
Sputtering System

scholarly journals Effects of Accumulated Energy on Nanoparticle Formation in Pulsed-Laser Dewetting of AgCu Thin Films

2021 ◽  
Vol 16 (1) ◽  
Author(s):  
H. K. Lin ◽  
C. W. Huang ◽  
Y. H. Lin ◽  
W. S. Chuang ◽  
J. C. Huang
Keyword(s):  
Pulsed Laser ◽  
Blue Shift ◽  
High Energy ◽  
Low Energy ◽  
Nanoparticle Formation ◽  
Energy Accumulation ◽  
Glass Substrates ◽  
Peak Absorption ◽  
Two Peaks ◽  
Sputtering System

AbstractAg50Cu50 films were deposited on glass substrates by a sputtering system. Effects of accumulated energy on nanoparticle formation in pulse-laser dewetting of AgCu films were investigated. The results showed that the properties of the dewetted films were found to be dependent on the magnitude of the energy accumulated in the film. For a low energy accumulation, the two distinct nanoparticles had rice-shaped/Ag60Cu40 and hemispherical/Ag80Cu20. Moreover, the absorption spectra contained two peaks at 700 nm and 500 nm, respectively. By contrast, for a high energy accumulation, the nanoparticles had a consistent composition of Ag60Cu40, a mean diameter of 100 nm and a peak absorption wavelength of 550 nm. Overall, the results suggest that a higher Ag content of the induced nanoparticles causes a blue shift of the absorption spectrum, while a smaller particle size induces a red shift.

The synthesis of CrSiN film deposited using magnetron sputtering system

2005 ◽  
Vol 200 (1-4) ◽  
pp. 1026-1030 ◽  
Author(s):  
H.Y. Lee ◽  
W.S. Jung ◽  
J.G. Han ◽  
S.M. Seo ◽  
J.H. Kim ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Sputtering System

Fabrication of Magnetic Tips for High-Resolution Magnetic Force Microscopy

2013 ◽  
Vol 543 ◽  
pp. 35-38 ◽  
Author(s):  
Masaaki Futamoto ◽  
Tatsuya Hagami ◽  
Shinji Ishihara ◽  
Kazuki Soneta ◽  
Mitsuru Ohtake
Keyword(s):  
Magnetic Material ◽  
High Resolution ◽  
Magnetic Force Microscopy ◽  
Magnetic Force ◽  
Magnetic Force Microscope ◽  
Force Microscopy ◽  
High Magnetic Moment ◽  
Tip Radius ◽  
Better Than ◽  
Sputtering System

Effects of magnetic material, coating thickness, and tip radius on magnetic force microscope (MFM) spatial resolution have been systematically investigated. MFM tips are prepared by using an UHV sputtering system by coating magnetic materials on non-magnetic Si tips employing targets of Ni, Ni-Fe, Co, Fe, Fe-B, and Fe-Pd. MFM spatial resolutions better than 9 nm have been confirmed by employing magnetic tips coated with high magnetic moment materials with optimized thicknesses.

The Characteristics of Multilayer Thin Films Deposited with Metal Thin Films (Ag, Al, Cu)

2010 ◽  
Vol 97-101 ◽  
pp. 1768-1771 ◽  
Author(s):  
Dong Hun Kim ◽  
Riichi Murakami ◽  
Yun Hae Kim ◽  
Kyung Man Moon ◽  
Seung Jung An ◽  
...  
Keyword(s):  
Thin Films ◽  
Metal Particles ◽  
Zno Thin Films ◽  
Multilayer Thin Films ◽  
Electrical And Optical Properties ◽  
Metal Thin Films ◽  
Continuous Structure ◽  
Glass Substrates ◽  
The Difference ◽  
Sputtering System

In order to study the characteristics of multilayer thin films with a ZnO/ metal/ ZnO structure the manufacture of the thin films was performed by a dc (direct current) magnetron sputtering system on slide glass substrates. The ZnO thin films were manufactured with the thicknesses of 30 nm and 50 nm. Three kinds of metals (Ag, Al and Cu) were deposited with the thicknesses of 4 nm, 8 nm, 12 nm and 16 nm. The electrical and optical properties of the manufactured thin films were then observed. As a result, the multilayer thin films with an Ag layer represented the most excellent electrical conductivity. This is due to the difference in the fundamental electrical properties of each of the metals. The structures of the metal particles deposited on the ZnO thin films were observed by an SEM (scanning electron microscope). The thin films exhibited a continuous structure with regular spaces between the metal particles. This resulted in an increase of transmittance. This is considered by the decrease of scattering and of light absorption on thin films with a continuous structure.

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