Publisher's Note: “Controlling the resistivity gradient in aluminum-doped zinc oxide grown by plasma-enhanced chemical vapor deposition” [J. Appl. Phys. 112, 043708 (2012)]

2012 ◽  
Vol 112 (6) ◽  
pp. 069902
Author(s):  
M. V. Ponomarev ◽  
M. A. Verheijen ◽  
W. Keuning ◽  
M. C. M. van de Sanden ◽  
M. Creatore
Keyword(s):  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Aluminum Doped Zinc Oxide

scholarly journals Effect of Aluminum Doping Ratios on the Properties of Aluminum-Doped Zinc Oxide Films Deposited by Mist Chemical Vapor Deposition Method Applying for Photocatalysis

Nanomaterials ◽  
2022 ◽  
Vol 12 (2) ◽  
pp. 195
Author(s):  
Htet Su Wai ◽  
Chaoyang Li
Keyword(s):  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Method ◽  
Zinc Oxide Film ◽  
Al Doping ◽  
Aluminum Doping ◽  
Aluminum Doped Zinc Oxide ◽  
Doping Ratio

Aluminum-doped zinc oxide film was deposited on a glass substrate by mist chemical vapor deposition method. The influence of different aluminum doping ratios on the structural and optical properties of zinc oxide film was investigated. The XRD results revealed that the diffraction peak of (101) crystal plane was the dominant peak for the deposited AZO films with the Al doping ratios increasing from 1 wt % to 3 wt %. It was found that the variation of AZO film structures was strongly dependent on the Al/Zn ratios. The intertwined nanosheet structures were obtained when Zn/O ratios were greater than Al/O ratios with the deposition temperature of 400 °C. The optical transmittance of all AZO films was greater than 80% in the visible region. The AZO film deposited with Al doping ratio of 2 wt % showed the highest photocatalytic efficiency between the wavelength of 475 nm and 700 nm, with the high first-order reaction rate of 0.004 min−1 under ultraviolet radiation. The mechanism of the AZO film influenced by aluminum doping ratio during mist chemical vapor deposition process was revealed.

Preparation and Hydrophobic Processing of Aluminum-Doped Zinc Oxide Films

2010 ◽  
Vol 39 ◽  
pp. 44-49 ◽  
Author(s):  
Chen Li ◽  
Min Li ◽  
Du Yao Zhang
Keyword(s):  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Glass Substrates ◽  
Zinc Oxide Films ◽  
Barrier Discharge Plasma ◽  
Aluminum Doped Zinc Oxide ◽  
Metal Organic

In this research, transparent and conductive aluminum-doped zinc oxide (AZO) films were prepared on glass substrates by metal-organic chemical vapor deposition (MOCVD). A nanostructured hydrophobic layer of fluorocarbon (FC) compounds was formed on the films by low-temperature dielectric barrier discharge plasma enhanced chemical vapor deposition (DBD-PECVD), as hydrophobic processing. Scanning electron microscopy (SEM) and contact angle analyzer were used to characterize and analyze the surface morphology, structure and hydrophobicity of these samples. The results indicate that the hydrophobicity of transparent conductive AZO films was enhanced by the deposition of the FC film.

Controlling the resistivity gradient in aluminum-doped zinc oxide grown by plasma-enhanced chemical vapor deposition

2012 ◽  
Vol 112 (4) ◽  
pp. 043708 ◽  
Author(s):  
M. V. Ponomarev ◽  
M. A. Verheijen ◽  
W. Keuning ◽  
M. C. M. van de Sanden ◽  
M. Creatore
Keyword(s):  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Aluminum Doped Zinc Oxide

Volatile, Monomeric, and Fluorine-Free Precursors for the Metal Organic Chemical Vapor Deposition of Zinc Oxide

2010 ◽  
Vol 2010 (9) ◽  
pp. 1366-1372 ◽  
Author(s):  
Daniela Bekermann ◽  
Detlef Rogalla ◽  
Hans-Werner Becker ◽  
Manuela Winter ◽  
Roland A. Fischer ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

Zinc oxide thin film synthesized by combustion chemical vapor deposition

2008 ◽  
Vol 255 (5) ◽  
pp. 2859-2863 ◽  
Author(s):  
Zhi-Yang Li ◽  
Fuchun Xu ◽  
Qi-Hui Wu ◽  
Jing Li
Keyword(s):  
Thin Film ◽  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Oxide Thin Film ◽  
Zinc Oxide Thin Film
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