scholarly journals Discontinuous cracking of TiN films on a steel substrate induced by an adhesive interlayer

2019 ◽  
Vol 99 (6) ◽  
pp. 199-207
Author(s):  
Tao Guo ◽  
Xiaolu Pang ◽  
Jianying He ◽  
Lijie Qiao
Keyword(s):  
Steel Substrate ◽  
Tin Films ◽  
Adhesive Interlayer

Direct Fractographic Evaluation of Multilayer CNx/TiN Films by Magnetron Sputtering

MRS Advances ◽  
2018 ◽  
Vol 3 (18) ◽  
pp. 949-955
Author(s):  
Gongsheng Song ◽  
Qiang Fu ◽  
Chunxu Pan
Keyword(s):  
Fracture Surface ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
High Speed ◽  
Steel Substrate ◽  
High Speed Steel ◽  
Interfacial Strength ◽  
High Hardness ◽  
Tin Films ◽  
Dc Reactive Magnetron Sputtering

ABSTRACTIn this paper, a multilayer CNx/TiN composite film on high-speed steel substrate was prepared by using a multi-arc assisted DC reactive magnetron sputtering system. The cross-section observations of the fracture surface reveal that the films show a pure cleavage fracture due to its super-high hardness, and the interfacial strength between the film and substrate is associates with the film thickness, i.e., 2μm is a critical thickness for the present deposition. That is to say, there is no disbonding or cracking at the interface when the film thickness is less than 2μm, while the interfacial failure is generated if the film thickness is larger than 2μm. This direct SEM observation of the fracture surface provides a distinct image for evaluating the mechanical property and also analyzing the failure mechanism of the films.

Sliding Friction and Wear Test of TiAlN TiN Films and 40Cr Steel

2011 ◽  
Vol 189-193 ◽  
pp. 62-65
Author(s):  
Long Lu ◽  
Ming Hao Ren ◽  
Tao Jiang
Keyword(s):  
Wear Resistance ◽  
Carrying Capacity ◽  
Friction And Wear ◽  
Sliding Friction ◽  
Steel Substrate ◽  
Wear Test ◽  
Wear Scar ◽  
Wear Loss ◽  
Tin Films ◽  
40Cr Steel

40Cr steel substrate is coated with TiAlN/TiN films by Multi-arc ion technology. The properties of sliding friction and wear on the surfaces of TiAlN/TiN films and substrate are tested by using the machine of friction and wear. The carrying capacity and tribological properties are investigated. The surface morphology of wear specimens is observed and the elements of wear scar center are analyzed. The results show that the friction coefficient of TiAlN/TiN films is lower than 40Cr under the same conditions. The wear scar of TiAlN/TiN films is lower and the wear loss is fewer than 40Cr. The TiAlN/TiN films can successfully reduce friction and wear resistance.

Effect of Stress State of Different Tin Films on Their Tribological Behavior

1998 ◽  
Vol 120 (4) ◽  
pp. 820-828 ◽  
Author(s):  
Zhuang Daming ◽  
Liu Jiajun ◽  
Zhu Baoliang ◽  
Zhou Zhong-Rong ◽  
Leo Vincent ◽  
...  
Keyword(s):  
Stress State ◽  
Tribological Behavior ◽  
Steel Substrate ◽  
Ion Beam ◽  
Chemical Vapor ◽  
X Ray Diffraction ◽  
Plasma Chemical ◽  
Tin Films ◽  
Plasma Chemical Vapor Deposition ◽  
Tin Film

Titanium nitride films were deposited by the methods of ion beam enhanced deposition (IBED), plasma chemical vapor deposition (PCVD) and ion plating (IP). X-ray diffraction analysis was employed to determine the internal stress state of TiN film and 52100 steel substrate at both sides of the interface. The effect of stress state on their bonding strength and tribological behavior was analyzed systematically, their wear and failure mechanisms were discussed in detail as well.

X-Ray Measurements of Residual Stress Distribution in TiN Thin Films with Fiber Texture

2005 ◽  
Vol 490-491 ◽  
pp. 678-683
Author(s):  
Keisuke Tanaka ◽  
Yoshiaki Akiniwa ◽  
Masanori Kawai ◽  
Toshimasa Ito
Keyword(s):  
Compressive Stress ◽  
Stress Measurement ◽  
Steel Substrate ◽  
Ion Beam ◽  
Film Surface ◽  
Surface Region ◽  
Fiber Texture ◽  
Near Surface ◽  
Tin Films ◽  
Tin Thin Films

The TiN films with the thickness of 0.1, 0.2, 0.5, 1.0, and 4.0 µm were coated on a steel substrate by the ion beam mixing method. The film had a strong fiber texture with <001> axis perpendicular to the film surface. The in-plane stress measurement was applicable to the thickness down to 0.1 µm of TiN films. The stress was a compression of around 2 GPa. The compressive stress was found to increase below the surface layer of 20 to 30 nm. Thinner films had a steeper increase of the compressive stress in the very-near surface region. The strain distribution measured by the SV method was nearly constant over the region of the penetration depth between 0.3 and 0.6 µm from the surface. The two-tilt method combined with the surface removal method showed a nearly constant distribution of compression in the subsurface region and a sharp increase near the interface to the substrate.

701 Improvement of Mechanical Properties of TiN Films Coated on Steel Substrate by Post Quenching.

2004 ◽  
Vol 2004.79 (0) ◽  
pp. _7-1_-_7-2_
Author(s):  
Hirotaka TANABE ◽  
Yoshio MIYOSHI ◽  
Tohru TAKAMATSU ◽  
Shuichi SAGARA ◽  
Eiichi INOUE ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Steel Substrate ◽  
Tin Films

scholarly journals Nature of contact deformation of TiN films on steel

2004 ◽  
Vol 19 (9) ◽  
pp. 2616-2624 ◽  
Author(s):  
S. Bhowmick ◽  
Z-H. Xie ◽  
M. Hoffman ◽  
V. Jayaram ◽  
S.K. Biswas
Keyword(s):  
Fracture Stress ◽  
Applied Load ◽  
Shear Fracture ◽  
Steel Substrate ◽  
Adjustable Parameter ◽  
Tin Films ◽  
Tin Film ◽  
Columnar Grain ◽  
Tip Radius ◽  
Microstructural Examination

Nanoindentation experiments were carried out on a columnar ∼1.5-μm-thick TiN film on steel using a conical indenter with a 5-μm tip radius. Microstructural examination of the contact zone indicates that after initial elastic deformation, the deformation mechanism of the TiN is dominated by shear fracture at inter-columnar grain boundaries of the TiN film. A simple model is proposed whereby the applied load is partitioned between a deforming TiN annulus and a central expanding cavity in the steel substrate. It is possible to obtain a good fit to the experimental load–displacement curves with only one adjustable parameter, namely the inter-columnar shear fracture stress of the TiN film. The implication of results in the context of the performance of TiN films in service is also discussed.

Effects of Technical Elements on Microstructure and Hardness of TiAlN/TiN Coatings

2011 ◽  
Vol 86 ◽  
pp. 407-410
Author(s):  
Long Lu ◽  
Ming Hao Ren ◽  
Tao Jiang
Keyword(s):  
Steel Substrate ◽  
Negative Bias ◽  
Micro Hardness ◽  
Marked Influence ◽  
Tin Films ◽  
Tin Coatings ◽  
40Cr Steel

40Cr steel substrate was coated with TiAlN/TiN films by multi-arc ion technology. The effect of technical elements on the surface and micro hardness of TiAlN/TiN films had been studied with metallographic microscope, SEM and micro hardness instrument. The results show that the negative bias and the target current have marked influence in performance of TiAlN/TiN films. The content of Ti and Al in films becomes lower and lower when the negative bias becomes higher and higher. The content of Ti/Al of films increases when the target current increases. The micro hardness increases firstly and then drops with the increase of negative bias or the target current.

Electron microscopy study of reactively sputter-deposited Ti/N films on silicon

1992 ◽  
Vol 50 (2) ◽  
pp. 1362-1363
Author(s):  
V. C. Kannan ◽  
A. K. Singh ◽  
R. B. Irwin ◽  
S. Chittipeddi ◽  
F. D. Nkansah ◽  
...  
Keyword(s):  
Integrated Circuits ◽  
Large Scale ◽  
Hexagonal Phase ◽  
Microscopy Study ◽  
Electron Microscopy Study ◽  
Process Conditions ◽  
Tin Films ◽  
Wide Range ◽  
Fcc Phase ◽  
Circuits Vlsi

Titanium nitride (TiN) films have historically been used as diffusion barrier between silicon and aluminum, as an adhesion layer for tungsten deposition and as an interconnect material etc. Recently, the role of TiN films as contact barriers in very large scale silicon integrated circuits (VLSI) has been extensively studied. TiN films have resistivities on the order of 20μ Ω-cm which is much lower than that of titanium (nearly 66μ Ω-cm). Deposited TiN films show resistivities which vary from 20 to 100μ Ω-cm depending upon the type of deposition and process conditions. TiNx is known to have a NaCl type crystal structure for a wide range of compositions. Change in color from metallic luster to gold reflects the stabilization of the TiNx (FCC) phase over the close packed Ti(N) hexagonal phase. It was found that TiN (1:1) ideal composition with the FCC (NaCl-type) structure gives the best electrical property.

Vibration based Energy Harvester Employing ZnO Film on the Stainless Steel Substrate

2013 ◽  
Vol 133 (4) ◽  
pp. 126-127 ◽  
Author(s):  
Shota Hosokawa ◽  
Motoaki Hara ◽  
Hiroyuki Oguchi ◽  
Hiroki Kuwano
Keyword(s):  
Stainless Steel ◽  
Energy Harvester ◽  
Stainless Steel Substrate ◽  
Steel Substrate ◽  
Zno Film
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