A refined forward gated-diode method for separating front channel hot-carrier-stress induced front and back gate interface and oxide traps in SOI NMOSFETs

2002 ◽  
Vol 17 (5) ◽  
pp. 487-492 ◽  
Author(s):  
Jin He ◽  
Xing Zhang ◽  
Ru Huang ◽  
Yangyuan Wang
1988 ◽  
Vol 49 (C4) ◽  
pp. C4-779-C4-782 ◽  
Author(s):  
C. BERGONZONI ◽  
R. BENECCHI ◽  
P. CAPRARA

2017 ◽  
Vol 74 ◽  
pp. 74-80 ◽  
Author(s):  
Lihua Dai ◽  
Xiaonian Liu ◽  
Mengying Zhang ◽  
Leqing Zhang ◽  
Zhiyuan Hu ◽  
...  

2019 ◽  
Vol 3 (5) ◽  
pp. 213-220 ◽  
Author(s):  
Min-Woo Ha ◽  
Young-Hwan Choi ◽  
Joon-Hyun Park ◽  
Kwang-Seok Seo ◽  
Min-Koo Han

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