A refined forward gated-diode method for separating front channel hot-carrier-stress induced front and back gate interface and oxide traps in SOI NMOSFETs
2002 ◽
Vol 17
(5)
◽
pp. 487-492
◽
1988 ◽
Vol 49
(C4)
◽
pp. C4-779-C4-782
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Keyword(s):
2017 ◽
Vol 74
◽
pp. 74-80
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1992 ◽
Vol 39
(7)
◽
pp. 1774-1776
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Keyword(s):
1993 ◽
Vol 40
(5)
◽
pp. 958-965
◽
2019 ◽
Vol 66
(1)
◽
pp. 232-240
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