Research of the influence of bias voltage on the structure and residual stress in Ta/W coatings applied on a copper substrate by inverted magnetron
2021 ◽
Vol 2144
(1)
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pp. 012012
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Abstract This paper presents the results of studying the effect of the bias voltage on a copper tube substrate on the texture and residual stresses in 4-layer Ta/W/Ta/W coatings deposited with an inverted magnetron. It is shown that, in contrast to monolayer coatings of Ta and W, in which residual stresses exceeding 2 GPa are formed on the substrate at high voltages on the substrate, stress relaxations occur in the 4-layer coating in alternating layers differing in LTEC values and in the outer W-layer of stress practically absent.
2019 ◽
Vol 1396
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pp. 012028
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2018 ◽
2019 ◽
Vol 1281
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pp. 012047
2020 ◽
pp. 095440892096401
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2016 ◽
Vol 879
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pp. 1800-1806
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1983 ◽
Vol 105
(3)
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pp. 133-136
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