The change in the phase state of thin PZT layers in the region of the morphotropic phase boundary obtained by the RF magnetron sputtering with varying target-substrate distance

Hydrogen doped AZO films (HAZO) were prepared by RF magnetron sputtering. A systematic study of the effect of substrate to target distance (Dst) on the structural, electrical and optical properties of the as-grown HAZO films was carried out. Compared with the Al-doped ZnO films, the hydrogen in the atmosphere influenced the growth of the films by incorporating in the films and bombarding the surface of the film, namely, the Dst, which induced the residual stress and the roughness of the films decreasedwith an increase of the Dst. The films showed a smaller grain size. The surfacework function of the films changed with the composition of the films, reaching a maximum at 7.5cm.

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Fabrication of Bi2Sr2Can-1CunOy / Al2O3-Particles on MgO Films by rf Magnetron Sputtering Method

Advances in Science and Technology ◽

10.4028/www.scientific.net/ast.47.159 ◽

2006 ◽

Vol 47 ◽

pp. 159-164

Author(s):

T. Yamane ◽

Satoru Kishida ◽

H. Tanaka ◽

Hideki Yoshikawa ◽

Hiroya Imao

Keyword(s):

Thin Films ◽

Particle Size ◽

Magnetron Sputtering ◽

Single Phase ◽

Distribution Density ◽

Annealing Temperature ◽

Rf Magnetron Sputtering ◽

Superconducting Thin Films ◽

Substrate Distance ◽

Zero Resistance

We deposited Bi2Sr2Ca1Cu2Oy (Bi-2212) superconducting thin films on MgO substrates with or without Al2O3 particles by the rf magnetron sputtering method. From the results, we found that optimum target-substrate distance, rf powers and substrate temperature for obtaining the Bi-2212 films on the MgO substrates were 5mm, 150W and 830°C, respectively. The Bi-2212 films were Bi-2212 single-phase and had the Tc of about 54K . The particle size and the distribution density of Al2O3 were controlled by annealing temperature. The Bi-2212/Al2O3/MgO film showed Bi-2212 single-phase, whereas did not show zero-resistance.

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Effect of deposition temperature and target-substrate distance on the structure, phases, mechanical and tribological properties of multi-layer HA-Ag coatings obtained by RF magnetron sputtering

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2019.124936 ◽

2019 ◽

Vol 378 ◽

pp. 124936 ◽

Cited By ~ 2

Author(s):

J.A. Lenis ◽

M.A. Gómez ◽

F.J. Bolívar

Keyword(s):

Magnetron Sputtering ◽

Tribological Properties ◽

Deposition Temperature ◽

Rf Magnetron Sputtering ◽

Mechanical And Tribological Properties ◽

Substrate Distance

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Deposition of Fluorocarbon Films by RF Magnetron Sputtering at Varying Target-Substrate Distance

Applied Mechanics and Materials ◽

10.4028/www.scientific.net/amm.50-51.589 ◽

2011 ◽

Vol 50-51 ◽

pp. 589-593 ◽

Cited By ~ 1

Author(s):

Zeng Ji Liu ◽

Quan Ji ◽

Yu Hui Zhang ◽

Yan Zhi Xia

Keyword(s):

Magnetron Sputtering ◽

Cross Section ◽

Deposition Rate ◽

Rf Magnetron Sputtering ◽

Regenerated Cellulose ◽

Nanoscale Particles ◽

Fluorocarbon Films ◽

Substrate Distance ◽

Optimal Target ◽

Deposited Films

The target-substrate distance has a significant effect on the morphology and the relative deposition rate of fluorocarbon films deposited by RF magnetron sputtering. The films were deposited on regenerated cellulose substrate using a polytetrafluoroethylene (PTFE) target, with argon as the working gas. The surface and fracture cross-section morphologies of the deposited films were examined by scanning electron microscopy (SEM). The average thickness of the fluorocarbon films and the relative deposition rates were calculated for varying target-substrate distances. The films had island-like structures composed of nanoscale particles, and the surfaces were not flat. The density of the particles increased and their size decreased with increase of the target-substrate distance in the range 30 to 80 mm. The relative deposition rate increased at first and then decreased with increased target-substrate distance: the optimal target-substrate distance was 50-60 mm.

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Growth Conditions Effect on the Structure and Optical Properties of ZnO Thin Films Synthesized by rf magnetron Sputtering

MRS Proceedings ◽

10.1557/proc-1165-m08-38 ◽

2009 ◽

Vol 1165 ◽

Author(s):

Luis Angelats-Silva ◽

Maharaj S. Tomar ◽

Oscar Perales-Perez ◽

S. P. Singh ◽

Segundo R. Jauregui-Rosas

Keyword(s):

Thin Films ◽

Optical Properties ◽

Magnetron Sputtering ◽

Visible Region ◽

Rf Magnetron Sputtering ◽

Growth Conditions ◽

Zno Thin Films ◽

Zno Films ◽

Rf Power ◽

Substrate Distance

AbstractWe report a systematic study of the influence of the target-substrate distance and rf power on the structural and optical properties of ZnO thin films grown by rf magnetron sputtering in Ar atmosphere from ZnO sputtering target. Sharp (002) peak showed by XRD indicates a c-axis crystalline growth of ZnO films. Growth rate remained almost constant for short target-substrate distances. However, the grain size increases with the rf power decreasing the compressive stress in ZnO films. As-grown ZnO films have average transmittance more than 80% in the visible region. Optical bandgap (Eg) increases from 3.18 to 3.27 eV as increase the target-substrate distance probably due to low stress compression in ZnO films. In addition, when rf power is above 100 W, the optical band gap increases as increase of the stress compression.

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