Viscosity of entangled polystyrene thin film melts: Film thickness dependence

2002 ◽  
Vol 65 (3) ◽  
Author(s):  
Jean-Loup Masson ◽  
Peter F. Green
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Thickness Dependence

Lubricant Flow and Evaporation Model for Heat Assisted Magnetic Recording Systems Including Reactive End-Group Effects and Thin-Film Viscosity

2012 ◽  
Author(s):  
Joanna E. Bechtel ◽  
David B. Bogy
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Magnetic Recording ◽  
Disjoining Pressure ◽  
Thickness Dependence ◽  
Heat Assisted Magnetic Recording ◽  
Lubricant Flow ◽  
Simulation Results ◽  
Thin Film Viscosity ◽  
Film Viscosity

The lubricant applied to the disk in a hard drive is a critical component for head-disk interface reliability. In Heat Assisted Magnetic Recording (HAMR), the heat supplied to the disk by the laser will add new thermal considerations to lubricant performance. Investigations into how the lubricant behaves at the small time and length scales seen in HAMR systems need to be conducted numerically. Published works on HAMR lubricant modeling have considered only the van der Waals contribution to disjoining pressure, commonly called the dispersive component, and do not consider the film thickness dependence of viscosity. However, lubricants with reactive end groups such as Fomblin Zdol are widely used, and such simple disjoining pressure and viscosity models do not capture certain lubricant behavior. We have developed a simulation tool that incorporates film thickness dependencies of viscosity and polar and dispersive disjoining pressure into a continuum lubrication model. We investigate the effect of initial thickness on lubricant flow and evaporation under HAMR write conditions considering both components of disjoining pressure and thin-film viscosity. Simulation results indicate the effect of including polar disjoining pressure depends on the initial lubricant thickness. The inclusion of viscosity thickness dependence does not affect simulation results under scanning laser conditions but will be important in reflow simulations.

scholarly journals Film Thickness Dependence of Nonlinear Optical Intensity and Morphology of Vanadyl-phthalocyanine Thin Film Deposited on KCl (100) Substrate

Shinku ◽  
2003 ◽  
Vol 46 (3) ◽  
pp. 284-286 ◽  
Author(s):  
Qin JIANG ◽  
Goro SAWA ◽  
Yoshiyuki UCHIDA ◽  
Kenzo KOJIMA ◽  
Asao OHASHI ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Nonlinear Optical ◽  
Thickness Dependence ◽  
Optical Intensity

FILM THICKNESS DEPENDENCE OF HEAT TRANSMISSION INTO HELIUM

1981 ◽  
Vol 42 (C6) ◽  
pp. C6-825-C6-827
Author(s):  
P. Taborek ◽  
M. Sinvani ◽  
M. Weimer ◽  
D. Goodstein
Keyword(s):  
Film Thickness ◽  
Thickness Dependence ◽  
Heat Transmission

Organic thin film thickness-dependent photocurrents polarity in graphene heterojunction phototransistor

Carbon ◽  
2021 ◽  
Vol 178 ◽  
pp. 506-514
Author(s):  
Meiyu He ◽  
Jiayue Han ◽  
Xingwei Han ◽  
Jun Gou ◽  
Ming Yang ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Organic Thin Film ◽  
Thin Film Thickness

scholarly journals Experimental Study on the Thickness-Dependent Hardness of SiO2 Thin Films Using Nanoindentation

Coatings ◽  
2020 ◽  
Vol 11 (1) ◽  
pp. 23
Author(s):  
Weiguang Zhang ◽  
Jijun Li ◽  
Yongming Xing ◽  
Xiaomeng Nie ◽  
Fengchao Lang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Grain Size ◽  
Integrated Circuits ◽  
Film Thickness ◽  
Depth Range ◽  
Micro Electro Mechanical Systems ◽  
Si Substrates ◽  
Sio2 Thin Film ◽  
Average Grain Size

SiO2 thin films are widely used in micro-electro-mechanical systems, integrated circuits and optical thin film devices. Tremendous efforts have been devoted to studying the preparation technology and optical properties of SiO2 thin films, but little attention has been paid to their mechanical properties. Herein, the surface morphology of the 500-nm-thick, 1000-nm-thick and 2000-nm-thick SiO2 thin films on the Si substrates was observed by atomic force microscopy. The hardnesses of the three SiO2 thin films with different thicknesses were investigated by nanoindentation technique, and the dependence of the hardness of the SiO2 thin film with its thickness was analyzed. The results showed that the average grain size of SiO2 thin film increased with increasing film thickness. For the three SiO2 thin films with different thicknesses, the same relative penetration depth range of ~0.4–0.5 existed, above which the intrinsic hardness without substrate influence can be determined. The average intrinsic hardness of the SiO2 thin film decreased with the increasing film thickness and average grain size, which showed the similar trend with the Hall-Petch type relationship.

scholarly journals Precise control of Jeff=12 magnetic properties in Sr2IrO4 epitaxial thin films by variation of strain and thin film thickness

2020 ◽  
Vol 102 (21) ◽  
Author(s):  
Stephan Geprägs ◽  
Björn Erik Skovdal ◽  
Monika Scheufele ◽  
Matthias Opel ◽  
Didier Wermeille ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetic Properties ◽  
Film Thickness ◽  
Epitaxial Thin Films ◽  
Thin Film Thickness ◽  
Precise Control

scholarly journals Optimization of Fiber Bragg Gratings Inscribed in Thin Films Deposited on D-Shaped Optical Fibers

Sensors ◽  
2021 ◽  
Vol 21 (12) ◽  
pp. 4056
Author(s):  
José Javier Imas ◽  
Carlos R. Zamarreño ◽  
Ignacio del Villar ◽  
Ignacio R. Matías
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Optical Fibers ◽  
Flat Surface ◽  
Sno2 Thin Film ◽  
Thin Film Thickness ◽  
A Value ◽  
Surrounding Refractive Index ◽  
Reflected Power ◽  
Fabrication Parameters

A fiber Bragg grating patterned on a SnO2 thin film deposited on the flat surface of a D-shaped polished optical fiber is studied in this work. The fabrication parameters of this structure were optimized to achieve a trade-off among reflected power, full width half maximum (FWHM), sensitivity to the surrounding refractive index (SRI), and figure of merit (FOM). In the first place, the influence of the thin film thickness, the cladding thickness between the core and the flat surface of the D-shaped fiber (neck), and the length of the D-shaped zone over the reflected power and the FWHM were assessed. Reflected peak powers in the range from −2 dB to −10 dB can be easily achieved with FWHM below 100 pm. In the second place, the sensitivity to the SRI, the FWHM, and the FOM were analyzed for variations of the SRI in the 1.33–1.4 range, the neck, and the thin-film thickness. The best sensitivities theoretically achieved for this device are next to 40 nm/RIU, while the best FOM has a value of 114 RIU−1.

Influence of ion beam parameters onto two-dimensional optical thin film thickness distributions deposited by ion beam sputtering

2019 ◽  
Vol 682 ◽  
pp. 109-120 ◽  
Author(s):  
Wjatscheslaw Sakiew ◽  
Stefan Schrameyer ◽  
Marco Jupé ◽  
Philippe Schwerdtner ◽  
Nick Erhart ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Ion Beam ◽  
Two Dimensional ◽  
Ion Beam Sputtering ◽  
Thin Film Thickness ◽  
Optical Thin Film ◽  
Beam Sputtering ◽  
Beam Parameters
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