Design and analysis of two-input DC-DC converter used in low voltage DC-grid applications

2013 ◽  
Author(s):  
E Vargil Kumar ◽  
M Veerachary
Keyword(s):  
Low Voltage ◽  
Grid Applications

scholarly journals Stability Analysis of Power Hardware-in-the-Loop Simulations for Grid Applications

Electronics ◽  
2021 ◽  
Vol 11 (1) ◽  
pp. 7
Author(s):  
Simon Resch ◽  
Juliane Friedrich ◽  
Timo Wagner ◽  
Gert Mehlmann ◽  
Matthias Luther
Keyword(s):  
Low Voltage ◽  
Photovoltaic System ◽  
Special Focus ◽  
Hardware In The Loop ◽  
Time Simulation ◽  
Linear Amplifier ◽  
Grid Applications ◽  
The Stability ◽  
Transformer Model ◽  
Stability Limits

Power Hardware-in-the-Loop (PHiL) simulation is an emerging testing methodology of real hardware equipment within an emulated virtual environment. The closed loop interfacing between the Hardware under Test (HuT) and the Real Time Simulation (RTS) enables a realistic simulation but can also result in an unstable system. In addition to fundamentals in PHiL simulation and interfacing, this paper therefore provides a consistent and comprehensive study of PHiL stability. An analytic analysis is compared with a simulative approach and is supplemented by practical validations of the stability limits in PHiL simulation. Special focus is given on the differences between a switching and a linear amplifier as power interface (PI). Stability limits and the respective factors of influence (e.g., Feedback Current Filtering) are elaborated with a minimal example circuit with voltage-type Ideal Transformer Model (ITM) PHiL interface algorithm (IA). Finally, the findings are transferred to a real low-voltage grid PHiL application with residential load and photovoltaic system.

Field Test Validation of Low Voltage Grid Applications in a Danish Setting

2021 ◽  
pp. 82-89
Author(s):  
Kamal Shahid ◽  
Rasmus Løvenstein Olsen ◽  
Rolf Kirk
Keyword(s):  
Field Test ◽  
Low Voltage ◽  
Test Validation ◽  
Grid Applications

scholarly journals Performance Analysis of MIMO System over an In-home PLC Channel

2021 ◽  
Vol 15 ◽  
pp. 1-10
Author(s):  
Mohammed EL GHZAOUI
Keyword(s):  
Orthogonal Frequency Division Multiplexing ◽  
Low Voltage ◽  
Impulsive Noise ◽  
Mimo System ◽  
Minimum Mean Square Error ◽  
Multiple Input Multiple Output ◽  
High Data ◽  
Communication Links ◽  
Input Multiple Output ◽  
Grid Applications

Power line communication (PLC) system is an attractive technology for Smart Grid applications. One key benefit of PLC is its low installation cost because, in PLC technology, we do not need to install any extra cable to extend a network due to the accessibility to low voltage power network. Orthogonal frequency division multiplexing (OFDM) is widely used in PLC networks. Currently, Multiple Input Multiple Output (MIMO) technology is one of the processing techniques appropriate to PLC networks, allowing high data rate. In this work, the MIMO-OFDM system is established to provide better performance over the PLC system by providing communication links with substantial diversity and capacity. However, adapting MIMO to the PLC network involves solving several issues such as MIMO PLC channel modelling and optimisation of the modulation parameters. In this paper, we present measurements results of the transfer function and impulsive noise in the extended frequency range 2-100 MHz. In the simulation part, we evaluate the performance of the proposed receivers in 2×2 MIMO-PLC channels. It is shown that the minimum mean square error (MMSE) receiver can be one of the appropriate candidates for MIMO PLC channels due to its bite error rate (BER) characteristics under impulsive noise.

Processing of human melanoma cells for correlative TEM, LVSEM, and LM

1991 ◽  
Vol 49 ◽  
pp. 106-107
Author(s):  
Marek Malecki ◽  
J. Victor Small ◽  
James Pawley
Keyword(s):  
Electron Microscopy ◽  
Low Voltage ◽  
Fluorescent Microscopy ◽  
Blood Stream ◽  
Surface Topology ◽  
Integrin Receptors ◽  
Transmission Electron ◽  
Develop Technology ◽  
Voltage Scanning ◽  
Mechanisms Of Adhesion

The relative roles of adhesion and locomotion in malignancy have yet to be clearly established. In a tumor, subpopulations of cells may be recognized according to their capacity to invade neighbouring tissue,or to enter the blood stream and metastasize. The mechanisms of adhesion and locomotion are themselves tightly linked to the cytoskeletal apparatus and cell surface topology, including expression of integrin receptors. In our studies on melanomas with Fluorescent Microscopy (FM) and Cell Sorter(FACS), we noticed that cells in cultures derived from metastases had more numerous actin bundles, then cells from primary foci. Following this track, we attempted to develop technology allowing to compare ultrastructure of these cells using correlative Transmission Electron Microscopy(TEM) and Low Voltage Scanning Electron Microscopy(LVSEM).

High-pressure freezing of cells in suspension for low-voltage scanning electron microscopy (LVSEM)

1991 ◽  
Vol 49 ◽  
pp. 64-65
Author(s):  
Marek Malecki ◽  
James Pawley ◽  
Hans Ris
Keyword(s):  
Electron Microscopy ◽  
High Pressure ◽  
Low Voltage ◽  
Culture Media ◽  
Cell Structure ◽  
Freeze Substitution ◽  
Ice Crystal ◽  
High Pressure Freezing ◽  
Cell Culture Media ◽  
Voltage Scanning

The ultrastructure of cells suspended in physiological fluids or cell culture media can only be studied if the living processes are stopped while the cells remain in suspension. Attachment of living cells to carrier surfaces to facilitate further processing for electron microscopy produces a rapid reorganization of cell structure eradicating most traces of the structures present when the cells were in suspension. The structure of cells in suspension can be immobilized by either chemical fixation or, much faster, by rapid freezing (cryo-immobilization). The fixation speed is particularly important in studies of cell surface reorganization over time. High pressure freezing provides conditions where specimens up to 500μm thick can be frozen in milliseconds without ice crystal damage. This volume is sufficient for cells to remain in suspension until frozen. However, special procedures are needed to assure that the unattached cells are not lost during subsequent processing for LVSEM or HVEM using freeze-substitution or freeze drying. We recently developed such a procedure.

Development of a conical anode Fe-gun for low voltage SEM

1988 ◽  
Vol 46 ◽  
pp. 978-979
Author(s):  
T. Miyokawa ◽  
S. Norioka ◽  
S. Goto
Keyword(s):  
High Resolution ◽  
Field Emission ◽  
Low Voltage ◽  
Irradiation Damage ◽  
Cold Cathode ◽  
Virtual Source ◽  
Source Position ◽  
Electrostatic Lens ◽  
Electrostatic Lenses ◽  
Wide Range

Field emission SEMs (FE-SEMs) are becoming popular due to their high resolution needs. In the field of semiconductor product, it is demanded to use the low accelerating voltage FE-SEM to avoid the electron irradiation damage and the electron charging up on samples. However the accelerating voltage of usual SEM with FE-gun is limited until 1 kV, which is not enough small for the present demands, because the virtual source goes far from the tip in lower accelerating voltages. This virtual source position depends on the shape of the electrostatic lens. So, we investigated several types of electrostatic lenses to be applicable to the lower accelerating voltage. In the result, it is found a field emission gun with a conical anode is effectively applied for a wide range of low accelerating voltages.A field emission gun usually consists of a field emission tip (cold cathode) and the Butler type electrostatic lens.

SEM analysis of DC magnetron sputtered beryllium films

1988 ◽  
Vol 46 ◽  
pp. 960-961
Author(s):  
E. F. Lindsey ◽  
C. W. Price ◽  
E. L. Pierce ◽  
E. J. Hsieh
Keyword(s):  
Fine Structure ◽  
Electron Emission ◽  
Secondary Electron ◽  
Low Voltage ◽  
Ion Beam ◽  
Secondary Electron Emission ◽  
Sem Analysis ◽  
Fused Silica ◽  
Grain Structure ◽  
Silica Substrate

Columnar structures produced by DC magnetron sputtering can be altered by using RF biased sputtering or by exposing the film to nitrogen pulses during sputtering, and these techniques are being evaluated to refine the grain structure in sputtered beryllium films deposited on fused silica substrates. Beryllium is brittle, and fractures in sputtered beryllium films tend to be intergranular; therefore, a convenient technique to analyze grain structure in these films is to fracture the coated specimens and examine them in an SEM. However, fine structure in sputtered deposits is difficult to image in an SEM, and both the low density and the low secondary electron emission coefficient of beryllium seriously compound this problem. Secondary electron emission can be improved by coating beryllium with Au or Au-Pd, and coating also was required to overcome severe charging of the fused silica substrate even at low voltage. The coating structure can obliterate much of the fine structure in beryllium films, but reasonable results were obtained by using the high-resolution capability of an Hitachi S-800 SEM and either ion-beam coating with Au-Pd or carbon coating by thermal evaporation.

Toward High-Resolution Low-Voltage SEM

1988 ◽  
Vol 46 ◽  
pp. 218-219
Author(s):  
Zhifeng Shao
Keyword(s):  
Low Voltage ◽  
Spherical Aberration ◽  
Chromatic Aberration ◽  
Limiting Factor ◽  
Operating Voltage ◽  
Probe Radius ◽  
Non Local ◽  
Electron Microscopes ◽  
Image Position ◽  
Scanning Electron Microscopes

Recently, low voltage (≤5kV) scanning electron microscopes have become popular because of their unprecedented advantages, such as minimized charging effects and smaller specimen damage, etc. Perhaps the most important advantage of LVSEM is that they may be able to provide ultrahigh resolution since the interaction volume decreases when electron energy is reduced. It is obvious that no matter how low the operating voltage is, the resolution is always poorer than the probe radius. To achieve 10Å resolution at 5kV (including non-local effects), we would require a probe radius of 5∽6 Å. At low voltages, we can no longer ignore the effects of chromatic aberration because of the increased ratio δV/V. The 3rd order spherical aberration is another major limiting factor. The optimized aperture should be calculated as

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